Abstract: Stage apparatus are disclosed that exhibit reduced deformation that otherwise arises during assembly, as well as reduced deformation that otherwise accompanies vacuum evacuation of a vacuum chamber in which the stage apparatus is mounted. The stage apparatus include spherical static-pressure bearings situated between a stage base and the wall of the vacuum chamber to which the stage apparatus is mounted. Torque or other deformation-inducing stress otherwise exerted on the stage base and/or vacuum chamber is ameliorated by respective rotations of the spherical static-pressure bearings. By ameliorating such stress, stage deformation otherwise arising during assembly and chamber deformation otherwise arising during vacuum evacuation are reduced.

Abstract: Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings.

Abstract: An object is to provide a charged particle beam control element that enables connection of voltage-applying wires with electrodes in simple structure while maintaining high accuracy of surfaces of the electrodes formed on an insulator by a surface treatment of plating or the like. A charged particle beam control element 10 according to the present invention is provided with a cylindrical base 11 having electrode portions 21 formed on an internal surface thereof, and insulating portions 15 which are disposed at locations not exposed to a passing area of a charged particle beam surrounded by the internal surface and which separate the electrode portions 21 from each other.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: It is an object of the present invention to provide a charged particle beam apparatus which can avoid charge-up without reducing the dose to a sample. For achieving such an object, the charged particle beam apparatus of the present invention is a charged particle beam apparatus comprising irradiating means for irradiating a sample with a charged particle beam, and imaging means for capturing a two-dimensional image of a secondary beam generated from the sample upon irradiation with the charged particle beam; wherein the irradiating means is means for irradiating a partial region within an imaging field of view of the imaging means with the charged particle beam by shaping a cross section of the charged particle beam; the apparatus further comprising moving means for moving the partial region such that the partial region scans the imaging field of view as a whole at least once.

Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.

Abstract: Stage devices are disclosed for use especially in a vacuum environment as encountered in a charged-particle-beam (CPB) microlithography (exposure) apparatus. An embodiment of the stage device includes a bottom plate that serves as a guide plate providing two opposing parallel edge planes that serve as respective guide planes. A top plate and a moving table are sandwiched between the guide planes. Extending from one edge of the moving table is a sample platform desirably configured to carry at least two objects such as two reticles or two wafer substrates. Between the top surface of the bottom plate and the bottom surface of the top plate are air pads that provide near frictionless motion of the moving table relative to the guide planes. The moving table is provided with multiple (e.g., three) linear motor coils that provide motion of the moving table in two dimensions relative to the guide planes (e.g.

Abstract: The object of the present invention is to provide a charged particle beam apparatus which can inspect axial offset and cross-sectional states of charged particle beams accurately and easily. For achieving such an object, the charged particle beam apparatus in accordance with the present invention comprises charged particle beam outputting means for outputting a charged particle beam; a lens barrel through which the charged particle beam passes; a mark member having a light-emitting material on a surface on a side irradiated with the charged particle beam, and an opening, the light-emitting material emitting light upon irradiation with the charged particle beam; and viewing means for viewing the light-emitting material of the mark member.

Abstract: Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: A table moving within a plane parallel with respect to a guide plane of a base is located within an opening of a moveable frame moving along the guide plane so as to be guided in an X-direction by an X-direction guide. The table moves in a Y-direction within the moveable frame. The base member and the moveable frame, the moveable frame and a guide, and the base member and said table member are maintained in a state of non-contact by a hydrostatic pressure gas bearing. A planar motor is comprised of electromagnets provided at the base member and permanent magnets provided at the lower surface of said table member installed on the guide plane for the base. The moveable frame and the table are then levitated and moved in the XY directions by the planar motor.

Abstract: Stages are disclosed for used in a charged-particle-beam (CPB) microlithography apparatus for holding a reticle or substrate (wafer) without affecting the charged particle beam. An exemplary stage, which can be a reticle stage or wafer stage, includes at least one actuator situated and configured to move the reticle or substrate relative to the stage. The actuator is non-magnetic and is configured to exhibit at least two degrees of freedom relative to the stage to cause movement of the reticle or substrate. An exemplary actuator is a piezoelectric element configured as a hollow cylinder or integrated into an assembly including multiple levers connected together by flexures. The actuators can cause the reticle or wafer to be moved linearly and/or rotated relative to the stage. For example, the wafer can be rotated using multiple actuators, and any deviation in wafer rotation can be compensated for by an adjustment to the CPB optical system.

Abstract: A static air-bearing provides a gas layer between two relatively movable parts (fixed part and movable part) and a predetermined clearance between the two parts, to a stage apparatus, and to an optical apparatus, and provides a static air-bearing, a stage apparatus, and an optical apparatus each of which can limit its size and can make pipe arrangement easy. The static air-bearing comprising a fixed part 4 and a movable part 3 movably disposed along the fixed part 4 and maintaining a predetermined clearance between the fixed part 4 and the movable part 3 by an air layer between the fixed part 4 and the movable part 3, the movable part 3 having a bearing pad 3a that blows air into the air layer between the fixed part 4 and the movable part 3 and an air exhaust groove 3c that exhausts the air blown out of the bearing pad 3a, and the fixed part 4 having an air exhaust port 4a that is disposed at a position facing the air exhaust groove 3c.

Abstract: A method of controlling pressure in a chamber, wherein the pressure in a chamber in which measurement such as laser measurement is conducted is maintained at a set pressure with respect to fluctuations in external atmospheric pressure, characterized by comprising: detecting the external atmospheric pressure, obtaining a long-term flat pressure value with respect to short time fluctuations of the detected external atmospheric pressure, creating a set pressure in the chamber by adding a predetermined pressure to the obtained pressure value, and detecting the pressure in the chamber while introducing external air so that the pressure in the chamber reaches the set pressure.

Abstract: A projection apparatus is disclosed that can be used for projection TV and related applications. The apparatus comprises a light source, a projection optical system, a DMD with multiple micromirrors, and a controller for individually controlling the tilt of the micromirrors. The projection optical system comprises, in order from the DMD side, a first lens group, an aperture stop, and a second lens group. An illumination stop is situated between the first and second lens groups. Light from the light source passes through the illumination stop and the first lens group to impinge on the DMD. The controller coordinatedly controls the tilt of the micromirrors in the DMD so that the impinging light is selectively reflected to one or the other of the aperture stop and the illumination stop, thereby eliminating ghost-forming reflections of light not projected onto a screen.