Abstract: A window is provided to include a glass substrate, an adhesive layer on the glass substrate, a polymer layer between the glass substrate and the adhesive layer, the polymer layer having a surface adjacent to the adhesive layer, the surface being hydrophilic at a first temperature and being hydrophobic at a second temperature higher than the first temperature, and a protective layer on the adhesive layer. Thereby, when the protective layer is damaged, only the protective layer may be replaced without replacing a glass substrate.

Abstract: A liquid ejecting apparatus includes a liquid ejecting head having a first-nozzle-row, a first-tank storing a first-liquid, a first-supply-flow-path for supplying the first-liquid to the first-nozzle-row from the first-tank, a first on-off valve provided in an intermediate portion of the first-supply-flow-path and configured to open and close the first-supply-flow-path, and a first-pressurizing-mechanism configured to pressurize an inside of the first-tank. A pressure inside the first-tank is set to a predetermined positive pressure by driving the first-pressurizing-mechanism in a closed state of the first on-off valve. Thereafter, a discharge process of discharging the first-liquid from the first-nozzle-row is performed by bringing the first on-off valve into an open state. In the discharge process, the first on-off valve is switched from the open state to the closed state at a timing at which the first-liquid is being continuously discharged from the first-nozzle-row.

Abstract: A window is provided to include a glass substrate, an adhesive layer on the glass substrate, a polymer layer between the glass substrate and the adhesive layer, the polymer layer having a surface adjacent to the adhesive layer, the surface being hydrophilic at a first temperature and being hydrophobic at a second temperature higher than the first temperature, and a protective layer on the adhesive layer. Thereby, when the protective layer is damaged, only the protective layer may be replaced without replacing a glass substrate.

Abstract: A window is provided to include a glass substrate, an adhesive layer on the glass substrate, a polymer layer between the glass substrate and the adhesive layer, the polymer layer having a surface adjacent to the adhesive layer, the surface being hydrophilic at a first temperature and being hydrophobic at a second temperature higher than the first temperature, and a protective layer on the adhesive layer. Thereby, when the protective layer is damaged, only the protective layer may be replaced without replacing a glass substrate.

Abstract: An optical film for a display device includes: a base layer; a pattern layer disposed on the base layer and having a repeating pattern of valleys and peaks; a plurality of first elongated scattering members disposed on upper surfaces of the valleys; and a cover layer having a shape that is complementary to and coupled with the repeating pattern of valleys and peaks, with the elongated scattering members being disposed between the pattern layer and the cover layer.

Abstract: A mold for a wire grid polarizer includes a hard mold and a soft mold, in which the hard mold includes a main body, an oxidization layer provided on the main body, and a SAM layer provided on the oxidization layer and including an additive, the soft mold includes a substrate, and a protrusions and depressions portion including a polymerized releasing agent, and a region that is hydrophobic in the polymerized releasing agent is arranged on a surface of the protrusions and depressions portion.

Abstract: An optical film for a display device includes: a base layer; a pattern layer disposed on the base layer and having a repeating pattern of valleys and peaks; a plurality of first elongated scattering members disposed on upper surfaces of the valleys; and a cover layer having a shape that is complementary to and coupled with the repeating pattern of valleys and peaks, with the elongated scattering members being disposed between the pattern layer and the cover layer.

Abstract: A composition for a soft mold according to an embodiment of the inventive concept may manufacture a soft mold having good durability and release properties by including at least one multifunctional acrylate monomer, at least one photoinitiator, and a siloxane compound, and may improve productivity in the manufacture of an optical member by using the soft mold.

Abstract: A mold for a wire grid polarizer includes a hard mold and a soft mold, in which the hard mold includes a main body, an oxidization layer provided on the main body, and a SAM layer provided on the oxidization layer and including an additive, the soft mold includes a substrate, and a protrusions and depressions portion including a polymerized releasing agent, and a region that is hydrophobic in the polymerized releasing agent is arranged on a surface of the protrusions and depressions portion.

Abstract: A photo-curable resin composition is provided that is capable of forming a resin layer having solvent resistance and capable of easily forming a releasing layer on the resin layer. According to the present invention, a photo-curable resin composition comprising a silicone oligomer having an alkoxy group bonded to a silicon atom and a (meth)acrylate compound is provided.

Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.

Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).

Abstract: A composition for a soft mold according to an embodiment of the inventive concept may manufacture a soft mold having good durability and release properties by including at least one multifunctional acrylate monomer, at least one photoinitiator, and a siloxane compound, and may improve productivity in the manufacture of an optical member by using the soft mold.

Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.

Abstract: A method of manufacturing a microstructure. While pressing a first pattern of a first mold against a first transferred resin layer obtained by applying a first photocurable resin composition on a transparent base having a light shielding pattern, a first cured resin layer with the first pattern transferred thereto is formed by irradiating the first transferred resin layer with an activation energy line through the first mold; While pressing a second pattern of a second mold against a second transferred resin layer obtained by applying a second photocurable resin composition on the first cured resin layer, a second cured resin layer is formed having a level difference shape including a lower level area and a higher level area by irradiating the second transferred resin layer with an activation energy line using the light shielding pattern as a mask to cure the second transferred resin layer in a partial region.

Abstract: A step-and-repeat imprinting apparatus that is capable of restraining failures and mold breakage during imprinting. A step-and-repeat imprinting apparatus is provided that includes: a stage to place a stage base; a positioning mechanism configured to be relatively movable to the stage and to keep a flexible base to face the stage base; and a pressurizing mechanism to press, while deflecting the flexible base, the flexible base toward the stage base, wherein one of the stage base and the flexible base has a convex and concave pattern, and another of the stage base and the flexible base includes a transferred resin layer to have the convex and concave pattern transferred thereto, and the apparatus is so configured that the pressurizing mechanism presses, while deflecting, the flexible base toward the stage base, thereby transferring the convex and concave pattern to the transferred resin layer.

Abstract: A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.

Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.

Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).

Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.