Patents by Inventor Yukinobu Yoshizaki

Yukinobu Yoshizaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition
    Patent number: 9631121
    Abstract: A polishing composition is used to polish a polishing subject having a phase change alloy. The polishing composition includes abrasive grains and a brittle film formation agent. The brittle film formation agent is at least one or more selected from a saturated monocarboxylic acid and an organophosphorus compound.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: April 25, 2017
    Assignee: FUJIMI INCORPORATED
    Inventors: Yukinobu Yoshizaki, Yoshihiro Izawa
  • Polishing composition
    Patent number: 9390938
    Abstract: To provide a means by which polishing rate can further be improved in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element. Oxo acid containing a metal element or a semimetal element, and water are contained in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element.
    Type: Grant
    Filed: February 8, 2016
    Date of Patent: July 12, 2016
    Assignee: FUJIMI INCORPORATED
    Inventor: Yukinobu Yoshizaki
  • POLISHING COMPOSITION
    Publication number: 20160153095
    Abstract: To provide a means by which polishing rate can further be improved in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element. Oxo acid containing a metal element or a semimetal element, and water are contained in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element.
    Type: Application
    Filed: February 8, 2016
    Publication date: June 2, 2016
    Applicant: FUJIMI INCORPORATED
    Inventor: Yukinobu YOSHIZAKI
  • POLISHING COMPOSITION
    Publication number: 20160108284
    Abstract: An object of the present invention is to provide a means for improving a polishing rate and polishing selectivity of a phase-change compound. The present invention is a polishing composition containing an organic compound having three or more hydroxy groups, at least one of an agent having a chelating action to at least one component of a phase-change compound and a brittle film forming agent, and an oxidizing agent.
    Type: Application
    Filed: May 1, 2014
    Publication date: April 21, 2016
    Applicant: FUJIMI INCORPORATED
    Inventor: Yukinobu YOSHIZAKI
  • POLISHING COMPOSITION
    Publication number: 20150218709
    Abstract: To provide a means by which polishing rate can further be improved in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element. Oxo acid containing a metal element or a semimetal element, and water are contained in a polishing composition to be used for an application of polishing an object to be polished containing a metal element or a semimetal element.
    Type: Application
    Filed: August 22, 2013
    Publication date: August 6, 2015
    Applicant: FUJIMI INCORPORATED
    Inventor: Yukinobu Yoshizaki
  • POLISHING COMPOSITION
    Publication number: 20150152290
    Abstract: A polishing composition is used to polish a polishing subject having a phase change alloy. The polishing composition includes abrasive grains and a brittle film formation agent. The brittle film formation agent is at least one or more selected from a saturated monocarboxylic acid and an organophosphorus compound.
    Type: Application
    Filed: March 12, 2013
    Publication date: June 4, 2015
    Applicant: FUJIMI INCORPORATED
    Inventors: Yukinobu Yoshizaki, Yoshihiro Izawa
  • POLISHING COMPOSITION
    Publication number: 20140242798
    Abstract: A polishing composition of the present invention is used for polishing an object containing a phase-change alloy and is characterized by containing an ionic additive. Examples of the ionic additive include a cationic surfactant, an anionic surfactant, an amphoteric surfactant, and a cationic water-soluble polymer.
    Type: Application
    Filed: September 28, 2012
    Publication date: August 28, 2014
    Applicant: FUJIMI INCORPORATION
    Inventors: Yoshihiro Izawa, Yukinobu Yoshizaki