Abstract: The carrier (10) for double-side polishing has a base material 10a the material of which is stainless steel (SUS) , for example, as is before, and the base material 10a is coated with a coating layer 10b of a material having a hardness higher than that of the base material 10a. The coating layer 10b is desirably coated uniformly without variations in thickness and not warped easily, and the material for the coating layer 10b of the double-side polishing carrier 10 is desirably any one selected from diamond-like carbon, a nitride film, a sapphire film and a titanium nitride film. For production of the double-side polishing carrier 10, a double-side polishing carrier 10? having been used for polishing is prepared first. The used carrier 10? is coated with the coating layer 10b. The invention can suppress the progress of abrasion of the double-side polishing carrier, and can provide satisfactory thickness accuracy, film thickness distribution accuracy, and surface roughness.