Patents by Inventor Yukio Tanaka

Yukio Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972540
    Abstract: Provided are an image processing apparatus, a medical imaging apparatus, and an image processing program that remove noise from an image having different noise levels depending on regions in the image at a low calculation cost, and enable high quality according to a preference of a reader. A plurality of image generators receive measurement data or a captured image obtained by an image data acquisition apparatus and generate different images for a same imaging range. An image selection and combination unit selects different image regions from a plurality of images generated by the plurality of image generators according to a predetermined region selection pattern, and generates one image by combining the images of the selected image regions.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: April 30, 2024
    Assignee: FUJIFILM HEALTHCARE CORPORATION
    Inventors: Chizue Tanaka, Yukio Kaneko
  • Patent number: 11953219
    Abstract: An information takeover system includes: a first board that includes a first control unit and a first storage unit storing first information about an air conditioning apparatus; and a second board that includes a second control unit and is connectable to the first board in an information exchangeable manner. The first control unit is configured to perform first control to transmit the first information to the second board with the first board and the second board connected to each other in the information exchangeable manner.
    Type: Grant
    Filed: June 7, 2023
    Date of Patent: April 9, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yukio Inoue, Hideaki Tanaka, Naoki Bito
  • Patent number: 11939915
    Abstract: A raw material fluid treatment plant provided with a raw material reaction apparatus for reacting a raw material fluid to form a reaction gas. The raw material reaction apparatus includes preheaters and a reactor. The preheaters are heat exchangers that perform heat exchange between a second heat transfer medium and the raw material fluid to heat the raw material fluid. The reactor is a heat exchanger that performs heat exchange between a first heat transfer medium differing from the second heat transfer medium and the raw material fluid having been heated by the preheaters to heat and react the raw material fluid.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: March 26, 2024
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Hideyuki Uechi, Hidefumi Araki, Satoshi Tanimura, Masakazu Nose, Jun Sasahara, Yukio Tanaka, Atsushi Yuasa
  • Patent number: 11940430
    Abstract: The suppressor system is provided with: a suppressor which has an eluent flow path and a suppression solution flow path, the eluent flow path and the suppression solution flow path being separated from each other by an ion exchange membrane; a circulation flow path which connects the inlet and the outlet of the suppression solution flow path of the suppressor, and circulates a suppression solution; an ion exchange resin column which is provided on the circulation flow path, and is equipped with a resin accommodation unit through which the suppression solution flowing out of the suppressor is passed, an acidic or alkaline ion exchange resin being accommodated in the resin accommodation unit; and a life detector which determines the life of the ion exchange resin in the ion exchange resin column.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: March 26, 2024
    Assignee: SHIMADZU CORPORATION
    Inventors: Yukio Oikawa, Hiroshi Tanaka
  • Patent number: 11932785
    Abstract: The present invention provides an epoxy adhesive composition capable of reducing re-aggregation of an adhesive layer modifier, maintaining favorable viscosity for a long period of time, exhibiting high adhesiveness, and reducing process failures during application of the adhesive. Provided is an epoxy adhesive composition containing: a modified polyvinyl acetal resin having a constitutional unit with an acid-modified group; an adhesive layer modifier; and an epoxy resin, the epoxy adhesive composition having a ratio of an acid-modified group equivalent of the modified polyvinyl acetal resin to an epoxy equivalent of the epoxy resin (acid-modified group equivalent/epoxy equivalent) of 5.0 to 150.0, the epoxy adhesive composition having a number ratio of the acid-modified group to an epoxy group (acid-modified group number/epoxy group number) of 0.0005 to 0.5.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: March 19, 2024
    Assignee: SEKISUI CHEMICAL CO., LTD.
    Inventors: Tasuku Yamada, Shiori Tateno, Yousuke Chiba, Takayuki Maeda, Yukio Ochitani, Hideaki Tanaka
  • Publication number: 20240067587
    Abstract: An olefin production device for producing an olefin from a raw material gas containing methane and oxygen includes a reactor containing: a first catalyst; and a second catalyst disposed downstream of the first catalyst in a flow direction of the raw material gas. The first catalyst is a catalyst in which a zirconium salt or carbonate of an alkali metal, an oxide of an alkaline earth metal, an oxide of one kind of lanthanoid element, a composite oxide containing a lanthanoid element, or a combination thereof is supported on a support. The second catalyst is a catalyst containing a tungsten oxide, phosphate, or carbonate of an alkali metal.
    Type: Application
    Filed: March 2, 2022
    Publication date: February 29, 2024
    Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD., The University of Tokyo
    Inventors: Koichiro Yoshitoku, Yukio Tanaka, Atsuhiro Yukumoto, Noriaki Senba, Kazuhiro Takanabe
  • Publication number: 20230242682
    Abstract: A partial oxidative coupling catalyst has a structure in which a component represented by M2ZrO3 is supported on a support, where M represents an alkali metal.
    Type: Application
    Filed: September 16, 2021
    Publication date: August 3, 2023
    Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD., The University of Tokyo
    Inventors: Atsuhiro Yukumoto, Yukio Tanaka, Noriaki Senba, Kazuhiro Takanabe, Bhavin Siritanaratkul
  • Patent number: 11702988
    Abstract: An ammonia decomposition facility includes a heating medium line configured to flow a heating medium heated by heat generated by a gas turbine, an ammonia supply line configured to flow ammonia, an ammonia decomposition device, and an ammonia removal device. The ammonia decomposition device is configured to use heat of the heating medium from the heating medium line, thermally decompose ammonia from the ammonia supply line, and generate a decomposition gas containing hydrogen, nitrogen, and residual ammonia. The ammonia removal device is configured to remove the residual ammonia contained in the decomposition gas from the ammonia decomposition device.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: July 18, 2023
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Hidefumi Araki, Satoshi Tanimura, Masakazu Nose, Jun Sasahara, Hideyuki Uechi, Yukio Tanaka, Atsushi Yuasa
  • Publication number: 20220154646
    Abstract: An ammonia decomposition facility includes a heating medium line configured to flow a heating medium heated by heat generated by a gas turbine, an ammonia supply line configured to flow ammonia, an ammonia decomposition device, and an ammonia removal device. The ammonia decomposition device is configured to use heat of the heating medium from the heating medium line, thermally decompose ammonia from the ammonia supply line, and generate a decomposition gas containing hydrogen, nitrogen, and residual ammonia. The ammonia removal device is configured to remove the residual ammonia contained in the decomposition gas from the ammonia decomposition device.
    Type: Application
    Filed: March 13, 2020
    Publication date: May 19, 2022
    Inventors: Hidefumi ARAKI, Satoshi TANIMURA, Masakazu NOSE, Jun SASAHARA, Hideyuki UECHI, Yukio TANAKA, Atsushi YUASA
  • Publication number: 20220099021
    Abstract: A raw material fluid treatment plant provided with a raw material reaction apparatus for reacting a raw material fluid to form a reaction gas. The raw material reaction apparatus includes preheaters and a reactor. The preheaters are heat exchangers that perform heat exchange between a second heat transfer medium and the raw material fluid to heat the raw material fluid. The reactor is a heat exchanger that performs heat exchange between a first heat transfer medium differing from the second heat transfer medium and the raw material fluid having been heated by the preheaters to heat and react the raw material fluid.
    Type: Application
    Filed: March 9, 2020
    Publication date: March 31, 2022
    Inventors: Hideyuki UECHI, Hidefumi ARAKI, Satoshi TANIMURA, Masakazu NOSE, Jun SASAHARA, Yukio TANAKA, Atsushi YUASA
  • Publication number: 20210060508
    Abstract: A plant that consumes a reformed gas obtained by reforming a source gas including at least methane and carbon dioxide includes: a reforming device that includes a reforming catalyst for reforming the source gas and an electric power supply member for supplying electric power to the reforming catalyst and that supplies electric power to the reforming catalyst to reform the source gas; and a reformed gas consuming apparatus that consumes the reformed gas A reaction temperature of a reforming reaction of the source gas in the reforming device can be adjusted by adjusting a supply amount of a heating medium including exhaust heat generated due to consumption of the reformed gas in the reformed gas consuming apparatus to the reforming device when heat exchange between the source gas and the heat medium is performed in the reforming gas.
    Type: Application
    Filed: February 5, 2020
    Publication date: March 4, 2021
    Inventors: Koichiro YOSHITOKU, Yukio TANAKA, Keiichi NAKAGAWA
  • Patent number: 10774278
    Abstract: A CO shift catalyst according to the present invention reforms carbon monoxide (CO) in gas. The CO shift catalyst has one of molybdenum (Mo) or iron (Fe) as a main component and has an active ingredient having one of nickel (Ni) or ruthenium (Ru) as an accessory component and one or two or more kinds of oxides from among titanium (Ti), zirconium (Zr), and cerium (Ce) for supporting the active ingredient as a support. The temperature at the time of manufacturing and firing the catalyst is equal to or higher than 550° C.
    Type: Grant
    Filed: June 8, 2017
    Date of Patent: September 15, 2020
    Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
    Inventors: Masanao Yonemura, Toshinobu Yasutake, Akihiro Sawata, Yoshio Seiki, Yukio Tanaka, Koji Higashino, Hyota Abe, Kaori Yoshida
  • Patent number: 10400187
    Abstract: A natural gas refining apparatus including a first separation membrane unit including a first separation membrane; and a second separation membrane unit provided in a subsequent stage of the first separation membrane unit. The second separation membrane unit includes a second separation membrane that allows an amine solution to circulate through the second separation membrane unit, and the natural gas refining apparatus refines raw natural gas containing CO2 by passing the raw natural gas through the first and second separation membrane units, separating CO2-rich gas with the first and second separation membranes, and absorbing CO2 with the amine solution circulating through the second separation membrane unit.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: September 3, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Yukio Tanaka, Ryuji Yoshiyama, Masayuki Eda, Tomoh Akiyama
  • Patent number: 10315157
    Abstract: A system and method for separating CO2 from natural gas, which ensure that no clogging or deterioration occurs in a gas separation membrane even after the gas separation membrane is used to remove carbon dioxide from the natural gas under conditions in which the natural gas is pressurized. First, an H2S remover removes hydrogen sulfide from raw natural gas. Then, a compressor pressurizes the natural gas from which H2S has been removed. After that, a cooler cools the pressurized natural gas so as to condense components that are a part of the natural gas. A gas/liquid separator removes the condensed components, and a CO2 separator, including a separation membrane for separating CO2 removes CO2 from the natural gas from which the condensed components have been removed. An expander, which shares a drive shaft with the compressor, expands the natural gas from which CO2 has been removed and recovers energy therefrom.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: June 11, 2019
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Yukio Tanaka, Tomoh Akiyama, Ryuji Yoshiyama, Masayuki Eda
  • Patent number: 10317761
    Abstract: A liquid crystal display device according to an aspect of the invention includes a display region having a plurality of sub pixels. The sub pixels each include a pixel electrode and a thin film transistor electrically coupled to the pixel electrode. A transient leak current of each thin film transistor included in the sub pixels at both ends of the display region among the sub pixels provided on a line passing through the center of the display region in plan view is smaller than a transient leak current of each thin film transistor included in the sub pixels in a central portion including the center.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: June 11, 2019
    Assignee: Japan Display Inc.
    Inventors: Yukio Tanaka, Daiichi Suzuki, Takashi Nakamura, Masahiro Tada, Youichi Asakawa
  • Patent number: 10246340
    Abstract: Included are an ammonia synthesis column that synthesizes ammonia from a raw material gas, a discharge line that discharges a synthetic gas, a water-cooled cooler that cools the synthetic gas with a coolant, disposed in the discharge line, an ammonia separator into which a synthetic gas after cooling is introduced and which separates the ammonia gas and a liquid ammonia from each other, a raw material return line that returns a raw material gas containing the separated ammonia gas to the ammonia synthesis column side as a return raw material gas, and a compressor that compresses the return raw material gas, disposed in the raw material return line. An ammonia concentration in the return raw material gas is 5 mol % or more, and an ammonia synthesis catalyst that synthesizes the ammonia gas in the ammonia synthesis column is a ruthenium catalyst.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: April 2, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
    Inventors: Mikiya Sakurai, Yukio Tanaka, Naoya Okuzumi, Hiroyuki Osora, Haruaki Hirayama
  • Publication number: 20190088222
    Abstract: According to one embodiment, a display device includes a first substrate, a second substrate, a liquid crystal layer, a first alignment film, a pixel electrode, and a common electrode. The liquid crystal layer is disposed between the first substrate and the second substrate. The first alignment film is provided on the first substrate to be in contact with the liquid crystal layer. The pixel electrode is provided on the first substrate and covered with the first alignment film. The common electrode provided on the first substrate to form a lateral electric field. The liquid crystal layer is driven at a frequency of 40 Hz or less. A time constant of the liquid crystal layer is larger than a time constant of the first alignment film.
    Type: Application
    Filed: November 15, 2018
    Publication date: March 21, 2019
    Applicant: Japan Display Inc.
    Inventors: Masahiro KOSUGE, Yukio TANAKA
  • Publication number: 20190071312
    Abstract: Provided are activated carbon, a method for treating activated carbon, an ammonia synthesis catalyst, and a method for producing ammonia synthesis catalyst such that catalytic activity can be improved over the prior art. Activated carbon is activated by being subjected to heat treatment at a temperature of 800 to 1100° C. for 10 to 50 hours in an inert gas into which oxygen is mixed in a concentration of 0.05 to 900 ppm, and the activated carbon is used to improve the catalytic activity of an ammonia synthesis catalyst.
    Type: Application
    Filed: January 17, 2017
    Publication date: March 7, 2019
    Applicant: Mitsubishi Heavy Industries Engineering, Ltd.
    Inventors: Yukio Tanaka, Hiroshi Yoshioka, Haruaki Hirayama
  • Patent number: 10186217
    Abstract: According to one embodiment, a display device includes a first substrate, a second substrate, a liquid crystal layer, a first alignment film, a pixel electrode, and a common electrode. The liquid crystal layer is disposed between the first substrate and the second substrate. The first alignment film is provided on the first substrate to be in contact with the liquid crystal layer. The pixel electrode is provided on the first substrate and covered with the first alignment film. The common electrode provided on the first substrate to form a lateral electric field. The liquid crystal layer is driven at a frequency of 40 Hz or less. A time constant of the liquid crystal layer is larger than a time constant of the first alignment film.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: January 22, 2019
    Assignee: Japan Display Inc.
    Inventors: Masahiro Kosuge, Yukio Tanaka
  • Patent number: 10031382
    Abstract: According to one embodiment, a liquid crystal display device includes a liquid crystal display panel which includes a pixel electrode, a liquid crystal layer and an alignment film, and a driver. The driver drives the pixel electrode at a drive frequency of 1 to 20 Hz. The alignment film has a resistivity of 5×1014 ?·cm or more.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: July 24, 2018
    Assignee: Japan Display Inc.
    Inventors: Daiichi Suzuki, Yoshifumi Saeki, Yukio Tanaka, Noboru Kunimatsu, Hidehiro Sonoda, Masahiro Kosuge