Abstract: The present disclosure describes systems and methods for assigning nodes in a circuit design to layers. The method includes identifying a plurality of structures in a circuit design. Each of the plurality of structures includes four nodes of the circuit design and each of the four nodes are connected to every other node in the respective structure. The method also includes removing, from the plurality of structures, an even number of pairs of connected nodes of the circuit design to form a reduced node structure and assigning circuit layers for the nodes in the reduced node structure. The method further includes assigning, by a processing device, circuit layers for the pairs of connected nodes removed from the plurality of structures based on the assigned circuit layers for the nodes in the reduced node structure.

Abstract: A method includes obtaining a target integrated circuit (IC) layout, accessing a repository, identifying a device within the target IC layout by matching an area of the target IC layout to a source pattern, and replacing at least a portion of the area of the target IC layout with a replacement pattern. The repository stores the source pattern for the device and the replacement pattern corresponding to the source pattern.

Abstract: Pattern matching using anchors during integrated circuit (IC) verification is disclosed. According to one embodiment, a method includes obtaining match time estimates associated with pattern anchors of different anchor types for an IC pattern, generating revised match time estimates based on a target IC layout, and then selecting the pattern anchor associated with the shortest revised match time estimate. Then, target anchors of the same anchor type as the selected pattern anchor are generated for the target IC layout, and the target IC layout is searched for the IC pattern using the selected pattern anchor and the target anchors.

Abstract: Pattern matching using anchors during integrated circuit (IC) verification is disclosed. According to one embodiment, a method includes obtaining match time estimates associated with pattern anchors of different anchor types for an IC pattern, generating revised match time estimates based on a target IC layout, and then selecting the pattern anchor associated with the shortest revised match time estimate. Then, target anchors of the same anchor type as the selected pattern anchor are generated for the target IC layout, and the target IC layout is searched for the IC pattern using the selected pattern anchor and the target anchors.

Abstract: A computer-implemented method for validating a design characterized by a multi-patterning layer is presented. The method includes receiving the multi-patterning layer in a memory of the computer when the computer is invoked to validate the design. The method further includes correcting, using the computer, a first error in a first shape of the multi-patterning layer in accordance with a first rule thereby forming a corrected layer. The method further includes incrementally validating, using the computer, a first portion of the corrected layer in accordance with the first error and a first connected component of a first graph associated with the multi-patterning layer.

Abstract: A computer-implemented method for validating a design characterized by a multi-patterning layer is presented. The method includes receiving the multi-patterning layer in a memory of the computer when the computer is invoked to validate the design. The method further includes correcting, using the computer, a first error in a first shape of the multi-patterning layer in accordance with a first rule thereby forming a corrected layer. The method further includes incrementally validating, using the computer, a first portion of the corrected layer in accordance with the first error and a first connected component of a first graph associated with the multi-patterning layer.

Abstract: A two-level matching technique is described. A system can generate a set of index patterns based on a set of library patterns in a pattern library. The pattern library can include patterns that are expected to have problems during manufacturing. Next, the system can use a fast matching process to check if a first-level pattern clip potentially matches one or more index patterns from the set of index patterns. If so, the system can use a detailed matching process to match a second-level pattern clip with library patterns that correspond to the one or more index patterns. Otherwise, the system can report that the first-level pattern clip does not match any library pattern in the pattern library.

Abstract: A two-level matching technique is described. A system can generate a set of index patterns based on a set of library patterns in a pattern library. The pattern library can include patterns that are expected to have problems during manufacturing. Next, the system can use a fast matching process to check if a first-level pattern clip potentially matches one or more index patterns from the set of index patterns. If so, the system can use a detailed matching process to match a second-level pattern clip with library patterns that correspond to the one or more index patterns. Otherwise, the system can report that the first-level pattern clip does not match any library pattern in the pattern library.