Patents by Inventor Yumi Ochiai

Yumi Ochiai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition
    Patent number: 9785048
    Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: October 10, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada, Yumi Ochiai
  • Resist composition
    Patent number: 9746769
    Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: August 29, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada, Yumi Ochiai
  • Resist composition
    Patent number: 9354516
    Abstract: A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: May 31, 2016
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada, Yumi Ochiai
  • RESIST COMPOSITION
    Publication number: 20160124303
    Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.
    Type: Application
    Filed: May 28, 2014
    Publication date: May 5, 2016
    Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada, Yumi Ochiai
  • RESIST COMPOSITION
    Publication number: 20150286136
    Abstract: A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.
    Type: Application
    Filed: October 16, 2013
    Publication date: October 8, 2015
    Inventors: Masaaki Takasuka, Mastoshi Echigo, Yu Okada, Yumi Ochiai
  • Computer system comprising a plurality of machines connected to a shared memory, and control method for a computer system comprising a plurality of machines connected to a shared memory
    Patent number: 6728746
    Abstract: A computer system includes at least one real machine provided with a machine controller and/or a plurality of virtual machines provided with a machine controller and an operating system for a virtual machine, the real machine and the plurality of virtual machines are connected to a shared memory.
    Type: Grant
    Filed: December 15, 1995
    Date of Patent: April 27, 2004
    Assignee: Fujitsu Limited
    Inventors: Hitoshi Murase, Sunao Takahira, Toshinori Hiraishi, Masaru Saito, Kenichiro Shimogawa, Katsunori Hiraoka, Koshi Horizaki, Kenichi Tsukamoto, Yumi Ochiai