Abstract: A data processing method includes a step of obtaining evaluated values of the time-series data by comparing the time-series data with reference data, a step of classifying the evaluated values into a plurality of levels, a step of displaying an evaluation result screen including a display area including a first graph showing an occurrence rate of each level of the evaluated values, the evaluation result screen including the display area with respect to each of the two or more processing units. A history screen displaying a history in which the evaluated values have been obtained and a trend screen including graphs showing temporal change in the evaluated values in addition to the evaluation result screen is hierarchically displayed. A mark is attached at a position corresponding to a processing result selected in the history screen in a graph in the trend screen.

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a display area including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to each of the two or more processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

Abstract: In a substrate processing apparatus, a substrate is processed with use of a processing liquid. A first operation component and a second operation component are used in the substrate process. A first operation value of the first operation component and a second operation value of the second operation component are acquired by an operation value acquirer. Whether an abnormality has occurred is determined by an abnormality determiner based on the correlation between the first operation value and the second operation value that are acquired by the operation value acquirer.

Abstract: In order to process time series data obtained in a substrate processing apparatus having a plurality of processing units, a data processing method includes an evaluation value calculation step of obtaining a score of the time series data by comparing the time series data with reference data, and a result display step of displaying an evaluation result screen including, for each processing unit, a number of score errors being a number of substrates of which score is abnormal, and a pie chart showing a ratio of the number of score errors to a number of processed substrates. A display size of the number of score errors and that of the pie chart change depending on the number of score errors.

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a display area including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to each of the two or more processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to the processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

Abstract: In order to process time series data obtained in a substrate processing apparatus having a plurality of processing units, a data processing method includes an evaluation value calculation step of obtaining a score of the time series data by comparing the time series data with reference data, and a result display step of displaying an evaluation result screen including, for each processing unit, a number of score errors being a number of substrates of which score is abnormal, and a pie chart showing a ratio of the number of score errors to a number of processed substrates. A display size of the number of score errors and that of the pie chart change depending on the number of score errors.

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to the processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

Abstract: In order to process time series data obtained in a substrate processing apparatus having a plurality of processing units, a data processing method includes an evaluation value calculation step of obtaining a score of the time series data by comparing the time series data with reference data, and a result display step of displaying an evaluation result screen including, for each processing unit, a number of score errors being a number of substrates of which score is abnormal, and a pie chart showing a ratio of the number of score errors to a number of processed substrates. A display size of the number of score errors and that of the pie chart change depending on the number of score errors.

Abstract: A drawing method is to draw a pattern on a substrate. First, cumulative exposure amount distribution data containing a cumulative exposure amount to be applied to each position on the substrate is read. Next, a region R11 and a region R12 on the substrate are specified based on the cumulative exposure amount distribution data. The region R11 is a region where the cumulative exposure amount does not exceed Ma corresponding to a maximum exposure amount capable of being applied to the substrate in one exposure scanning by an exposure apparatus. The region R22 is a region where the cumulative exposure amount exceeds Ma. Then, pattern data containing information about an exposure amount for each position in a region including the region R11 is generated. Further, pattern data containing information about an exposure amount for each position in a region including the region R12 is generated.