Abstract: A method of patterning an underlying structure includes the following. A first patterning process is performed on the underlying structure to form a first patterned underlying structure including a first opening. A patterned photoresist layer is formed, and the patterned photoresist layer fills the first opening. A second patterning process is performed on the first patterned underlying structure to form a second patterned underlying structure including the first opening and a second opening.

Abstract: A method for fabricating semiconductor devices includes forming channel regions over a substrate. The channel regions, in parallel with one another, extend along a first lateral direction. Each channel region includes at least a respective pair of epitaxial structures. The method includes forming a gate structure over the channel regions, wherein the gate structure extends along a second lateral direction. The method includes removing, through a first etching process, a portion of the gate structure that was disposed over a first one of the channel regions. The method includes removing, through a second etching process, a portion of the first channel region. The second etching process includes one silicon etching process and one silicon oxide deposition process. The method includes removing, through a third etching process controlled based on a pulse signal, a portion of the substrate that was disposed below the removed portion of the first channel region.

Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a first transistor, a first resistive random access memory (RRAM) resistor, and a second RRAM resistor. The first resistor includes a first resistive material layer, a first electrode shared by the second resistor, and a second electrode. The second resistor includes the first electrode, a second resistive material layer, and a third electrode. The first electrode is electrically coupled to the first transistor.

Abstract: The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

Abstract: The present invention relates to a method for synthesizing artepillin C and a synthetic method for synthesizing an intermediate compound for use in preparing artepillin C. The structural formula of artepillin C is shown in the following formula (IV), and the intermediate compound is shown in the following formula (II). The synthesis method includes the following steps: a first reaction step: in the presence of a base initiator, a compound A shown in formula I and 3,3-dimethylallyl bromide are mixed, the reaction continues for a first reaction time and is stopped to generate an intermediate of artepillin C shown in formula II; and a second reaction step: the intermediate of artepillin C is dissolved in an aqueous alcohol solution and then mixed with an alkali metal salt, and the reaction continues for a second reaction time to generate artepillin C.

Abstract: The present invention relates to a method for synthesizing artepillin C and a synthetic method for synthesizing an intermediate compound for use in preparing artepillin C. The structural formula of artepillin C is shown in the following formula (IV), and the intermediate compound is shown in the following formula (II). The synthesis method includes the following steps: a first reaction step: in the presence of a base initiator, a compound A shown in formula I and 3,3-dimethylallyl bromide are mixed, the reaction continues for a first reaction time and is stopped to generate an intermediate of artepillin C shown in formula II; and a second reaction step: the intermediate of artepillin C is dissolved in an aqueous alcohol solution and then mixed with an alkali metal salt, and the reaction continues for a second reaction time to generate artepillin C.

Abstract: A sit/stand assistance includes a seat, a frame, a lifting device, and a driving device. This lifting device has a fixed portion connected to the frame and a movable portion pivoted with the seat so as to move the seat up or down. The driving device includes a link, a power portion, and a working rod. One of the power portion and the working rod is pivoted with the link. The other one is pivoted with the frame. When the power portion pushes the working rod, the working rod extends out so as to make said seat moving up or tilting. Hence, it can assist a user from a seated position to a standing position. So, it matches a user's continuous sit-to-stand motion. Plus, it can be directly applied on an existing flush toilet.

Abstract: A rectangular LED panel includes a transparent cover plate comprising a flanged frame having two recesses on each edge and a plurality of projections on a rear surface; a rectangular substrate comprising a plurality of through holes, a plurality of LED elements on a front surface, a plurality of electrically connected ICs on a rear surface, and four sets of first and second electrical terminals electrically connected to the ICs wherein the ICs are electrically connected to the LED elements; and a base plate comprising four sets of two cavities. The base plate is secured to the rear surface of the substrate and the substrate is secured to the rear surface of the cover plate with the projections being inserted through the through holes to urge against the base plate, and each of the first and second electrical terminals being disposed adjacent to both the recess and cavity.

Abstract: A sit/stand assistance includes a seat, a frame, a lifting device, and a driving device. This lifting device has a fixed portion connected to the frame and a movable portion pivoted with the seat so as to move the seat up or down. The driving device includes a link, a power portion, and a working rod. One of the power portion and the working rod is pivoted with the link. The other one is pivoted with the frame. When the power portion pushes the working rod, the working rod extends out so as to make said seat moving up or tilting. Hence, it can assist a user from a seated position to a standing position. So, it matches a user's continuous sit-to-stand motion. Plus, it can be directly applied on an existing flush toilet.