Patents by Inventor Yun-chung N. Na

Yun-chung N. Na has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8723221
    Abstract: Photodetectors operable to achieve multiplication of photogenerated carriers at ultralow voltages. Embodiments include a first p-i-n semiconductor junction combined with a second p-i-n semiconductor junction to form a monolithic photodetector having at least three terminals. The two p-i-n structures may share either the p-type region or the n-type region as a first terminal. Regions of the two p-i-n structures doped complementary to that of the shared terminal form second and third terminals so that the first and second p-i-n structures are operable in parallel. A multiplication region of the first p-i-n structure is to multiply charge carriers photogenerated within an absorption region of the second p-i-n structure with voltage drops between the shared first terminal and each of the second and third terminals being noncumulative.
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: May 13, 2014
    Assignee: Intel Corporation
    Inventors: Yun-chung N. Na, Yimin Kang
  • Publication number: 20140077327
    Abstract: Photodetectors operable to achieve multiplication of photogenerated carriers at ultralow voltages. Embodiments include a first p-i-n semiconductor junction combined with a second p-i-n semiconductor junction to form a monolithic photodetector having at least three terminals. The two p-i-n structures may share either the p-type region or the n-type region as a first terminal. Regions of the two p-i-n structures doped complementary to that of the shared terminal form second and third terminals so that the first and second p-i-n structures are operable in parallel. A multiplication region of the first p-i-n structure is to multiply charge carriers photogenerated within an absorption region of the second p-i-n structure with voltage drops between the shared first terminal and each of the second and third terminals being noncumulative.
    Type: Application
    Filed: May 22, 2013
    Publication date: March 20, 2014
    Inventors: Yun-chung N. NA, Yimin KANG
  • Patent number: 8625942
    Abstract: An efficient grating coupler for a semiconductor optical mode includes a tapered edge to couple light between waveguide modes constrained by differing waveguide thicknesses. An optical circuit or laser has a waveguide in a rib or strip waveguide section that is of different height (e.g., having different vertical constraints) than a waveguide section that has a grating coupler through which light passes off-circuit. The tapered edge can couple light between the two waveguide sections with very low loss and back-reflection. The low loss and minimal back-reflection enables testing of the photonics circuit on a wafer level, and improved performance through the grating coupler.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: January 7, 2014
    Assignee: Intel Corporation
    Inventors: Yun-Chung N. Na, Haisheng Rong
  • Patent number: 8461624
    Abstract: Photodetectors operable to achieve multiplication of photogenerated carriers at ultralow voltages. Embodiments include a first p-i-n semiconductor junction combined with a second p-i-n semiconductor junction to form a monolithic photodetector having at least three terminals. The two p-i-n structures may share either the p-type region or the n-type region as a first terminal. Regions of the two p-i-n structures doped complementary to that of the shared terminal form second and third terminals so that the first and second p-i-n structures are operable in parallel. A multiplication region of the first p-i-n structure is to multiply charge carriers photogenerated within an absorption region of the second p-i-n structure with voltage drops between the shared first terminal and each of the second and third terminals being noncumulative.
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: June 11, 2013
    Assignee: Intel Corporation
    Inventors: Yun-chung N Na, Yimin Kang
  • Patent number: 8437585
    Abstract: A passive optical waveguide is solely built on a Si substrate while still maintaining high optical quality. Two side-by-side diamond shaped cavities may be etched into the Si wafer and oxide grown on the inner walls of the cavities until the oxide meets at opposing inner vertices of the diamond shaped cavities. An optical waveguide is formed by the inverted, generally triangular cross-sectional, portion of silicon remaining between the top surface of the wafer and the opposing inner vertices.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: May 7, 2013
    Assignee: Intel Corporation
    Inventor: Yun-Chung N. Na
  • Publication number: 20120250007
    Abstract: An efficient grating coupler for a semiconductor optical mode includes a tapered edge to couple light between waveguide modes constrained by differing waveguide thicknesses. An optical circuit or laser has a waveguide in a rib or strip waveguide section that is of different height (e.g., having different vertical constraints) than a waveguide section that has a grating coupler through which light passes off-circuit. The tapered edge can couple light between the two waveguide sections with very low loss and back-reflection. The low loss and minimal back-reflection enables testing of the photonics circuit on a wafer level, and improved performance through the grating coupler.
    Type: Application
    Filed: March 30, 2011
    Publication date: October 4, 2012
    Inventors: Yun-Chung N. Na, Haisheng Rong
  • Publication number: 20120138568
    Abstract: A passive optical waveguide is solely built on a Si substrate while still maintaining high optical quality. Two side-by-side diamond shaped cavities may be etched into the Si wafer and oxide grown on the inner walls of the cavities until the oxide meets at opposing inner vertices of the diamond shaped cavities. An optical waveguide is formed by the inverted, generally triangular cross-sectional, portion of silicon remaining between the top surface of the wafer and the opposing inner vertices.
    Type: Application
    Filed: December 7, 2010
    Publication date: June 7, 2012
    Inventor: Yun-Chung N. Na
  • Publication number: 20120126286
    Abstract: Photodetectors operable to achieve multiplication of photogenerated carriers at ultralow voltages. Embodiments include a first p-i-n semiconductor junction combined with a second p-i-n semiconductor junction to form a monolithic photodetector having at least three terminals. The two p-i-n structures may share either the p-type region or the n-type region as a first terminal. Regions of the two p-i-n structures doped complementary to that of the shared terminal form second and third terminals so that the first and second p-i-n structures are operable in parallel. A multiplication region of the first p-i-n structure is to multiply charge carriers photogenerated within an absorption region of the second p-i-n structure with voltage drops between the shared first terminal and each of the second and third terminals being noncumulative.
    Type: Application
    Filed: November 22, 2010
    Publication date: May 24, 2012
    Applicant: Intel Corporation
    Inventors: Yun-chung N. Na, Yimin Kang