Patents by Inventor Yung S. Liu

Yung S. Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5518956
    Abstract: A process for repairing an electronic army wafer assembly having a short circuit between two non-insulative layers separated by a dielectric layer includes the step of selectively ablating one of the non-insulative layers so as to electrically isolate the situs of the short circuit while maintaining the electrical integrity of the underlying non-insulative layer intact. A laser beam is directed onto the non-insulative layer and scanned in a selected pattern to isolate the situs of the short circuit; the laser is further controlled such that a selected energy density is delivered to the surface to be ablated such that the underlying non-insulative layer is not damaged.
    Type: Grant
    Filed: September 2, 1993
    Date of Patent: May 21, 1996
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Renato Guida, Ching-Yeu Wei
  • Patent number: 5396362
    Abstract: Micromachined organic crystals are used in electro-optic modulators to provide high speed modulation capability. Machined modulator blocks of organic crystal material, such as dimethylamino n-methylstilbazolium tosylate (DAST), have smooth surfaces adapted to couple light between the organic crystal and a medium adjoining the crystal in the electro-optic modulator. Electrodes are disposed with respect to the modulator block such that an electric field is generated along a selected axis corresponding to the polar axis of the organic crystal. A method of machining the soft organic crystal adapted for use as a modulator includes illuminating the organic crystal material via an opaque mask having a selected pattern corresponding to a desired machined pattern for the organic crystal.
    Type: Grant
    Filed: June 18, 1993
    Date of Patent: March 7, 1995
    Assignee: General Electric Company
    Inventors: Christopher P. Yakymyshyn, Yung S. Liu, Renato Guida
  • Patent number: 5288436
    Abstract: A lenticule is bonded to the eye as part of its formation process by curing or final curing the lenticule on the eye. Such lenticules provide a smooth transition from the body of the lenticule to Bowman's layer on which the lenticule is disposed. The lenticule at the time its material or precursor is placed on the eye may vary from being essentially all viscous collagen which flows and must be molded to obtain a desired lenticule configuration to a substantially stable preform which holds its own shape. Such preformed lenticules may be formed using an appropriate mold and photopolymerization or other partial curing techniques to pre-cure the lenticule material to an appropriate stage for application to the eye.
    Type: Grant
    Filed: March 20, 1992
    Date of Patent: February 22, 1994
    Assignee: Colloptics, Inc.
    Inventors: Yung S. Liu, Keith P. Thompson, Raymond P. Gailitis, Seth R. Banks, Gary C. Taylor
  • Patent number: 5196027
    Abstract: An apparatus and process for applying a synthetic lenticule to the cornea of a human eye is disclosed, the process also contemplating selective reprofiling of the lenticule while it is in place over the cornea. The process involves securing the lenticule over the cornea with an adhesive, thus leaving the visual axis of the eye undisturbed or with the peripheral edge thereof being retained by a peripheral slit. A laser delivery system is used to reprofile the lenticule if necessary for refining the refractive power of the lenticule.
    Type: Grant
    Filed: September 12, 1991
    Date of Patent: March 23, 1993
    Inventors: Keith P. Thompson, Yung S. Liu, Seth R. Banks, Raymond P. Gailitis
  • Patent number: 5182188
    Abstract: Self-developing photoresists are developed by exposing the substrate on which they are exposed to a light beam or other energy source which is absorbed by the substrate and which raises the substrate temperature to the thermal decomposition temperature of the overlying photoresist. This exposure may be done through the photoresist layer with a light beam having a frequency to which the photoresist is substantially transparent or may be done from the backside of the substrate using a light beam which is absorbed by the substrate itself if it is sufficiently thin, or by a thin layer disposed on a transparent substrate.
    Type: Grant
    Filed: June 29, 1990
    Date of Patent: January 26, 1993
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Jr., James W. Rose, Renato Guida, Yung S. Liu
  • Patent number: 5167983
    Abstract: A technique for fabricating a patterned conductor on the inner surface of a transparent tube comprises providing a source of conductive material inside a hollow tube and directing actinic radiation onto the tube wall where the deposition of a conductive pattern is desired to deposit conductive material thereon. That conductive deposit may be thickened by subsequent electroless or electroplating. The result is an improved magnetic resonance sensor comprising a hollow tube having "flat" conductor coils disposed on its interior surface.
    Type: Grant
    Filed: August 12, 1991
    Date of Patent: December 1, 1992
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Renato Guida
  • Patent number: 5163956
    Abstract: A lenticule is bonded to the eye as part of its formation process by curing or final curing the lenticule on the eye. Such lenticules provide a smooth transition from the body of the lenticule to Bowman's layer on which the lenticule is disposed. The lenticule at the time its material or precursor is placed on the eye may vary from being essentially all viscous collagen which flows and must be molded to obtain a desired lenticule configuration to a substantially stable preform which holds its own shape. Such preformed lenticules may be formed using an appropriate mold and photopolymerization or other partial curing techniques to pre-cure the lenticule material to an appropriate stage for application to the eye.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: November 17, 1992
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Keith P. Thompson, Raymond P. Gailitis, Seth R. Banks, Gary C. Taylor
  • Patent number: 5140128
    Abstract: An apparatus and method for processing a composite object, the method comprising the steps of providing a composite object, aligning a laser source with a portion of the composite object to be processed, operating the laser source to generate laser beam pulses, and forming composite object elements by applying the pluses of beams from the source to the composite object portion to be processed.
    Type: Grant
    Filed: July 12, 1991
    Date of Patent: August 18, 1992
    Assignee: General Electric Company
    Inventors: Marshall G. Jones, Yung S. Liu, Robert C. Dellert
  • Patent number: 5105215
    Abstract: Photoresist layers are rapidly exposed in a pattern determined by electronically stored data by exposure of the photoresist through a high resolution liquid crystal shutter array.
    Type: Grant
    Filed: March 18, 1991
    Date of Patent: April 14, 1992
    Assignee: General Electric Company
    Inventor: Yung S. Liu
  • Patent number: 5084311
    Abstract: A technique for fabricating a patterned conductor on the inner surface of a transparent tube comprises providing a source of conductive material inside a hollow tube and directing actinic radiation onto the tube wall where the deposition of a conductive pattern is desired to deposit conductive material thereon. That conductive deposit may be thickened by subsequent electroless or electroplating. The result is an improved magnetic resonance sensor comprising a hollow tube having "flat" conductor coils disposed on its interior surface.
    Type: Grant
    Filed: December 28, 1988
    Date of Patent: January 28, 1992
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Renato Guida
  • Patent number: 5082755
    Abstract: Photoresist layers are rapidly exposed in a pattern determined by electronically stored data by exposure of the photoresist through a high resolution liquid crystal shutter array.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: January 21, 1992
    Assignee: General Electric Company
    Inventor: Yung S. Liu
  • Patent number: 5073814
    Abstract: A dielectric layer comprising a plurality of sublayers of alternating composition can provide a reduced dielectric constant while providing the adhesion and laser drilling properties of a higher dielectric constant material. Such multi-sublayer dielectric layers may be formed in situ on a high density interconnect structure or may be laminated thereon after their own formation.
    Type: Grant
    Filed: July 2, 1990
    Date of Patent: December 17, 1991
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Jr., Yung S. Liu
  • Patent number: 5040047
    Abstract: The fluorescent characteristics of a polymer material are modified by the addition of a fluorescent dye which is fluorescent in response to light in a particular portion of the spectrum to render it fluorescent in response to light in that particular portion of the spectrum.
    Type: Grant
    Filed: December 26, 1989
    Date of Patent: August 13, 1991
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Renato Guida, Yung S. Liu, Theodore R. Haller
  • Patent number: 4988412
    Abstract: Selective electrolytic deposition is provided on a body having a conductive surface comprised of two different conductive materials in which one of the conductive materials forms a surface layer upon exposure to a particular ambient environment and wherein that surface layer prevents electroplating on that material in the particular electroplating environment utilized for the electroplating of the desired pattern on the other conductive material.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: January 29, 1991
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Herbert S. Cole, Renato Guida, James W. Rose
  • Patent number: 4960613
    Abstract: The uniformity of a catalyst layer produced by laser decomposition of a catalyst source compound is substantially improved for patterned substrates whose characteristics vary along the path of a conductor line by providing a buffer layer of a metal such as Ti, Cr or Ni over the substrate prior to the laser induced decomposition of the catalyst source compound.
    Type: Grant
    Filed: October 4, 1988
    Date of Patent: October 2, 1990
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Yung S. Liu
  • Patent number: 4882200
    Abstract: A laser, such as an excimer laser, is employed to ablate electroless plating activator material from polymer and other substrates. The treated substrates are then immersed in electroless plating baths for plating of conductive material over remaining activator material. The method is particularly effective for depositing conductive patterns on non-flat substrates and on substrates needing plated-through connections. High resolution patterns are created on any compatible polymer substrate with any compatible electroless plating activator material.
    Type: Grant
    Filed: August 23, 1988
    Date of Patent: November 21, 1989
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Willard T. Grubb
  • Patent number: 4865873
    Abstract: A metal is electrolessly plated on a substrate which is first coated with at least one ablatively-removable layer that is selectively irradiated with laser radiation to obtain a pattern for the deposition of metal on the substrate. The electroless plating solution applied to the substrate after the irradiated substrate is coated with a catalyst also serves to remove the unirradiated portion of the ablatively-removable layer. The method is particularly suited for plating fine lines of metal, especially on non-planar surfaces.
    Type: Grant
    Filed: December 7, 1987
    Date of Patent: September 12, 1989
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Jr., Lionel M. Levinson, Yung S. Liu, Theresa A. Sitnik
  • Patent number: 4857382
    Abstract: Polyimides, polycarbonates, polyetherimides and other highly stable organic polymers are photoetched through the use of deep ultraviolet light produced by a broad area, non-coherent, continuous light source. This method is effective in an oxygen-free environment, but provides slightly higher etch rates in an air ambient as a result of the oxygen in the air ambient. The apparatus in which this photoetching occurs may employ a single light source or a plurality of side-by-side lamps and may include ports which allow continuous transport of samples therethrough.
    Type: Grant
    Filed: April 26, 1988
    Date of Patent: August 15, 1989
    Assignee: General Electric Company
    Inventors: Yung S. Liu, Willard T. Grubb
  • Patent number: 4617085
    Abstract: A method is provided for removing organic material from an organic film in a patterned manner using ultraviolet light at sufficient power density to effect the patterned ablative photodecomposition of an organic film in the form of a blend of aliphatic and aromatic organic material or a copolymer of chemically combined aliphatic units and aromatic units.
    Type: Grant
    Filed: September 3, 1985
    Date of Patent: October 14, 1986
    Assignee: General Electric Company
    Inventors: Herbert S. Cole, Jr., Yung S. Liu, Herbert R. Philipp
  • Patent number: 4327337
    Abstract: A gaseous Raman conversion medium is placed inside a laser resonant cavity to generate tunable laser radiation in the visible, near infrared and far infrared spectral ranges with an improved conversion efficiency and a higher power output. The combination of the laser medium, a gaseous Raman medium and nonlinear sum and difference generation using intracavity conversion produces coherent radiation at a frequency distinct from the frequency emitted by the laser medium. This new frequency is coupled out of the cavity as the desired output.
    Type: Grant
    Filed: January 3, 1980
    Date of Patent: April 27, 1982
    Assignee: General Electric Company
    Inventor: Yung S. Liu