Abstract: A method for manufacturing a multilayer film-deposited substrate includes stacking a plurality of lamination units on the substrate while rotating the substrate around a rotational axis perpendicular to a substrate surface. Each of the lamination units has a plurality of layers formed by a dry deposition process. When a plurality of the multilayer film-deposited substrates are manufactured by the dry deposition process, a deposition is performed in a condition satisfying at least one of the following requirements (1) and (2), with estimating a change with time in a deposition rate: [Tdepo-unit/Tr<(m?0.02) or (m+0.02)<Tdepo-unit/Tr] (1), and [(n?0.02)?Ti/Tr?(n+0.02)] (2). m and n are independently any integer. Ti is a time interval between the depositions among each layer of the plurality of layers. Tdepo-unit is a deposition unit time required for depositing the one lamination unit. Tr is a rotation period of the substrate.

Abstract: A method for manufacturing a multilayer film-deposited substrate includes stacking a plurality of lamination units on the substrate while rotating the substrate around a rotational axis perpendicular to a substrate surface. Each of the lamination units has a plurality of layers formed by a dry deposition process. When a plurality of the multilayer film-deposited substrates are manufactured by the dry deposition process, a deposition is performed in a condition satisfying at least one of the following requirements (1) and (2), with estimating a change with time in a deposition rate: [Tdepo-unit/Tr<(m?0.02) or (m+0.02)<Tdepo-unit/Tr] (1), and [(n?0.02)?Ti/Tr?(n+0.02)] (2). m and n are independently any integer. Ti is a time interval between the depositions among each layer of the plurality of layers. Tdepo-unit is a deposition unit time required for depositing the one lamination unit. Tr is a rotation period of the substrate.