Patents by Inventor Yuri Glukhoy

Yuri Glukhoy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050230614
    Abstract: A mass spectrometry system for continuous control of environment based on the use of an aerosol TOF MS that provides operation with a high duty cycle of up to 98% and can be realized in the form of a mobile unit having a data acquisition and analysis system with three levels of data correlation on the basis of constant interaction between various actuating mechanisms of the system via a central processing unit. The TOF MS is based on the use of quadrupole lenses with angular gradient of the electrostatic field. On the entrance side, the TOF MS contains an ion-optic system that is used for focusing, aligning, and time-modulating the ionized flow of particles and a deflector modulator that provides alternating deflections of the flow of particles between two positions for aligning the flow with two inlet openings into the TOF MS. As a result, two independently analyzed discrete flows of particles pass through the ion mass separation chamber of the TOF MS without interference with each other.
    Type: Application
    Filed: April 19, 2004
    Publication date: October 20, 2005
    Inventor: Yuri Glukhoy
  • Publication number: 20050189484
    Abstract: An aerosol TOF MS of the present invention is based on the use of quadrupole lenses with angular gradient of the electrostatic field. On the entrance side, the TOF MS contains an ion-optic system that is used for focusing, aligning, and time-modulating the ionized flow of particles and a deflector modulator that provides alternating deflections of the flow of particles between two positions for aligning the flow with two inlet openings into the TOF MS. As a result, two independently analyzed discrete flows of particles pass through the ion mass separation chamber of the TOF MS without interference with each other. The charged particles fly in direct and return paths along helical trajectories which extend the length of the flight time. The time of the collision and the magnitude of the collision pulse will contain information about the M/Z ratio for the particles being registered.
    Type: Application
    Filed: February 28, 2004
    Publication date: September 1, 2005
    Inventor: Yuri Glukhoy
  • Publication number: 20050178975
    Abstract: The ionization device of the present invention is intended for use in conjunction with an aerosol TOF MS operating in a continuous mode and is capable of ionizing particulated substances in a wide range of particle masses. In the illustrated embodiment, the ionization unit consists of three coaxial cylindrical bodies having a three aligned longitudinal slits for directing electron beams from externally located electron gun onto the axially arranged flow of droplets. The cylindrical bodies are connected to voltage sources so that the external cylindrical body functions as an anode that extracts electrons from the current-heated filament. The central cylindrical body, in combination with the aforementioned anode, serves as an electron-energy control member for precisely controlling and selecting the energy of electrons that reach the flow of particles, while the inner cylindrical body functions as a decelerating member that can be used for adjusting energy of electrons which reached the flow of particles.
    Type: Application
    Filed: February 18, 2004
    Publication date: August 18, 2005
    Inventor: Yuri Glukhoy
  • Patent number: 6803585
    Abstract: An ECR ion-beam source for use in an ion implanter has a sealed plasma chamber in which plasma is excited by microwave radiation of 2.45 GHz in combination with an external magnetic field generated by permanent magnets surrounding the plasma chamber. The magnets cause electron-cyclotron resonance for the electrons of the plasma thus creating conditions for efficient absorption of the microwave energy. The same magnets generate a magnetic field, which compresses the plasma toward the center for confining the plasma within the plasma chamber. The ion source also has an RF pumping unit that pumps into the plasma the RF energy. The RF pumping unit has a unique additional function of RF magnetron sputtering of solid targets converted into a gaseous working medium used for implantation in an ionized form.
    Type: Grant
    Filed: December 31, 2001
    Date of Patent: October 12, 2004
    Inventor: Yuri Glukhoy
  • Patent number: 6791079
    Abstract: A mass spectrometer of the present invention is based on the use of quadrupole lenses with angular gradient of the electrostatic field. The device consists of an ion source connected to an ion mass separation chamber that contains a plurality of sequentially arranged electrostatic quadrupole lenses which generate a helical electrostatic field for sending ions along helical trajectories in a direct and return stroke. Scattering of positions of points of return is reduced by means of electrostatic mirrors located at the end of the direct stroke, while ions of different masses perform their return strokes along helical trajectories different from those of the direct strokes due to the use of a magnetic and/or electrostatic mirrors. An ion-electron emitting screen is installed on the path of ions in the reverse stroke, and positions of collision of the ions with the ion-electron emitting screen over time and space are detected with the use of micro-channel plate detectors.
    Type: Grant
    Filed: January 29, 2002
    Date of Patent: September 14, 2004
    Inventor: Yuri Glukhoy
  • Patent number: 6783629
    Abstract: A plasma treatment apparatus with improved uniformity of treatment consists of a sealed housing that can be evacuated for the supply of a working gas and that contains a group of plasma-excitation elements in the form of RF or MW antennas, which generate plasma in a confined space within the housing. The surface of the object, e.g., a semiconductor substrate, is treated by this plasma. Depending on the type of the working gas and parameters of the process, the treatment may consist of cleaning, etching, coating, activation, etc. A distinguishing feature of the invention consists in that the plasma-excitation RF or MW antennas are oscillated by means of an oscillation device so that the local non-uniformities of treatment are “smoothened”. The RF and MW antennas can be interchangeable and can be oscillated from the same oscillation drive.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: August 31, 2004
    Inventor: Yuri Glukhoy
  • Publication number: 20030234369
    Abstract: An ECR ion-beam source for use in an ion implanter has a sealed plasma chamber in which plasma is excited by microwave radiation of 2.45 GHz in combination with an external magnetic field generated by permanent magnets surrounding the plasma chamber. The magnets cause electron-cyclotron resonance for the electrons of the plasma thus creating conditions for efficient absorption of the microwave energy. The same magnets generate a magnetic field, which compresses the plasma toward the center for confining the plasma within the plasma chamber. The ion source also has an RF pumping unit that pumps into the plasma the RF energy. The RF pumping unit has a unique additional function of RF magnetron sputtering of solid targets converted into a gaseous working medium used for implantation in an ionized form.
    Type: Application
    Filed: December 31, 2001
    Publication date: December 25, 2003
    Inventor: Yuri Glukhoy
  • Publication number: 20030168172
    Abstract: A plasma treatment apparatus with improved uniformity of treatment consists of a sealed housing that can be evacuated for the supply of a working gas and that contains a group of plasma-excitation elements in the form of RF or MW antennas, which generate plasma in a confined space within the housing. The surface of the object, e.g., a semiconductor substrate, is treated by this plasma. Depending on the type of the working gas and parameters of the process, the treatment may consist of cleaning, etching, coating, activation, etc. A distinguishing feature of the invention consists in that the plasma-excitation RF or MW antennas are oscillated by means of an oscillation device so that the local non-uniformities of treatment are “smoothened”. The RF and MW antennas can be interchangeable and can be oscillated from the same oscillation drive.
    Type: Application
    Filed: March 11, 2002
    Publication date: September 11, 2003
    Inventor: Yuri Glukhoy
  • Publication number: 20030141445
    Abstract: A mass spectrometer of the present invention is based on the use of quadrupole lenses with angular gradient of the electrostatic field. The device consists of an ion source connected to an ion mass separation chamber that contains a plurality of sequentially arranged electrostatic quadrupole lenses which generate a helical electrostatic field for sending ions along helical trajectories in a direct and return stroke. Scattering of positions of points of return is reduced by means of electrostatic mirrors located at the end of the direct stroke, while ions of different masses perform their return strokes along helical trajectories different from those of the direct strokes due to the use of a magnetic and/or electrostatic mirrors. An ion-electron emitting screen is installed on the path of ions in the reverse stroke, and positions of collision of the ions with the ion-electron emitting screen over time and space are detected with the use of micro-channel plate detectors.
    Type: Application
    Filed: January 29, 2002
    Publication date: July 31, 2003
    Inventor: Yuri Glukhoy