Patents by Inventor Yuriy Shusterman

Yuriy Shusterman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
    Publication number: 20220367270
    Abstract: Methods of forming and processing semiconductor devices which utilize a three-color process are described. Certain embodiments relate to the formation of self-aligned contacts for metal gate applications. More particularly, certain embodiments relate to the formation of self-aligned gate contacts utilizing the formation of self-aligned growth pillars. The pillars lead to taller gate heights and increased margins against shorting defects.
    Type: Application
    Filed: July 26, 2022
    Publication date: November 17, 2022
    Applicant: Micromaterials LLC
    Inventors: Yuriy Shusterman, Madhur Sachan, Susmit Singha Roy, Regina Freed, Sanjay Natarajan
  • Self-aligned contact and contact over active gate structures
    Patent number: 11437273
    Abstract: Methods of forming and processing semiconductor devices which utilize a three-color process are described. Certain embodiments relate to the formation of self-aligned contacts for metal gate applications. More particularly, certain embodiments relate to the formation of self-aligned gate contacts utilizing the formation of self-aligned growth pillars. The pillars lead to taller gate heights and increased margins against shorting defects.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: September 6, 2022
    Assignee: Micromaterials LLC
    Inventors: Yuriy Shusterman, Madhur Sachan, Susmit Singha Roy, Regina Freed, Sanjay Natarajan
  • SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
    Publication number: 20200279773
    Abstract: Methods of forming and processing semiconductor devices which utilize a three-color process are described. Certain embodiments relate to the formation of self-aligned contacts for metal gate applications. More particularly, certain embodiments relate to the formation of self-aligned gate contacts utilizing the formation of self-aligned growth pillars. The pillars lead to taller gate heights and increased margins against shorting defects.
    Type: Application
    Filed: February 24, 2020
    Publication date: September 3, 2020
    Applicant: Micromaterials LLC
    Inventors: Yuriy Shusterman, Madhur Sachan, Susmit Singha Roy, Regina Freed, Sanjay Natarajan