Patents by Inventor Yusuke TOMIYORI

Yusuke TOMIYORI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11873415
    Abstract: To provide a water/oil repellent layer-provided substrate having a water/oil repellent layer excellent in abrasion resistance, a deposition material and a method for producing a water/oil repellent layer-provided substrate. The water/oil repellent layer-provided substrate comprises a substrate, an undercoat layer and a water/oil repellent layer in this order. The water/oil repellent layer comprises a condensate of a fluorinated compound having a reactive silyl group, the undercoat layer contains an oxide contains silicon and at least one element of boron and phosphorus, and a ratio of the total molar concentration of boron and phosphorus in the undercoat layer to the molar concentration of silicon in the undercoat layer is from 0.003 to 9.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: January 16, 2024
    Assignee: AGC Inc.
    Inventors: Yoshihito Tokunaga, Maemi Iwahashi, Kenji Ishizeki, Hirokazu Kodaira, Daisuke Kobayashi, Asako Anazawa, Yusuke Tomiyori
  • Patent number: 11542407
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2-Z1-Q1 (R1)b, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, Z1 is a single bond, —(CR2R3)c— (wherein R2 and R3 are a hydrogen atom, a C1-6 monovalent organic group or the like, and c is an integer of from 1 to 10), a specific bond or a bivalent organic group having a specific bond, Q1 is a group having a (b+1) valent ring, R1 is a monovalent organic group having at least one hydrolyzable silyl group, and b is an integer of at least 2.
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: January 3, 2023
    Assignee: AGC Inc.
    Inventors: Taiki Hoshino, Keigo Matsuura, Eiichiro Anraku, Masahiro Ito, Hiromasa Yamamoto, Motoshi Aoyama, Yusuke Tomiyori, Yutaka Furukawa
  • Publication number: 20220298301
    Abstract: To provide a fluorinated ether compound capable of forming a water and oil repellent layer with excellent abrasion resistance on a metal surface of a substrate, a composition, and an article provided with a water and oil repellent layer. The fluorinated ether compound of the present invention is represented by [Rf—(OX)m—O—]j1Y1—Z1[-L1-S—R11]g11[R12]g12. Rf is a perfluoroalkyl group, X is a fluoroalkylene group having at least one fluorine atom, m is an integer of at least 2, Y1 is a single bond or a (j1+1) valent linking group, and Z1 is a (g11+g12+1) valent linking group, L1 is a single bond or a divalent linking group, R11 is a hydrogen atom or a monovalent substituent, R12 is a hydrogen atom or a monovalent substituent, j1 is an integer of at least 1, g11 is an integer of at least 2, and g12 is an integer of at least 0.
    Type: Application
    Filed: May 27, 2022
    Publication date: September 22, 2022
    Applicant: AGC Inc.
    Inventors: Masayuki HARAGUCHI, Makoto UNO, Yusuke TOMIYORI, Toyokazu ENTA
  • Publication number: 20220220318
    Abstract: To provide an article with a water and oil repellent layer, which is excellent in friction resistance. The article with a water and oil repellent layer of the present invention comprises a substrate, a water and oil repellent layer consisting of a hydrolyzed condensation product of a compound represented by the formula [A-(OX)m-]jY1[—Si(R)nL3-n]g, and a silicon oxide layer containing alkali metal atoms that exists between the substrate and the water and oil repellent layer, wherein the average value of the concentration of alkali metal atoms in a predetermined area in the silicon oxide layer is at least a predetermined value. In the formula, X is a fluoroalkylene group, m is at least 2, j, g, and k are at least 1, and Y1 and Y2 are linking groups, R is a monovalent hydrocarbon group, L is a hydrolyzable group or hydroxy group, n is 0 to 2, A is a perfluoroalkyl group or —Y2[—Si(R)nL3-n]n. When A is —Y2[—Si(R)nL3-n]k, j is 1, and when A is a perfluoroalkyl group and j is 1, g is at least 2.
    Type: Application
    Filed: March 21, 2022
    Publication date: July 14, 2022
    Applicant: AGC Inc.
    Inventors: Yusuke TOMIYORI, Motoshi AOYAMA, Kenji ISHIZEKI
  • Publication number: 20220106495
    Abstract: To provide an article with a surface layer, that is excellent in fingerprint stain removability, friction resistance, and adhesion to a protective film of the surface layer. An article with a surface layer, comprising a base material and a surface layer provided on the surface of the base material and characterized in that the surface layer contains groups having —O— between carbon-carbon atoms of a fluoroalkyl group with two or more carbon atoms, and the normalized F intensity obtained by preparing a glass containing 4.96 mass % of fluorine atoms (IGS G4 Fluoride Opal Glass manufactured by Bureau of Analysed Samples Ltd.) as a standard sample, measuring, by an X-ray fluorescence spectrometer, the fluorine atom intensity in the surface layer and the fluorine atom intensity in the standard sample, respectively, and dividing the fluorine atom intensity in the surface layer by the fluorine atom intensity in the standard sample, is from 0.38 to 0.53.
    Type: Application
    Filed: December 15, 2021
    Publication date: April 7, 2022
    Applicant: AGC Inc.
    Inventors: Yusuke TOMIYORI, Taiki HOSHINO, Eiichiro ANRAKU, Kenji ISHIZEKI, Ryoji AKIYAMA
  • Publication number: 20210348024
    Abstract: To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article. The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 11, 2021
    Applicant: AGC Inc.
    Inventors: Keigo MATSUURA, Taiki HOSHINO, Kiyotaka TAKAO, Makoto UNO, Eiichiro ANRAKU, Motoshi AOYAMA, Naoki KATSUKI, Yusuke TOMIYORI, Toyokazu ENTA, Hiromasa YAMAMOTO
  • Publication number: 20210300817
    Abstract: To provide a water/oil repellent layer-provided substrate having improved long-term reliability of abrasion resistance, and a method for producing it. A water/oil repellent layer-provided substrate comprising a substrate, an undercoat layer formed on the surface of the substrate, and a water/oil repellent layer formed on the surface of the undercoat layer, in this order, wherein the alkali deficiency index is higher than 0.0, as determined by a depth profile obtained by X-ray photoelectron spectroscopy (XPS) by C60 ion sputtering from the side of the surface of the water/oil repellent layer, taking the total concentration of fluorine, silicon, aluminum, alkali metal elements and oxygen as 100 at %.
    Type: Application
    Filed: June 8, 2021
    Publication date: September 30, 2021
    Applicant: AGC Inc.
    Inventors: Daisuke KOBAYASHI, Maemi IWAHASHI, Aichi INOUE, Yoshihito TOKUNAGA, Kenji ISHIZEKI, Yusuke TOMIYORI
  • Publication number: 20210284867
    Abstract: To provide a water/oil repellent layer-provided substrate having a water/oil repellent layer excellent in abrasion resistance, a deposition material and a method for producing a water/oil repellent layer-provided substrate. The water/oil repellent layer-provided substrate of the present invention is a water/oil repellent layer-provided substrate comprising a substrate, an undercoat layer and a water/oil repellent layer in this order, wherein the water/oil repellent layer comprises a condensate of a fluorinated compound having a reactive silyl group, the undercoat layer contains an oxide containing silicon and an alkaline earth metal element, and the ratio of the molar concentration of the alkaline earth metal element in the undercoat layer to the molar concentration of silicon in the undercoat layer is from 0.005 to 5.
    Type: Application
    Filed: May 27, 2021
    Publication date: September 16, 2021
    Applicant: AGC INC.
    Inventors: Yoshihito TOKUNAGA, Maemi IWAHASHI, Hirokazu KODAIRA, Kenji ISHIZEKI, Daisuke KOBAYASHI, Yusuke TOMIYORI
  • Publication number: 20210230735
    Abstract: To provide a water/oil repellent layer-provided substrate having a water/oil repellent layer excellent in abrasion resistance, a deposition material and a method for producing a water/oil repellent layer-provided substrate. The water/oil repellent layer-provided substrate of the present invention is a water/oil repellent layer-provided substrate comprising a substrate, an undercoat layer and a water/oil repellent layer in this order, wherein the water/oil repellent layer comprises a condensate of a fluorinated compound having a reactive silyl group, the undercoat layer contains an oxide containing silicon and at least one element selected from the group consisting of titanium, zirconium and aluminum, and the ratio of the total molar concentration of titanium, zirconium and aluminum in the undercoat layer to the molar concentration of silicon in the undercoat layer is from 0.03 to 0.7.
    Type: Application
    Filed: April 15, 2021
    Publication date: July 29, 2021
    Applicant: AGC Inc.
    Inventors: Maemi Iwahashi, Yoshihito Tokunaga, Hirokazu Kodaira, Kenji Ishizeki, Daisuke Kobayashi, Asako Anazawa, Yusuke Tomiyori
  • Publication number: 20210230446
    Abstract: To provide a water/oil repellent layer-provided substrate having a water/oil repellent layer excellent in abrasion resistance, a deposition material and a method for producing a water/oil repellent layer-provided substrate. The water/oil repellent layer-provided substrate of the present invention is a water/oil repellent layer-provided substrate comprising a substrate, an undercoat layer and a water/oil repellent layer in this order, wherein the water/oil repellent layer comprises a condensate of a fluorinated compound having a reactive silyl group, the undercoat layer contains an oxide containing silicon and at least one element of boron and phosphorus, and the ratio of the total molar concentration of boron and phosphorus in the undercoat layer to the molar concentration of silicon in the undercoat layer is from 0.003 to 9.
    Type: Application
    Filed: April 16, 2021
    Publication date: July 29, 2021
    Applicant: AGC Inc.
    Inventors: Yoshihito TOKUNAGA, Maemi IWAHASHI, Kenji ISHIZEKI, Hirokazu KODAIRA, Daisuke KOBAYASHI, Asako ANAZAWA, Yusuke TOMIYORI
  • Patent number: 10981857
    Abstract: The present invention provides a production method of ?-fluoroacrylate ester, a composition containing a highly-pure fluorocyclopropane derivative and a composition containing highly-pure ?-fluoroacrylate ester.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: April 20, 2021
    Assignee: AGC INC.
    Inventors: Takashi Akiya, Mitsugu Kasagawa, Naoki Ichinokawa, Yu Onozaki, Satoshi Kawaguchi, Yusuke Tomiyori, Arata Yasuda
  • Publication number: 20200361814
    Abstract: To provide a substrate with a film excellent in fingerprint stain removability and sliding resistance. The substrate with a film of the present invention comprises a substrate and a film having a poly(oxyfluoroalkylene) chain disposed only on a part of region on the principal plane of the substrate.
    Type: Application
    Filed: August 4, 2020
    Publication date: November 19, 2020
    Applicant: AGO Inc.
    Inventors: Yusuke TOMIYORI, Kiyotaka TAKAO, Taiki HOSHINO, Toyokazu ENTA, Maemi Iwahashi
  • Publication number: 20200157376
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—Z1-Q1 (R1)b, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, Z1 is a single bond, —(CR2R3)c— (wherein R2 and R3 are a hydrogen atom, a C1-6 monovalent organic group or the like, and c is an integer of from 1 to 10), a specific bond or a bivalent organic group having a specific bond, Q1 is a group having a (b+1) valent ring, R1 is a monovalent organic group having at least one hydrolyzable silyl group, and b is an integer of at least 2.
    Type: Application
    Filed: January 28, 2020
    Publication date: May 21, 2020
    Applicant: AGC Inc.
    Inventors: Taiki HOSHINO, Keigo Matsuura, Eiichiro Anraku, Masahiro Ito, Hiromasa Yamamoto, Motoshi Aoyama, Yusuke Tomiyori, Yutaka Furukawa
  • Patent number: 10399916
    Abstract: There is provided a method of producing HFO with which diluent gas is easily separated even at a low boiling point and which has excellent productivity. A method of producing HFO includes: converting HFC of the formula (1) into the HFO of the formula (2) to obtain a first gas composition containing the HFO and the fluorine-containing solvent, CR1R2X1CR3R4X2 (1), CR1R2?CR3R4 (2), where in the formulae, R1 to R3 are H or F, R4 is H, F, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more. One of X1 and X2 is H, and the other of X1 and X2 is F; and separating the fluorine-containing solvent from the first gas composition to obtain a second gas composition containing the HFO.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: September 3, 2019
    Assignee: AGC Inc.
    Inventors: Yusuke Tomiyori, Masahiko Nakamura
  • Publication number: 20190263746
    Abstract: The present invention provides a production method of ?-fluoroacrylate ester, a composition containing a highly-pure fluorocyclopropane derivative and a composition containing highly-pure ?-fluoroacrylate ester.
    Type: Application
    Filed: February 24, 2017
    Publication date: August 29, 2019
    Applicant: AGC INC.
    Inventors: Takashi AKIYA, Mitsugu KASAGAWA, Naoki ICHINOKAWA, Yu ONOZAKI, Satoshi KAWAGUCHI, Yusuke TOMIYORI, Arata YASUDA
  • Patent number: 10384992
    Abstract: A method for manufacturing hydrofluoroolefin, includes: converting hydrofluorocarbon represented by a formula (1) into hydrofluoroolefin (HFO) represented by formula (2) in the presence of carbon dioxide to obtain a first gas composition containing hydrofluoroolefin and carbon dioxide; and separating carbon dioxide contained in the first gas composition to obtain a second gas composition containing HFO, CR1R2X1CR3R4X2 . . . (1), CR1R2?CR3R4 . . . (2), wherein R1 to R3 are each independently hydrogen atom or fluorine atom, R4 is hydrogen atom, fluorine atom, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more, X1 and X2 are each hydrogen atom or fluorine atom where X2 is the fluorine atom when X1 is the hydrogen atom, and X2 is the hydrogen atom when X1 is the fluorine atom.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: August 20, 2019
    Assignee: AGC Inc.
    Inventors: Yusuke Tomiyori, Masahiko Nakamura
  • Publication number: 20180290951
    Abstract: There is provided a method of producing HFO with which diluent gas is easily separated even at a low boiling point and which has excellent productivity. A method of producing HFO includes: converting HFC of the formula (1) into the HFO of the formula (2) to obtain a first gas composition containing the HFO and the fluorine-containing solvent, CR1R2X1CR3R4X2 (1), CR1R2?CR3R4 (2), where in the formulae, R1 to R3 are H or F, R4 is H, F, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more. One of X1 and X2 is H, and the other of X1 and X2 is F; and separating the fluorine-containing solvent from the first gas composition to obtain a second gas composition containing the HFO.
    Type: Application
    Filed: June 13, 2018
    Publication date: October 11, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yusuke TOMIYORI, Masahiko NAKAMURA
  • Publication number: 20180037524
    Abstract: A method for manufacturing hydrofluoroolefin, includes: converting hydrofluorocarbon represented by a formula (1) into hydrofluoroolefin (HFO) represented by formula (2) in the presence of carbon dioxide to obtain a first gas composition containing hydrofluoroolefin and carbon dioxide; and separating carbon dioxide contained in the first gas composition to obtain a second gas composition containing HFO, CR1R2X1CR3R4X2 . . . (1), CR1R2?CR3R4 . . . (2), wherein R1 to R3 are each independently hydrogen atom or fluorine atom, R4 is hydrogen atom, fluorine atom, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more, X1 and X2 are each hydrogen atom or fluorine atom where X2 is the fluorine atom when X1 is the hydrogen atom, and X2 is the hydrogen atom when X1 is the fluorine atom.
    Type: Application
    Filed: October 5, 2017
    Publication date: February 8, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yusuke TOMIYORI, Masahiko NAKAMURA