Abstract: An information processing apparatus includes a display control unit configured to cause a display unit to display a print settings screen for causing an image forming apparatus to print, on a printing medium, a plurality of patches representing colorimetry targets readable by a colorimetric apparatus; a reception unit configured to receive an instruction for the printing via the print settings screen; a print control unit configured to cause the image forming apparatus to start the printing of the plurality of patches based on the received instruction for the printing; an obtaining unit configured to obtain information related to calibration corresponding to the printing medium; and a determination unit configured to determine whether calibration has been executed for the printing medium based on the obtained information related to calibration.

Abstract: An information processing apparatus includes a display control unit configured to cause a display unit to display a print settings screen for causing an image forming apparatus to print, on a printing medium, a plurality of patches representing colorimetry targets readable by a colorimetric apparatus; a reception unit configured to receive an instruction for the printing via the print settings screen; a print control unit configured to cause the image forming apparatus to start the printing of the plurality of patches based on the received instruction for the printing; an obtaining unit configured to obtain information related to calibration corresponding to the printing medium; and a determination unit configured to determine whether calibration has been executed for the printing medium based on the obtained information related to calibration.

Abstract: A light-emitting element includes a first electrode, a second electrode, and a light-emitting layer between the first electrode and the second electrode. The light-emitting element includes a transmittance-increasing layer with increasing transmittance in an optical path of light emitted from the light-emitting layer.

Abstract: The present disclosure relates to an organic light-emitting device including an insulating layer, an organic light-emitting element disposed on the main surface of the insulating layer, and a color filter layer covering the organic light-emitting element and including a first color filter that passes light with a first wavelength and a second color filter that passes light with a second wavelength different from the first wavelength, wherein the concentration of an organic alkali having a nitrogen atom and a hydroxy group contained in the color filter layer is less than 108.2 ng/cm2.

Abstract: A color filter array is provided. The array comprises a first color filter, a second color filter, and a third color filter that are arranged on a base member and respectively have different colors. The first color filter and the third color filter are arranged adjacent to each other, the second color filter includes a portion placed between an end portion of the third color filter and the base member, and the end portion of the third color filter and the portion of the second color filter are in contact with the first color filter.

Abstract: A display device includes a light emitting layer and color filter arrays. The color filter arrays comprise a first color filter array of a first color, and a second color filter array of a second color. The first color filter array comprises a first pair of color filters adjacent to each other with a first clearance therebetween and a second pair of color filters adjacent to each other with a second clearance therebetween. The second color filter array comprises a first color filter positioned between the first pair of color filters and a second color filter positioned between the second pair of color filters. A width of the first clearance is larger than a width of the second clearance. A width of the first color filter is larger than a width of the second color filter. The second color filter partially overlaps with the second pair of color filters.

Abstract: A method for forming a color filter array includes the step of forming a first color filter array by forming a first color filter film on a surface of a base member using a coating method and by patterning the first color filter film and the step of forming a second color filter array by forming a second color filter film on the surface so as to cover the first color filter array using a coating method and by patterning the second color filter film. The color filters in the first color filter array are uneven in the width of the clearance between the color filters and/or the widths of the color filters.

Abstract: A method for forming a color filter array includes the step of forming a first color filter array by forming a first color filter film on a surface of a base member using a coating method and by patterning the first color filter film and the step of forming a second color filter array by forming a second color filter film on the surface so as to cover the first color filter array using a coating method and by patterning the second color filter film. The color filters in the first color filter array are uneven in the width of the clearance between the color filters and/or the widths of the color filters.

Abstract: An inorganic film is dry-etched using plasma with a photoresist pattern serving as a mask, and an organic film is dry-etched using plasma with the photoresist pattern serving as a mask without exposing a pad electrode. The photoresist pattern is removed using a stripping solution. After the removal of the photoresist pattern using a stripping solution, the organic film is etched to expose the pad electrode with the inorganic film that remains after the dry etching of the inorganic film using plasma serving as a mask.

Abstract: An inorganic film is dry-etched using plasma with a photoresist pattern serving as a mask, and an organic film is dry-etched using plasma with the photoresist pattern serving as a mask without exposing a pad electrode. The photoresist pattern is removed using a stripping solution. After the removal of the photoresist pattern using a stripping solution, the organic film is etched to expose the pad electrode with the inorganic film that remains after the dry etching of the inorganic film using plasma serving as a mask.