Patents by Inventor Yuu Kawaguchi

Yuu Kawaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrode structure, liquid crystal display device, projective display device, and method of manufacturing electrode structure
    Patent number: 11971633
    Abstract: An electrode structure includes: a plurality of pixel electrodes arranged separately from each other; and a plurality of dielectric layers laminated in a first direction with respect to the plurality of pixel electrodes, in which the plurality of dielectric layers includes: a first dielectric layer that spreads over the plurality of pixel electrodes in a direction intersecting with the first direction; and a second dielectric layer that includes dielectric material having a refractive index higher than that of the first dielectric layer, sandwiches the first dielectric layer together with the plurality of pixel electrodes, and has a slit at a position overlapping space between pixel electrodes adjacent when viewed from the first direction.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: April 30, 2024
    Assignees: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, SONY GROUP CORPORATION
    Inventors: Takashi Sakairi, Tomoaki Honda, Tsuyoshi Okazaki, Keiichi Maeda, Chiho Araki, Katsunori Dai, Shunsuke Narui, Kunihiko Hikichi, Kouta Fukumoto, Toshiaki Okada, Takuma Matsuno, Yuu Kawaguchi, Yuuji Adachi, Koichi Amari, Hideki Kawaguchi, Seiya Haraguchi, Takayoshi Masaki, Takuya Fujino, Tadayuki Dofuku, Yosuke Takita, Kazuhiro Tamura, Atsushi Tanaka
  • ELECTRODE STRUCTURE, LIQUID CRYSTAL DISPLAY DEVICE, PROJECTIVE DISPLAY DEVICE, AND METHOD OF MANUFACTURING ELECTRODE STRUCTURE
    Publication number: 20220326578
    Abstract: An electrode structure includes: a plurality of pixel electrodes arranged separately from each other; and a plurality of dielectric layers laminated in a first direction with respect to the plurality of pixel electrodes, in which the plurality of dielectric layers includes: a first dielectric layer that spreads over the plurality of pixel electrodes in a direction intersecting with the first direction; and a second dielectric layer that includes dielectric material having a refractive index higher than that of the first dielectric layer, sandwiches the first dielectric layer together with the plurality of pixel electrodes, and has a slit at a position overlapping space between pixel electrodes adjacent when viewed from the first direction.
    Type: Application
    Filed: May 15, 2020
    Publication date: October 13, 2022
    Inventors: TAKASHI SAKAIRI, TOMOAKI HONDA, TSUYOSHI OKAZAKI, KEIICHI MAEDA, CHIHO ARAKI, KATSUNORI DAI, SHUNSUKE NARUI, KUNIHIKO HIKICHI, KOUTA FUKUMOTO, TOSHIAKI OKADA, TAKUMA MATSUNO, YUU KAWAGUCHI, YUUJI ADACHI, KOICHI AMARI, HIDEKI KAWAGUCHI, SEIYA HARAGUCHI, TAKAYOSHI MASAKI, TAKUYA FUJINO, TADAYUKI DOFUKU, YOSUKE TAKITA, KAZUHIRO TAMURA, ATSUSHI TANAKA
  • Etching process, method of manufacturing electronic device, and method of manufacturing polarizing plate
    Patent number: 9316771
    Abstract: An etching process includes: forming a metal film on a substrate having a pattern formation region; forming a mask having a predetermined pattern on the metal film in the pattern formation region, and forming a resist film in part or all of a periphery of the pattern formation region; and dry-etching the metal film in the pattern formation region.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: April 19, 2016
    Assignee: Sony Corporation
    Inventors: Masahiro Kaida, Yuu Kawaguchi
  • ETCHING PROCESS, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND METHOD OF MANUFACTURING POLARIZING PLATE
    Publication number: 20150060396
    Abstract: An etching process includes: forming a metal film on a substrate having a pattern formation region; forming a mask having a predetermined pattern on the metal film in the pattern formation region, and forming a resist film in part or all of a periphery of the pattern formation region; and dry-etching the metal film in the pattern formation region.
    Type: Application
    Filed: August 11, 2014
    Publication date: March 5, 2015
    Applicant: Sony Corporation
    Inventors: Masahiro Kaida, Yuu Kawaguchi