Patents by Inventor Yuuichi Sasaki

Yuuichi Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8187726
    Abstract: A nanoparticle-resin composite material is provided. The material has a transparent characteristic and a refractive index of at least 1.55 in the visible light region. The composite material includes inorganic nanoparticles dispersed in a polymer having a siloxane bond, the inorganic nanoparticles being coated with an organic compound. The organic compound is at least one compound selected from the group consisting of carboxylic acids, phosphinic acid, phosphonic acid, sulfinic acid, sulfonic acid, and thiols, and the selected compound contains an aryl group or an aryloxy group. The polymer is selected from the group consisting of methylphenyl polysiloxane, methylphenyl hydrogen polysiloxane, a mixture methylphenyl polysiloxane and methylphenyl hydrogen polysiloxane, or methylphenyl polysiloxane, methylphenyl hydrogen polysiloxane, and a mixture of methylphenyl polysiloxane and methylphenyl hydrogen polysiloxane.
    Type: Grant
    Filed: August 9, 2006
    Date of Patent: May 29, 2012
    Assignee: Sony Corporation
    Inventors: Yuuichi Sasaki, Mikihisa Mizuno, Sung-kil Lee, Hitoshi Katakura, Teiichi Miyauchi
  • Publication number: 20070036962
    Abstract: A nanoparticle-resin composite material is provided. The material has a transparent characteristic and a refractive index of at least 1.55 in the visible light region. The composite material includes inorganic nanoparticles dispersed in a polymer having a siloxane bond, the inorganic nanoparticles being coated with an organic compound. The organic compound is at least one compound selected from the group consisting of carboxylic acids, phosphinic acid, phosphonic acid, sulfinic acid, sulfonic acid, and thiols, and the selected compound contains an aryl group or an aryloxy group. The polymer is selected from the group consisting of methylphenyl polysiloxane, methylphenyl hydrogen polysiloxane, a mixture methylphenyl polysiloxane and methylphenyl hydrogen polysiloxane, or methylphenyl polysiloxane, methylphenyl hydrogen polysiloxane, and a mixture of methylphenyl polysiloxane and methylphenyl hydrogen polysiloxane.
    Type: Application
    Filed: August 9, 2006
    Publication date: February 15, 2007
    Applicant: SONY CORPORATION
    Inventors: Yuuichi Sasaki, Mikihisa Mizuno, Sung-kil Lee, Hitoshi Katakura, Teiichi Miyauchi
  • Patent number: 4841438
    Abstract: A system for generating a mask pattern for a vector data processor is described having at least a mask register and a vector register in which, when the value of the mask register is "1", a calculation is executed for the corresponding element of the vector register, and when the value of the mask register is "0", a calculation is not executed, in accordance with the so-called calculational mask function. The system includes: a designation unit for designating sequential i elements of "0" or "1" from the head element of the mask register, and the subsequent sequential j elements of "1" or "0"; a control unit for rendering the i elements to be "0" or "1", the j elements to be "1" or "0", and the remaining entire elements to be all "0's" or all 1's, when "i" plus "j" is smaller than a vector length which is the object of calculation of a vector data operand for use in a vector instruction; and a desired mask pattern of "0" or "1" is able to be generated in the mask register.
    Type: Grant
    Filed: September 19, 1986
    Date of Patent: June 20, 1989
    Assignee: Fujitsu Limited
    Inventors: Akira Yoshida, Yuuichi Sasaki