Patents by Inventor Yuusuke IIZUKA

Yuusuke IIZUKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10005856
    Abstract: Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater. m represents an integer of 1 or greater, n represents an integer of 2 or greater, L1 represents a m+1-valent linking group, and L2 represents an n-valent linking group. R1 represents a hydrogen atom or an alkyl group, and R2 represents —SO3?M+ or —SO3R3 (R3 represents an alkyl group or an aryl group). Here, in a case where there are plural R2's, not all of the R2's are —SO3R3. M+ represents a hydrogen ion, an inorganic ion, or an organic ion.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: June 26, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuusuke Iizuka, Satoshi Sano, Keisuke Kodama, Sotaro Inomata, Kuniyuki Kaminaga
  • Patent number: 9889412
    Abstract: There is provided a composite gas separation membrane including a gas separation layer, which is formed to include a polyimide resin, on a support layer having gas permeability, in which the polyimide resin includes a repeating unit represented by the following Formula (I) in Formula (I), X represents a group having a specific structure represented by any of the following Formulae (I-a) to (I-h), in Formula (I), Y1 represents a group represented by the following Formula (II-a) or (II-b), and in Formulae (II-a) and (II-b), R3 represents a substituent group, A represents a dissociable group, p represents 0 or 1, p1 represents an integer of 0 to 2, and p2 represents an integer of 2 or greater.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: February 13, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuusuke Iizuka, Satoshi Sano, Koji Hironaka, Takeshi Narita
  • Publication number: 20170152331
    Abstract: Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, a functional polymer hardened product, a stack or a device including a functional polymer membrane, an amide compound, and a manufacturing method thereof. m represents an integer of 1 or greater, n represents an integer of 2 or greater, L1 represents a m+1-valent linking group, and L2 represents an n-valent linking group. R1 represents a hydrogen atom or an alkyl group, and R2 represents —SO3?M+ or —SO3R3 (R3 represents an alkyl group or an aryl group). Here, in a case where there are plural R2's, not all of the R2's are —SO3R3. M+ represents a hydrogen ion, an inorganic ion, or an organic ion.
    Type: Application
    Filed: February 13, 2017
    Publication date: June 1, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yuusuke IIZUKA, Satoshi SANO, Keisuke KODAMA, Sotaro INOMATA, Kuniyuki KAMINAGA
  • Publication number: 20160184779
    Abstract: There is provided a composite gas separation membrane including a gas separation layer, which is formed to include a polyimide resin, on a support layer having gas permeability, in which the polyimide resin includes a repeating unit represented by the following Formula (I) in Formula (I), X represents a group having a specific structure represented by any of the following Formulae (I-a) to (I-h), in Formula (I), Y1 represents a group represented by the following Formula (II-a) or (II-b), and in Formulae (II-a) and (II-b), R3 represents a substituent group, A represents a dissociable group, p represents 0 or 1, p1 represents an integer of 0 to 2, and p2 represents an integer of 2 or greater.
    Type: Application
    Filed: March 8, 2016
    Publication date: June 30, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuusuke IIZUKA, Satoshi SANO, Koji HIRONAKA, Takeshi NARITA
  • Patent number: 9193817
    Abstract: A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R11, R12, R15, and R16 represent a substituent and A represents an atomic group necessary for forming a cyclic structure.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: November 24, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuusuke Iizuka, Tatsuhiko Obayashi, Naoyuki Morooka, Takayasu Nagai, Ayumi Someya
  • Publication number: 20150018445
    Abstract: A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R11, R12, R15, and R16 represent a substituent and A represents an atomic group necessary for forming a cyclic structure.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuusuke IIZUKA, Tatsuhiko OBAYASHI, Naoyuki MOROOKA, Takayasu NAGAI, Ayumi SOMEYA