Patents by Inventor Yuuta FUJINO

Yuuta FUJINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11353750
    Abstract: Provided is an optically anisotropic film exhibiting reverse wavelength dispersibility with excellent thickness-direction phase differences, a laminate, a circularly polarizing plate, and a display device. The optically anisotropic film of an embodiment of the present invention satisfies the following Requirements 1 to 4. Requirement 1: In a case of irradiation with P-polarized light and S-polarized light, which are linearly polarized light perpendicular to each other, from a direction inclined by 45° from a normal direction of a film surface of the optically anisotropic film, an absorption intensity ratio in a case of irradiation with S-polarized light to an absorption intensity in a case of irradiation with P-polarized light is 1.02 or more in an absorption intensity at a wavelength having a largest absorption in a wavelength range of 700 to 900 nm. Requirement 2: Re(550)<10 nm, Requirement 3: Re(800)<10 nm. Requirement 4: Rth(450)/Rth(550)<1.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: June 7, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Hideyuki Nishikawa, Ryoji Goto, Yuuta Fujino, Mirei Arayasu, Yuki Nakamura
  • Publication number: 20220113461
    Abstract: Provided is an optically anisotropic film exhibiting excellent reverse wavelength dispersibility, a laminate, a circularly polarizing plate, and a display device. The optically anisotropic film includes a J-aggregate having an absorption peak of a J-band on a wavelength side longer than a wavelength of 700 nm, in which an absorption at a wavelength of 700 to 900 nm in a fast axis direction of the optically anisotropic film is larger than an absorption at a wavelength of 700 to 900 nm in a slow axis direction of the optically anisotropic film.
    Type: Application
    Filed: August 25, 2021
    Publication date: April 14, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Ryoji GOTO, Yuuta FUJINO
  • Publication number: 20210382348
    Abstract: Provided is an optically anisotropic film exhibiting reverse wavelength dispersibility with excellent thickness-direction phase differences, a laminate, a circularly polarizing plate, and a display device. The optically anisotropic film of an embodiment of the present invention satisfies the following Requirements 1 to 4. Requirement 1: In a case of irradiation with P-polarized light and S-polarized light, which are linearly polarized light perpendicular to each other, from a direction inclined by 45° from a normal direction of a film surface of the optically anisotropic film, an absorption intensity ratio in a case of irradiation with S-polarized light to an absorption intensity in a case of irradiation with P-polarized light is 1.02 or more in an absorption intensity at a wavelength having a largest absorption in a wavelength range of 700 to 900 nm.
    Type: Application
    Filed: August 12, 2021
    Publication date: December 9, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Hideyuki NISHIKAWA, Ryoji GOTO, Yuuta FUJINO, Mirei ARAYASU, Yuki NAKAMURA
  • Patent number: 10782567
    Abstract: An object of the present invention is to provide an optical film having an optically-anisotropic layer having excellent durability, a polarizing plate and an image display device in which the optical film is used, a polymerizable compound used in the optical film, and a method for manufacturing a 1,4-cyclohexanedicarboxylic acid monoaryl ester. The optical film of the present invention is an optical film having at least an optically-anisotropic layer, in which the optically-anisotropic layer is a layer obtained by polymerizing a polymerizable liquid crystal composition containing a polymerizable compound which has a specific structure, a liquid crystal compound which has a specific structure, and a polymerization initiator.
    Type: Grant
    Filed: May 21, 2018
    Date of Patent: September 22, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Keita Takahashi, Hiroshi Matsuyama, Naozumi Shiraiwa, Taiji Katsumata, Yuuta Fujino, Hiroshi Sato, Kiyoshi Takeuchi, Hiroyuki Hagio, Aiko Yoshida, Hiroaki Nakatsugawa
  • Patent number: 10570112
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: February 25, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa Takahashi, Katsuyuki Watanabe, Kenji Wada, Yuuta Fujino, Takuya Matsumoto, Makoto Takahashi, Hideki Okada, Takehiro Yamane, Takayuki Ito
  • Patent number: 10428042
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: October 1, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Koki Nakamura, Hisato Nagase, Yuuta Fujino, Katsuyuki Watanabe, Taiji Katsumata
  • Publication number: 20180327377
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Application
    Filed: July 25, 2018
    Publication date: November 15, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Kouki NAKAMURA, Satoshi SHIMAMURA, Junichi IMOTO, Motomasa TAKAHASHI, Katsuyuki WATANABE, Kenji WADA, Yuuta FUJINO, Takuya MATSUMOTO, Makoto TAKAHASHI, Hideki OKADA, Takehiro YAMANE, Takayuki ITO
  • Publication number: 20180327378
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.
    Type: Application
    Filed: July 24, 2018
    Publication date: November 15, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Koki NAKAMURA, Hisato NAGASE, Yuuta FUJINO, Katsuyuki WATANABE, Taiji KATSUMATA
  • Patent number: 10093645
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Grant
    Filed: August 24, 2016
    Date of Patent: October 9, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa Takahashi, Katsuyuki Watanabe, Kenji Wada, Yuuta Fujino, Takuya Matsumoto, Makoto Takahashi, Hideki Okada, Takehiro Yamane, Takayuki Ito
  • Publication number: 20180267368
    Abstract: An object of the present invention is to provide an optical film having an optically-anisotropic layer having excellent durability, a polarizing plate and an image display device in which the optical film is used, a polymerizable compound used in the optical film, and a method for manufacturing a 1,4-cyclohexanedicarboxylic acid monoaryl ester. The optical film of the present invention is an optical film having at least an optically-anisotropic layer, in which the optically-anisotropic layer is a layer obtained by polymerizing a polymerizable liquid crystal composition containing a polymerizable compound which has a specific structure, a liquid crystal compound which has a specific structure, and a polymerization initiator.
    Type: Application
    Filed: May 21, 2018
    Publication date: September 20, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keita TAKAHASHI, Hiroshi MATSUYAMA, Naozumi SHIRAIWA, Taiji KATSUMATA, Yuuta FUJINO, Hiroshi SATO, Kiyoshi TAKEUCHI, Hiroyuki HAGIO, Aiko YOSHIDA, Hiroaki NAKATSUGAWA
  • Patent number: 10059686
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.).
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: August 28, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Koki Nakamura, Hisato Nagase, Yuuta Fujino, Katsuyuki Watanabe, Taiji Katsumata
  • Publication number: 20180009777
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.
    Type: Application
    Filed: September 20, 2017
    Publication date: January 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Koki NAKAMURA, Hisato NAGASE, Yuuta FUJINO, Katsuyuki WATANABE, Taiji KATSUMATA
  • Patent number: 9802913
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: October 31, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Koki Nakamura, Hisato Nagase, Yuuta Fujino, Katsuyuki Watanabe, Taiji Katsumata
  • Publication number: 20170001974
    Abstract: An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. (In the formula, each of R1a and R1b is a hydrogen atom or a hydroxy protective group; R2 is a hydroxy group or the like; and R3 is a hydroxy group or the like.
    Type: Application
    Filed: September 19, 2016
    Publication date: January 5, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Koki NAKAMURA, Hisato NAGASE, Yuuta FUJINO, Katsuyuki WATANABE, Taiji KATSUMATA
  • Publication number: 20160362389
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Application
    Filed: August 24, 2016
    Publication date: December 15, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Kouki NAKAMURA, Satoshi SHIMAMURA, Junichi IMOTO, Motomasa TAKAHASHI, Katsuyuki WATANABE, Kenji WADA, Yuuta FUJINO, Takuya MATSUMOTO, Makoto TAKAHASHI, Hideki OKADA, Takehiro YAMANE, Takayuki ITO
  • Patent number: 9475835
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: October 25, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa Takahashi, Katsuyuki Watanabe, Kenji Wada, Yuuta Fujino, Takuya Matsumoto, Makoto Takahashi, Hideki Okada, Takehiro Yamane, Takayuki Ito
  • Publication number: 20160024132
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Application
    Filed: October 2, 2015
    Publication date: January 28, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Kouki NAKAMURA, Satoshi SHIMAMURA, Junichi IMOTO, Motomasa TAKAHASHI, Katsuyuki WATANABE, Kenji WADA, Yuuta FUJINO, Takuya MATSUMOTO, Makoto TAKAHASHI, Hideki OKADA, Takehiro YAMANE, Takayuki ITO
  • Patent number: 9221865
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: December 29, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa Takahashi, Katsuyuki Watanabe, Kenji Wada, Yuuta Fujino, Takuya Matsumoto, Makoto Takahashi, Hideki Okada, Takehiro Yamane, Takayuki Ito
  • Patent number: 9187514
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: November 17, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa Takahashi, Katsuyuki Watanabe, Kenji Wada, Yuuta Fujino, Takuya Matsumoto, Makoto Takahashi, Hideki Okada, Takehiro Yamane, Takayuki Ito
  • Publication number: 20150152131
    Abstract: A compound represented by a formula [1D] as shown below (wherein R1A, R1B, R2A, R2B, R3A and R3B represent a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
    Type: Application
    Filed: February 12, 2015
    Publication date: June 4, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Kouki NAKAMURA, Satoshi SHIMAMURA, Junichi IMOTO, Motomasa TAKAHASHI, Katsuyuki WATANABE, Kenji WADA, Yuuta FUJINO, Takuya MATSUMOTO, Makoto TAKAHASHI, Hideki OKADA, Takehiro YAMANE, Takayuki ITO