Patents by Inventor Yuval PERETS

Yuval PERETS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240180619
    Abstract: Apparatus is described including a tool, the tool including a shaft having a distal portion that is sized and shaped to be inserted into a subject during a surgical procedure. The tool includes a tissue-treatment tip, at the distal portion, that defines a beam deflector. An optical fiber is positioned to emit laser energy into the beam deflector. The beam deflector has a deflector surface, a first portion of which is shaped and positioned to reflect the laser energy toward a tissue-treatment tip surface, and a second portion of which is configured to absorb the laser energy and thermally conduct the absorbed energy to the tissue-treatment tip surface. The tissue-treatment tip surface is configured to thermally conduct the absorbed energy to the tissue by contacting the tissue. Other embodiments are also described.
    Type: Application
    Filed: February 16, 2024
    Publication date: June 6, 2024
    Applicant: Tag Dream Medical Ltd.
    Inventors: Yuval PERETS, Yaron Tal, Dan Nabel, Dan Michael
  • Patent number: 11638591
    Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.
    Type: Grant
    Filed: April 29, 2022
    Date of Patent: May 2, 2023
    Assignee: TAG DREAM MEDICAL LTD.
    Inventors: Yuval Perets, Yaron Tal, Dan Michael, Ran Weisman, Hagay Sitry, Hagay Botansky, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
  • Publication number: 20220265296
    Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.
    Type: Application
    Filed: April 29, 2022
    Publication date: August 25, 2022
    Applicant: TAG DREAM MEDICAL, LTD.
    Inventors: Yuval PERETS, YARON TAL, DAN MICHAEL, RAN WEISMAN, HAGAY SITRY, HAGAY BOTANSKY, YEHUDA BEN AMI, ZACHARY SHANE SACKS, DAN NABEL
  • Patent number: 11369398
    Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.
    Type: Grant
    Filed: August 18, 2021
    Date of Patent: June 28, 2022
    Assignee: TAG DREAM MEDICAL LTD.
    Inventors: Yuval Perets, Yaron Tal, Dan Michael, Ran Weisman, Hagay Sitry, Hagay Botansky, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
  • Publication number: 20220054193
    Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.
    Type: Application
    Filed: August 18, 2021
    Publication date: February 24, 2022
    Applicant: TAG DREAM MEDICAL LTD.
    Inventors: Yuval PERETS, Yaron TAL, Dan MICHAEL, Ran WEISMAN, Hagay Sitry, Hagay BOTANSKY, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
  • Patent number: 10670955
    Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.
    Type: Grant
    Filed: September 4, 2018
    Date of Patent: June 2, 2020
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
  • Patent number: 10578975
    Abstract: The invention relates to a method for correcting the critical dimension uniformity of a photomask for semiconductor lithography, comprising the following steps: determining a transfer coefficient as a calibration parameter, correcting the photomask by writing pixel fields, verifying the photomask corrected thus, wherein a transfer coefficient is used for verifying the corrected photomask, said transfer coefficient being obtained from a measured scattering function of pixel fields.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: March 3, 2020
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.
    Inventors: Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl, Yuval Perets
  • Publication number: 20190107783
    Abstract: The invention relates to a method for correcting the critical dimension uniformity of a photomask for semiconductor lithography, comprising the following steps: determining a transfer coefficient as a calibration parameter, correcting the photomask by writing pixel fields, verifying the photomask corrected thus, wherein a transfer coefficient is used for verifying the corrected photomask, said transfer coefficient being obtained from a measured scattering function of pixel fields.
    Type: Application
    Filed: October 5, 2018
    Publication date: April 11, 2019
    Inventors: Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl, Yuval Perets
  • Publication number: 20190004417
    Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.
    Type: Application
    Filed: September 4, 2018
    Publication date: January 3, 2019
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
  • Patent number: 10095101
    Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: October 9, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
  • Publication number: 20160370697
    Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.
    Type: Application
    Filed: June 22, 2016
    Publication date: December 22, 2016
    Inventors: Sergey OSHEMKOV, Vladimir KRUGLYAKOV, Frederik BLUMRICH, Yuval PERETS