Patents by Inventor Yuval PERETS
Yuval PERETS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240180619Abstract: Apparatus is described including a tool, the tool including a shaft having a distal portion that is sized and shaped to be inserted into a subject during a surgical procedure. The tool includes a tissue-treatment tip, at the distal portion, that defines a beam deflector. An optical fiber is positioned to emit laser energy into the beam deflector. The beam deflector has a deflector surface, a first portion of which is shaped and positioned to reflect the laser energy toward a tissue-treatment tip surface, and a second portion of which is configured to absorb the laser energy and thermally conduct the absorbed energy to the tissue-treatment tip surface. The tissue-treatment tip surface is configured to thermally conduct the absorbed energy to the tissue by contacting the tissue. Other embodiments are also described.Type: ApplicationFiled: February 16, 2024Publication date: June 6, 2024Applicant: Tag Dream Medical Ltd.Inventors: Yuval PERETS, Yaron Tal, Dan Nabel, Dan Michael
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Patent number: 11638591Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.Type: GrantFiled: April 29, 2022Date of Patent: May 2, 2023Assignee: TAG DREAM MEDICAL LTD.Inventors: Yuval Perets, Yaron Tal, Dan Michael, Ran Weisman, Hagay Sitry, Hagay Botansky, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
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Publication number: 20220265296Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.Type: ApplicationFiled: April 29, 2022Publication date: August 25, 2022Applicant: TAG DREAM MEDICAL, LTD.Inventors: Yuval PERETS, YARON TAL, DAN MICHAEL, RAN WEISMAN, HAGAY SITRY, HAGAY BOTANSKY, YEHUDA BEN AMI, ZACHARY SHANE SACKS, DAN NABEL
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Patent number: 11369398Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.Type: GrantFiled: August 18, 2021Date of Patent: June 28, 2022Assignee: TAG DREAM MEDICAL LTD.Inventors: Yuval Perets, Yaron Tal, Dan Michael, Ran Weisman, Hagay Sitry, Hagay Botansky, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
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Publication number: 20220054193Abstract: A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.Type: ApplicationFiled: August 18, 2021Publication date: February 24, 2022Applicant: TAG DREAM MEDICAL LTD.Inventors: Yuval PERETS, Yaron TAL, Dan MICHAEL, Ran WEISMAN, Hagay Sitry, Hagay BOTANSKY, Yehuda Ben Ami, Zachary Shane Sacks, Dan Nabel
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Patent number: 10670955Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.Type: GrantFiled: September 4, 2018Date of Patent: June 2, 2020Assignee: CARL ZEISS SMT GMBHInventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
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Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography
Patent number: 10578975Abstract: The invention relates to a method for correcting the critical dimension uniformity of a photomask for semiconductor lithography, comprising the following steps: determining a transfer coefficient as a calibration parameter, correcting the photomask by writing pixel fields, verifying the photomask corrected thus, wherein a transfer coefficient is used for verifying the corrected photomask, said transfer coefficient being obtained from a measured scattering function of pixel fields.Type: GrantFiled: October 5, 2018Date of Patent: March 3, 2020Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.Inventors: Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl, Yuval Perets -
Method for Correcting the Critical Dimension Uniformity of a Photomask for Semiconductor Lithography
Publication number: 20190107783Abstract: The invention relates to a method for correcting the critical dimension uniformity of a photomask for semiconductor lithography, comprising the following steps: determining a transfer coefficient as a calibration parameter, correcting the photomask by writing pixel fields, verifying the photomask corrected thus, wherein a transfer coefficient is used for verifying the corrected photomask, said transfer coefficient being obtained from a measured scattering function of pixel fields.Type: ApplicationFiled: October 5, 2018Publication date: April 11, 2019Inventors: Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl, Yuval Perets -
Publication number: 20190004417Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.Type: ApplicationFiled: September 4, 2018Publication date: January 3, 2019Applicant: Carl Zeiss SMT GmbHInventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
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Patent number: 10095101Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.Type: GrantFiled: June 22, 2016Date of Patent: October 9, 2018Assignee: Carl Zeiss SMT GmbHInventors: Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich, Yuval Perets
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Publication number: 20160370697Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.Type: ApplicationFiled: June 22, 2016Publication date: December 22, 2016Inventors: Sergey OSHEMKOV, Vladimir KRUGLYAKOV, Frederik BLUMRICH, Yuval PERETS