Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.

Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.

Abstract: The present disclosure relates to a cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a cleaning assembly for a substrate processing chamber includes a distribution ring. The distribution ring comprises a body with an inlet and an outlet. The outlet is fluidly coupled to an internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber. The cleaning assembly includes a cleaning conduit configured to fluidly couple a gas manifold to the distribution ring for diverting a first portion of cleaning fluid from the gas manifold to the distribution ring.

Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.

Abstract: A space launch system and method through electromagnetic pushing. The space launch system comprises an energy storage subsystem, an energy conversion subsystem, a linear motor subsystem, and a control maintenance subsystem. The space launch system converts the electric energy into an electromagnetic force. Through the electromagnetic force, a rocket is pushed to be accelerated to a certain speed along an electromagnetic launching track to realize the launching of the rocket.

Abstract: A class of five-membered fused with six-membered heterocyclic compounds represented by formula I and a pharmaceutical composition, preparation, and an application thereof are disclosed. These compounds have TRK kinase inhibitory activity and can treat diseases related to TRK dysfunction.

Abstract: A transportation management system determines trip defects associated with trip access points based on historical trip data. The transportation management system aggregates historical trip data in a spatial index. The transportation management system represents the spatial index using a geographic grid including grid cells at various resolutions. The transportation management system determines a defect score for individual grid cells at a given resolution based on the trip data in the spatial index corresponding to the grid cell. The transportation management system uses the defect scores for grid cells to provide a dynamic user experience to users of the transportation management system (e.g., riders or drivers) on their respective client devices.

Abstract: Provided are a preparation and applications of a six-membered fused with six-membered heterocyclic compound, specifically, provided in the present invention is a compound as represented by formula I as follows, where the definitions of the groups are as described in the description. The compound has TRK kinase inhibiting activity and can serve as a pharmaceutical composition for treating TRK dysfunction-related diseases.

Abstract: A coordination server receives a request from a client device of a rider for transportation from a first location. The coordination server identifies a frequent spot based on the first location. The frequent spot is associated with a particular location and represents a plurality of historic first locations within a threshold distance from the frequent spot. The coordination server identifies a closest road segment with respect to the frequent spot. The closest road segment is a road segment of a plurality of road segments of an electronic map representing a geographic area around the first location. The coordination server determines a pickup side of the closest road segment based on the first location and the closest road segment. The coordination server sends, to a client device of a driver, a route to the first location such that the driver arrives on the pickup side of the closest road segment.

Abstract: A gas distribution apparatus is disclosed. The apparatus includes a faceplate and a blocker plate. An adjustment mechanism is coupled to the blocker plate and is operable to position the blocker plate relative to the faceplate in order to modify a flow profile of a gas flowing therethrough. A method of processing a substrate using the gas distribution is also disclosed.

Abstract: A method for preparing an alternating arrangement silver-copper lateral composite ingot, including: using a concave roller set; manufacturing a copper frame having a fixed width according to a negative tolerance of a width of the grooves of the concave roller, and corresponding copper bars and silver bars, and performing a surface treatment on the copper frame, the copper bars, and the silver bars; and then arranging different number of copper bars and silver bars at internals as needed and tightly placing into the copper frame to form a composite blank, i.e., a composite ingot. A method for preparing an alternating arrangement silver-copper lateral composite strip is further provided, and the silver-copper lateral composite ingot prepared by the method for preparing the alternating arrangement silver-copper lateral composite ingot is used to prepare the silver-copper lateral composite strip.

Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

Abstract: Embodiments herein relate to gas distribution apparatuses. In one aspect, the disclosure herein relates to a showerhead including a body having an upper surface and a lower surface. A thermal choke is disposed adjacent a perimeter of the body. The thermal choke includes a plurality of interleaved channels. One or more apertures are disposed between the upper surface and the lower surface of the body.

Abstract: A faceplate for a processing chamber is disclosed. The faceplate has a body with a plurality of apertures formed therethrough. A flexure is formed in the body partially circumscribing the plurality of apertures. A cutout is formed through the body on a common radius with the flexure. One or more bores extend from a radially inner surface of the cutout to an outer surface of the body. A heater is disposed between flexure and the plurality of apertures. The flexure and the cutout are thermal chokes which limit heat transfer thereacross from the heater.

Abstract: A method for preparing an alternating arrangement silver-copper lateral composite ingot, including: using a concave roller set; manufacturing a copper frame having a fixed width according to a negative tolerance of a width of the grooves of the concave roller, and corresponding copper bars and silver bars, and performing a surface into the copper frame to form a composite blank, i.e., a composite ingot. A method for preparing an alternating arrangement silver-copper lateral composite strip is further provided, and the silver-copper lateral composite ingot prepared by the method for preparing the alternating arrangement silver-copper lateral composite ingot is used to prepare the silver-copper lateral composite strip.

Abstract: Systems and methods for a process chamber that decreases the severity and occurrence of substrate defects due to loosened scale is discussed herein. A gas distribution assembly is disposed in a process chamber and includes a faceplate with a plurality of apertures formed therethrough and a second member. The faceplate is coupled to the second member which is configured to couple to the faceplate to reduce an exposed area of the faceplate and minimize an available area for material buildup during the release of gas into the process chamber. The second member is further configured to improve the glow of precursors into the process chamber. The gas distribution assembly can be heated before and during process chamber operations, and can remain heated between process chamber operations.

Abstract: Systems and methods for depositing a film in a PECVD chamber while reducing residue buildup in the chamber. In some embodiments disclosed herein, a processing chamber includes a chamber body, a substrate support, a showerhead, and one or more heaters configured to heat the showerhead. In some embodiments, the processing chamber includes a controller.