Abstract: The embodiments include an array in intimate adjacent contact with a substrate foundation. The array has a plurality of radio frequency (RF) witness films overlain on the substrate foundation. Each RF witness film is a unit cell defined in a three-dimensional coordinate frame of reference, and is centered at an origin of the three-dimensional coordinate frame of reference. Each RF witness film in the plurality of RF witness films is equally-spaced from adjacent RF witness films.

Abstract: The embodiments are directed to protecting objects having sensitive electronics from high power radio frequency (HPRF) interference signals. An object with the sensitive electronics has a thin film applied to the object's outer surface. The thin film conforms to the object's outer surface contours. The thin film has a substrate foundation, an array in intimate adjacent contact with the substrate foundation. The array has a plurality of radio frequency (RF) witness films overlain on the substrate foundation. Each RF witness film in the plurality of RF witness films is equally-spaced from adjacent RF witness films.

Abstract: A sensor configured to sense when a force is applied to a surface includes a capacitive structure having a first conductive layer, a dielectric layer, and a second conductive layer. The dielectric layer is overlain on the first conductive layer and the second conductive layer is overlain on the dielectric layer. A glass superstrate has a first side and a second side, with the first side overlain on the second conductive layer. The force is applied to the second side of the glass superstrate. The force results from an object attached to the second side of the glass superstrate. The force causes capacitance changes between the first and second conductive layers. The force can be compressive or tensile, depending on whether the object is attached by magnet or adhesive.

Abstract: The embodiments are directed to radio frequency witness films. The embodiments include a unit cell in a three-dimensional coordinate frame of reference defined by an x-axis, a y-axis, and a z-axis. The unit cell is centered at an origin of the three-dimensional coordinate frame of reference. The unit cell includes a substrate, a first conductive layer, a dielectric layer, and a second conductive layer. The second conductive layer has at least two microstrip extensions that are perpendicular to each other in the x-y plane.

Abstract: Embodiments are directed to sensors that detect objects attached to a vehicle. The sensor includes a layered capacitive structure. The sensors utilize a deformable dielectric layer sandwiched between two conductive layers. The layered capacitive structure measures capacitance changes caused by an applied force to the uppermost layer of the capacitive structure.

Abstract: A selective area atomic layer deposition process that can deposit conductive materials onto one homopolymer region in a diblock copolymer. The diblock copolymer generates a large area self assembled substrate with nanoscale homopolymer regions arrayed into predictable patterns. Combining these two technologies allows formation of plasmonic surfaces without expensive lithographic processing.

Abstract: An invention generally relating to minimizing performance loss of the system when fitted with an electromagnetic interference (EMI) shield.

Abstract: An increased plasmon resonance frequency stability drawn from a refractive index gradient spanning negative and positive values includes a two-dimensional array of tapered nanowells. A multilayer of alternating materials is associated with the two-dimensional array of tapered nanowells. The multilayer of alternating materials are alternating layers of electrical conductors and electrical insulators.

Abstract: A selective area atomic layer deposition process and apparatus that can deposit conductive materials onto one homopolymer region in a diblock copolymer. The diblock copolymer generates a large area self assembled substrate with nanoscale homopolymer regions arrayed into predictable patterns. Combining these two technologies allows formation of plasmonic surfaces without expensive lithographic processing.

Abstract: Nanoplasmonic cavities for photovoltaic applications include at least one transparent conductive substrate. A first plasmonic electrically conductive nanostructure layer is associated with the transparent conductive substrate. At least one photoabsorber layer is associated with the first plasmonic electrically conductive nanostructure layer. At least one electron transfer layer is associated with the photoabsorber layer. A second plasmonic electrically conductive nanostructure layer is associated with the electron transfer layer. Multiple nanoplasmonic cavities can be electrically connected to provide greater photovoltaic efficiency.

Abstract: Nanoplasmonic cavities for photovoltaic applications include at least one transparent conductive substrate. The nanoplasmonic cavities comprising a sandwich of layers incorporating a first plasmonic electrically conductive nanostructure layer, at least one photoabsorber layer and a at least one electron transfer layer and a second plasmonic electrically conductive nanostructure layer.

Abstract: Nanoplasmonic cavities for photovoltaic applications include at least one transparent conductive substrate. A first plasmonic electrically conductive nanostructure layer is associated with the transparent conductive substrate. At least one photoabsorber layer is associated with the first plasmonic electrically conductive nanostructure layer. At least one electron transfer layer is associated with the photoabsorber layer. A second plasmonic electrically conductive nanostructure layer is associated with the electron transfer layer.