Patents by Inventor Ze Xi Deng

Ze Xi Deng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for test pattern for lithography process
    Patent number: 8921013
    Abstract: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural patterns containing in the first mask pattern.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: December 30, 2014
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Chi-Yuan Hung, Bin Zhang, Ze Xi Deng, Li Guo Zhang
  • SYSTEM AND METHOD FOR TEST PATTTERN FOR LITHOGRAPHY PROCESS
    Publication number: 20130302725
    Abstract: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural patterns containing in the first mask pattern.
    Type: Application
    Filed: July 12, 2013
    Publication date: November 14, 2013
    Inventors: CHI-YUAN HUNG, Bin Zhang, Ze Xi Deng, Li Guo Zhang
  • System and method for test pattern for lithography process
    Patent number: 8501376
    Abstract: A method for performing a photolithography process includes providing a reticle on a projection apparatus, the reticle having a test pattern defined thereon, the test pattern including a plurality of one-dimensional structures and a plurality of two-dimensional structures. The test pattern defined on the reticle is transferred to at least one area on a wafer. The projection apparatus is focused on the test pattern transferred on the wafer during a photolithography process to perform a process monitoring.
    Type: Grant
    Filed: March 12, 2011
    Date of Patent: August 6, 2013
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Chi Yuan Hung, Bin Zhang, Ze Xi Deng, Li Guo Zhang
  • SYSTEM AND METHOD FOR TEST PATTERN FOR LITHOGRAPHY PROCESS
    Publication number: 20110318673
    Abstract: A method for performing a photolithography process includes providing a reticle on a projection apparatus, the reticle having a test pattern defined thereon, the test pattern including a plurality of one-dimensional structures and a plurality of two-dimensional structures. The test pattern defined on the reticle is transferred to at least one area on a wafer. The projection apparatus is focused on the test pattern transferred on the wafer during a photolithography process to perform a process monitoring.
    Type: Application
    Filed: March 12, 2011
    Publication date: December 29, 2011
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: CHI YUAN HUNG, Bin Zhang, Ze Xi Deng, Li Guo Zhang