Abstract: A 3D model of AC electrical conductivity (at a given frequency) of an anatomic volume can be created by obtaining two MRI images of the anatomic volume, where the two images have different repetition times. Then, for each voxel in the anatomic volume, a ratio IR of the intensity of the corresponding voxels in the two MRI images is calculated. This calculated IR is then mapped into a corresponding voxel of a 3D model of AC electrical conductivity at the given frequency. The given frequency is below 1 MHz (e.g., 200 kHz). In some embodiments, the 3D model of AC electrical conductivity at the given frequency is used to determine the positions for the electrodes in TTFields (Tumor Treating Fields) treatment.

Abstract: When electrodes are used to impose an electric field in target tissue within an anatomic volume (e.g., to apply TTFields to treat a tumor), the position of the electrodes can be optimized by obtaining electrical conductivity measurements in an anatomic volume and generating a 3D map of the conductivity directly from the obtained electrical conductivity or resistivity measurements, without segmenting the anatomic volume into tissue types. A location of the target tissue is identified within the anatomic volume, and the positions for the electrodes are determined based on the 3D map of electrical conductivity and the position of the target tissue.

Abstract: When electrodes are used to impose an electric field in target tissue within an anatomic volume (e.g., to apply TTFields to treat a tumor), the position of the electrodes can be optimized by obtaining electrical conductivity measurements in an anatomic volume and generating a 3D map of the conductivity directly from the obtained electrical conductivity or resistivity measurements, without segmenting the anatomic volume into tissue types. A location of the target tissue is identified within the anatomic volume, and the positions for the electrodes are determined based on the 3D map of electrical conductivity and the position of the target tissue.

Abstract: Embodiments receive images of a body area of a patient; identify abnormal tissue in the image; generate a data set with the abnormal tissue masked out; deform a model template in space so that features in the deformed model template line up with corresponding features in the data set; place data representing the abnormal tissue back into the deformed model template; generate a model of electrical properties of tissues in the body area based on the deformed and modified model template; and determine an electrode placement layout that maximizes field strength in the abnormal tissue by using the model of electrical properties to simulate electromagnetic field distributions in the body area caused by simulated electrodes placed respective to the body area. The layout can then be used as a guide for placing electrodes respective to the body area of the patient to apply TTFields to the body area.

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

Abstract: Tumors in portions of a subject's body that have a longitudinal axis (e.g., the torso, head, and arm) can be treated with TTFields by affixing first and second sets of electrodes at respective positions that are longitudinally prior to and subsequent to a target region. An AC voltage with a frequency of 100-500 kHz is applied between these sets of electrodes. This imposes an AC electric field with field lines that run through the target region longitudinally. The field strength is at least 1 V/cm in at least a portion of the target region. In some embodiments, this approach is combined with the application of AC electric fields through the target region in a lateral direction (e.g., front to back and/or side to side) in order to apply AC electric fields with different orientations to the target region.

Abstract: Tumors in portions of a subject's body that have a longitudinal axis (e.g., the torso, head, and arm) can be treated with TTFields by affixing first and second sets of electrodes at respective positions that are longitudinally prior to and subsequent to a target region. An AC voltage with a frequency of 100-500 kHz is applied between these sets of electrodes. This imposes an AC electric field with field lines that run through the target region longitudinally. The field strength is at least 1 V/cm in at least a portion of the target region. In some embodiments, this approach is combined with the application of AC electric fields through the target region in a lateral direction (e.g., front to back and/or side to side) in order to apply AC electric fields with different orientations to the target region.

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract: When electrodes are used to impose an electric field in target tissue within an anatomic volume (e.g., to apply TTFields to treat a tumor), the position of the electrodes can be optimized by obtaining electrical conductivity measurements in an anatomic volume and generating a 3D map of the conductivity directly from the obtained electrical conductivity or resistivity measurements, without segmenting the anatomic volume into tissue types. A location of the target tissue is identified within the anatomic volume, and the positions for the electrodes are determined based on the 3D map of electrical conductivity and the position of the target tissue.

Abstract: A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract: An optical device includes a planar subwavelength grating (10) formed in a dielectric material and having a laterally varying, continuous grating vector. When used to modulate a beam of laterally uniform polarized electromagnetic radiation incident thereon, the device passes the incident beam with a predetermined, laterally varying transmissivity and/or retardation. When used to effect polarization state transformation, the device transforms a beam of electromagnetic radiation incident thereon into a transmitted beam having a predetermined, laterally varying polarization state. The device (214) can be used to provide radially polarized electromagnetic radiation for accelerating subatomic particles or for cutting a workpiece. The device (108) also can be used, in conjuction with a mechanism for measuring the lateral variation of the intensity of the transmitted beam, for measuring all four Stokes parameters that define the polarization state of the incident beam.

Abstract: An optical device includes a plurality of metallic stripes, arranged in a substantially planar, subwavelength grating having a laterally varying, continuous grating vector, deposited on a substrate such as GaAs or ZnSe. When used as a polarizer, the device passes a laterally uniform polarized beam of electromagnetic radiation incident thereon with a predetermined, laterally varying transmissivity. When used to effect polarization state transformation, the device transforms a beam of electromagnetic radiation incident thereon into a transmitted beam having a predetermined, laterally varying polarization state. The device can be used to provide radially polarized electromagnetic radiation for accelerating subatomic particles or for cutting a workpiece. The device also can be used, in conjunction with a mechanism for measuring the lateral variation of the intensity of the transmitted beam, for measuring the polarization state of the incident beam.