Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

Abstract: This application provides a short-range wireless communication method and a related device. The method includes: generating a transmission frame. The transmission frame includes a frame header and a data domain, phase shift keying modulation is used for the frame header, and quadrature amplitude modulation or phase shift keying modulation is used for the data domain. The method includes sending the transmission frame. In this application, the phase shift keying modulation is used for the frame header of the transmission frame, and the phase shift keying modulation or the quadrature amplitude modulation with a same bandwidth is used for the data domain.

Abstract: A slow light system includes a substrate and a metal layer formed thereon, the metal layer having a graded grating structure formed at a surface thereof, wherein the grating depth of the grating structure is sized such that surface-plasmon polariton dispersion behavior of the grating structure differs at different respective locations along the grating structure. Different wavelengths of incident light waves can be slowed at the respective locations along the grating structure.

Abstract: A slow light system includes a substrate and a metal layer formed thereon, the metal layer having a graded grating structure formed at a surface thereof, wherein the grating depth of the grating structure is sized such that surface-plasmon polariton dispersion behavior of the grating structure differs at different respective locations along the grating structure. Different wavelengths of incident light waves can be slowed at the respective locations along the grating structure.