Patents by Inventor Zhaohui Cheng
Zhaohui Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240144560Abstract: A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.Type: ApplicationFiled: March 3, 2022Publication date: May 2, 2024Inventors: Zhaohui CHENG, Yasutaka TOYODA, Hideto DOHI, Hiroya OHTA, Hideyuki KAZUMI
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Patent number: 11769649Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.Type: GrantFiled: January 14, 2022Date of Patent: September 26, 2023Assignee: Hitachi High-Tech CorporationInventors: Masanori Mita, Yoshinobu Ootaka, Hideto Dohi, Zhaohui Cheng
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Publication number: 20230113759Abstract: The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG. 6A).Type: ApplicationFiled: May 13, 2020Publication date: April 13, 2023Inventors: Shingo HAYASHI, Hideyuki KAZUMI, Zhaohui CHENG, Hideto DOHI
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Publication number: 20220415605Abstract: A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detector 215 by irradiating a sample with the charged particle beam before and after the first multipole field is generated.Type: ApplicationFiled: November 21, 2019Publication date: December 29, 2022Inventors: Shingo HAYASHI, Hideto DOHI, Zhaohui CHENG, Hideyuki KAZUMI
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Publication number: 20220270844Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.Type: ApplicationFiled: January 14, 2022Publication date: August 25, 2022Inventors: Masanori MITA, Yoshinobu OOTAKA, Hideto DOHI, Zhaohui CHENG
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Patent number: 11223486Abstract: A digital signature method, a device, and a system of the present invention can generate a partial signature private key T corresponding to a user by a key generation center using a digital signature algorithm based on the EC-Schnorr, and sign a message M by using a standard digital signature algorithm such as the ECDSA. In the calculation of generating the second part w of the partial signature private key T, a signature assignment R is used, and the signature assignment R is a hash digest of a message including at least a pre-signature ? and an ID of a signature side. When signing the message M and verifying the signature of the message M, the operation requiring M as input uses a concatenation of R and M as input. The present invention uses a mechanism to connect two signature algorithms to ensure that the constructed complete algorithm can effectively resist known attacks.Type: GrantFiled: December 18, 2017Date of Patent: January 11, 2022Assignee: SHENZHEN OLYM INFORMATION SECURITY TECHNOLOGY CO., LTD.Inventors: Zhaohui Cheng, Feng Du
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Publication number: 20210152370Abstract: A digital signature method, a device, and a system of the present invention can generate a partial signature private key T corresponding to a user by a key generation center using a digital signature algorithm based on the EC-Schnorr, and sign a message M by using a standard digital signature algorithm such as the ECDSA. In the calculation of generating the second part w of the partial signature private key T, a signature assignment R is used, and the signature assignment R is a hash digest of a message including at least a pre-signature ? and an ID of a signature side. When signing the message M and verifying the signature of the message M, the operation requiring M as input uses a concatenation of R and M as input. The present invention uses a mechanism to connect two signature algorithms to ensure that the constructed complete algorithm can effectively resist known attacks.Type: ApplicationFiled: December 18, 2017Publication date: May 20, 2021Inventors: Zhaohui CHENG, Feng DU
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Patent number: 10840060Abstract: A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning condition according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.Type: GrantFiled: May 18, 2018Date of Patent: November 17, 2020Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Zhaohui Cheng, Hikaru Koyama, Yoshinobu Kimura, Hiroyuki Shinada, Osamu Komuro
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Patent number: 10727024Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculateType: GrantFiled: August 23, 2016Date of Patent: July 28, 2020Assignee: Hitachi High-Technologies CorporationInventors: Kotoko Urano, Zhaohui Cheng, Takeyoshi Ohashi, Hideyuki Kazumi
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Patent number: 10446361Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.Type: GrantFiled: July 1, 2015Date of Patent: October 15, 2019Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Zhaohui Cheng, Tomonori Nakano, Kotoko Urano, Takeyoshi Ohashi, Yasunari Sohda, Hideyuki Kazumi
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Publication number: 20190214222Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculateType: ApplicationFiled: August 23, 2016Publication date: July 11, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotoko URANO, Zhaohui CHENG, Takeyoshi OHASHI, Hideyuki KAZUMI
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Publication number: 20180269032Abstract: A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning condition according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.Type: ApplicationFiled: May 18, 2018Publication date: September 20, 2018Inventors: Zhaohui CHENG, Hikaru KOYAMA, Yoshinobu KIMURA, Hiroyuki SHINADA, Osamu KOMURO
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Publication number: 20180190469Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.Type: ApplicationFiled: July 1, 2015Publication date: July 5, 2018Inventors: Zhaohui CHENG, Tomonori NAKANO, Kotoko URANO, Takeyoshi OHASHI, Yasunari SOHDA, Hideyuki KAZUMI
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Patent number: 9991092Abstract: A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning conditioHn according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.Type: GrantFiled: July 30, 2010Date of Patent: June 5, 2018Assignee: Hitachi High-Technologies CorporationInventors: Zhaohui Cheng, Hikaru Koyama, Yoshinobu Kimura, Hiroyuki Shinada, Osamu Komuro
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Patent number: 9830524Abstract: In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).Type: GrantFiled: May 24, 2012Date of Patent: November 28, 2017Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Tomoko Sekiguchi, Takeyoshi Ohashi, Junichi Tanaka, Zhaohui Cheng, Ruriko Tsuneta, Hiroki Kawada, Seiko Hitomi
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Patent number: 9287084Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.Type: GrantFiled: January 28, 2015Date of Patent: March 15, 2016Assignee: Hitachi High-Technologies CorporationInventors: Zhaohui Cheng, Hideo Kashima, Hiroaki Baba, Takeyoshi Ohashi, Tomonori Nakano, Kotoko Urano, Naomasa Suzuki
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Patent number: 9202665Abstract: Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam. After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement. The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.Type: GrantFiled: November 30, 2011Date of Patent: December 1, 2015Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Matsui, Osamu Komuro, Makoto Nishihara, Zhaohui Cheng
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Publication number: 20150248944Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.Type: ApplicationFiled: January 28, 2015Publication date: September 3, 2015Inventors: Zhaohui Cheng, Hideo Kashima, Hiroaki Baba, Takeyoshi Ohashi, Tomonori Nakano, Kotoko Urano, Naomasa Suzuki
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Publication number: 20150036914Abstract: In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).Type: ApplicationFiled: May 24, 2012Publication date: February 5, 2015Inventors: Tomoko Sekiguchi, Takeyoshi Ohashi, Junichi Tanaka, Zhaohui Cheng, Ruriko Tsuneta, Hiroki Kawada, Seiko Hitomi
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Publication number: 20140027635Abstract: Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam. After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement. The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.Type: ApplicationFiled: November 30, 2011Publication date: January 30, 2014Inventors: Hiroyuki Matsui, Osamu Komuro, Makoto Nishihara, Zhaohui Cheng