Patents by Inventor Zhaohui Huang

Zhaohui Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11996413
    Abstract: A thin film transistor includes a base, a first electrode, an active pattern, a gate insulating layer, a gate and a second electrode. The active pattern includes a first semiconductor pattern, a second semiconductor pattern and a third semiconductor pattern. A material of one of the first semiconductor pattern and the third semiconductor pattern includes a semiconductor material and N-type doped ions, and a material of another of the first semiconductor pattern and the third semiconductor pattern includes the semiconductor material and P-type doped ions. An orthogonal projection of the gate on the base is non-overlapping with an orthogonal projection of the active pattern on the base.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: May 28, 2024
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Zhaohui Qiang, Li Qiang, Chao Luo, Huiqin Zhang, Rui Huang, Zhi Wang
  • Publication number: 20240147068
    Abstract: A control system includes one or more processors and one or more memories. The one or more memories store one or more computer programs that, when executed by the one or more processors, cause the one or more processors to obtain operation information of a movable platform performing an operation in a target area, determine at least one operation abnormal area of the movable platform performing the operation in the target area according to the operation information, determine a corresponding supplement operation path according to the at least one operation abnormal area, and control the movable flatform to perform a supplement operation based on the supplement operation path.
    Type: Application
    Filed: January 9, 2024
    Publication date: May 2, 2024
    Inventors: Zhenhao HUANG, Zhaohui FANG, Gang HE
  • Patent number: 11973094
    Abstract: The present disclosure provides an array substrate, an electronic device and a manufacturing method of the array substrate. The array substrate includes a base substrate, and a first transistor and a second transistor on the base substrate, a first electrode of the first transistor being connected to a second electrode of the second transistor; the array substrate further includes a photodiode including a first electrode, a second electrode, and a photosensitive layer between the first electrode and the second electrode, and the first electrode is electrically connected to a gate of the first transistor. In the arrangement, the first transistor and the second transistor are connected in series to form one control unit, and the uniformity and stability of the control unit are greatly improved.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: April 30, 2024
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Tianmin Zhou, Rui Huang, Wei Yang, Lizhong Wang, Zhaohui Qiang, Tao Yang, Li Qiang
  • Patent number: 11951862
    Abstract: A system for testing an assist function of electric vehicle wireless power transfer includes: a pit, a vehicle-assembly support platform, and an electromagnetic field strength measurement instrument. A ground-assembly support platform is arranged inside the pit, the vehicle-assembly support platform is arranged on an upper side of the ground-assembly support platform, and a to-be-tested member is arranged on an upper side of the ground-assembly support platform. A ground-assembly device coil is arranged on an upper surface of the ground-assembly support platform, a vehicle-assembly device coil is arranged inside the vehicle-assembly support platform, the ground-assembly device coil charges an entire vehicle, and the ground-assembly device coil further cooperates with the vehicle-assembly device coil to charge a vehicle component. A mechanical arm is arranged on ground of a test site, an interference member is arranged on a front end of the mechanical arm.
    Type: Grant
    Filed: July 31, 2023
    Date of Patent: April 9, 2024
    Assignee: CATARC NEW ENERGY VEHICLE TEST CENTER (TIANJIN) CO., LTD.
    Inventors: Baoqiang Zhang, Fang Wang, Zhaohui Wang, Bin Fan, Xin Huang, Jianbo Wang, Yang Li, Yue Xu, Meng Zhang, Xiao Li
  • Publication number: 20240110255
    Abstract: The present invention discloses a extra thick hot rolled H section steel and a production method therefor. The extra thick hot rolled H section steel contains, by mass, the following chemical components: 0.04-0.11% of C, 0.10-0.40% of Si, 0.40-1.00% of Mn, 0.40-1.00% of Cr, 0.10-0.40% of Cu, 0.020-0.060% of Nb, 0.040-0.100% of V, 0.010-0.025% of Ti, 0.010-0.030% of Al, 0.0060-0.0120% of N, not more than 0.015% of P, not more than 0.005% of S, not more than 0.0060% of O, and the balance Fe and trace residual elements, wherein 0.090%?Nb+V+Ti?0.170%, 6.5?(V+Ti)/N?10.5, and 0.30%?CEV?0.48%. The extra thick hot rolled H section steel has a flange thickness of 90 mm-150 mm, has excellent comprehensive mechanical properties, and can well meet the needs for heavy supporting structural parts of high-rise buildings, large squares, bridge structures, etc.
    Type: Application
    Filed: October 27, 2021
    Publication date: April 4, 2024
    Inventors: Meng XIA, Baoqiao WU, Meizhuang WU, Jun XING, Jie WANG, Hui CHEN, Jingcheng YAN, Qi HUANG, Lin PENG, Junwei HE, Zhaohui DING, Qiancheng SHEN
  • Publication number: 20240092208
    Abstract: A system for testing an assist function of electric vehicle wireless power transfer includes: a pit, a vehicle-assembly support platform, and an electromagnetic field strength measurement instrument. A ground-assembly support platform is arranged inside the pit, the vehicle-assembly support platform is arranged on an upper side of the ground-assembly support platform, and a to-be-tested member is arranged on an upper side of the ground-assembly support platform. A ground-assembly device coil is arranged on an upper surface of the ground-assembly support platform, a vehicle-assembly device coil is arranged inside the vehicle-assembly support platform, the ground-assembly device coil charges an entire vehicle, and the ground-assembly device coil further cooperates with the vehicle-assembly device coil to charge a vehicle component. A mechanical arm is arranged on ground of a test site, an interference member is arranged on a front end of the mechanical arm.
    Type: Application
    Filed: July 31, 2023
    Publication date: March 21, 2024
    Applicant: CATARC NEW ENERGY VEHICLE TEST CENTER (TIANJIN) CO., LTD.
    Inventors: Baoqiang ZHANG, Fang WANG, Zhaohui WANG, Bin FAN, Xin HUANG, Jianbo WANG, Yang LI, Yue XU, Meng ZHANG, Xiao LI
  • Patent number: 11772091
    Abstract: The present disclosure relates to a method and an apparatus for treating, sorting and recycling an oil-containing discharged catalyst. There is provided a method for treating, sorting and recycling an oil-containing discharged catalyst, wherein the method comprises the following steps: (A) cyclonic washing and on-line activation of a discharged catalyst; (B) cyclonic spinning solvent stripping of the catalyst; (C) gas stream acceleration sorting of a high activity catalyst; (D) cyclonic restriping and particle capture of the high activity catalyst; and (E) cooling of the gas and condensation removal of the solvent. There is further provided an apparatus for treating, sorting and recycling an oil-containing discharged catalyst.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: October 3, 2023
    Assignees: Shanghai Huachang Environmental Protection Co., Ltd, Sichuan University
    Inventors: Hualin Wang, Pengbo Fu, Zhaohui Huang, Aibin Huang, Cheng Huang, Jianhuai Sun, Ying Zhao, Liquan Li, Chonggang Chen, Qian Zeng, Jianping Li, Yilin Fang, Fei Wang, Xia Jiang
  • Publication number: 20220202949
    Abstract: Non-natural sugars modified with a bioorthogonal reactive group are added into a culture medium of immune cells such as NK cells to obtain immune cells modified with the bioorthogonal reactive group; and then, under a physiological condition, a targeting ligand, for example, a nanobody, is modified to a surface of each of the immune cells through a bioorthogonal reaction, wherein the targeting ligand has one terminal with a bioorthogonal reactive pairing group which is capable of being matched and connected with the bioorthogonal reactive group to generate a connecting reaction, connection is implemented by a transpeptidase SrtA-mediated chemoenzymatic method. The targeting ligand highly specifically recognizes and binds to a highly expressed receptor on the surface of tumor cells. The immune cell modified with the targeting ligand can specifically bind in a targeted way to the tumor cells, therefore generating cytokines, killing and damaging tumor cells.
    Type: Application
    Filed: December 15, 2021
    Publication date: June 30, 2022
    Inventors: Zhaohui HUANG, Zhimeng WU, Liang GONG, Yanchun LI
  • Publication number: 20200269229
    Abstract: The present disclosure relates to a method and an apparatus for treating, sorting and recycling an oil-containing discharged catalyst. There is provided a method for treating, sorting and recycling an oil-containing discharged catalyst, wherein the method comprises the following steps: (A) cyclonic washing and on-line activation of a discharged catalyst; (B) cyclonic spinning solvent stripping of the catalyst; (C) gas stream acceleration sorting of a high activity catalyst; (D) cyclonic restriping and particle capture of the high activity catalyst; and (E) cooling of the gas and condensation removal of the solvent. There is further provided an apparatus for treating, sorting and recycling an oil-containing discharged catalyst.
    Type: Application
    Filed: December 8, 2017
    Publication date: August 27, 2020
    Inventors: Hualin Wang, Pengbo Fu, Zhaohui Huang, Aibin Huang, Cheng Huang, Jianhuai Sun, Ying Zhao, Liquan Li, Chonggang Chen, Qian Zeng, Jianping Li, Yilin Fang, Fei Wang, Xia Jiang
  • Publication number: 20060267472
    Abstract: A field emission tip includes a base with a central portion and a tapered portion. The central portion of the base includes a peripheral surface, at least a portion of which is oriented substantially vertically or perpendicularly relative to a plane in which a substrate from which the field emission tip protrudes resides. An apex may be located at an exposed end of the central portion of the base. The tapered portion of the base includes an inclined surface that extends toward the exposed end of the central portion of the base. The tapered portion of the base may be formed from material that is redeposited as the emission tip is fabricated. The apex may be formed, at least in part, from a low work function material, such as one or more of aluminum titanium silicide, titanium silicide nitride, titanium nitride, tri-chromium mono-silicon, and tantalum nitride. Field emission arrays and field emission displays that include such field emission tips are also disclosed.
    Type: Application
    Filed: August 7, 2006
    Publication date: November 30, 2006
    Inventors: Guy Blalock, Sanh Tang, Zhaohui Huang
  • Patent number: 7091654
    Abstract: A method for fabricating field emitters from a conductive or semiconductive substrate. A layer of low work function material may be formed on the substrate. Emission tips that include such a low work function material may have improved performance. An etch mask appropriate for forming emission tips is patterned at desired locations over the substrate and any low work function material thereover. An anisotropic etch of at least the substrate is conducted to form vertical columns therefrom. A sacrificial layer may then be formed over the vertical columns. A facet etch of each vertical column forms an emission tip of the desired shape. If a sacrificial layer was formed over the vertical columns prior to formation of emission tips therefrom, the remaining material of the sacrificial layer may be utilized to facilitate the removal of any redeposition materials formed during the facet etch.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: August 15, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Guy T. Blalock, Sanh D. Tang, Zhaohui Huang
  • Patent number: 6713312
    Abstract: A method for fabricating field emitters from a conductive or semiconductive substrate. A layer of low work function material may be formed on the substrate. Emission tips that include such a low work function material may have improved performance. An etch mask appropriate for forming emission tips is patterned at desired locations over the substrate and any low work function material thereover. An anisotropic etch of at least the substrate is conducted to form vertical columns therefrom. A sacrificial layer may then be formed over the vertical columns. A facet etch of each vertical column forms an emission tip of the desired shape. If a sacrificial layer was formed over the vertical columns prior to formation of emission tips therefrom, the remaining material of the sacrificial layer may be utilized to facilitate the removal of any redeposition materials formed during the facet etch.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: March 30, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Guy T. Blalock, Sanh D. Tang, Zhaohui Huang
  • Publication number: 20020127750
    Abstract: A method for fabricating field emitters from a conductive or semiconductive substrate. A layer of low work function material may be formed on the substrate. Emission tips that include such a low work function material may have improved performance. An etch mask appropriate for forming emission tips is patterned at desired locations over the substrate and any low work function material thereover. An anisotropic etch of at least the substrate is conducted to form vertical columns therefrom. A sacrificial layer may then be formed over the vertical columns. A facet etch of each vertical column forms an emission tip of the desired shape. If a sacrificial layer was formed over the vertical columns prior to formation of emission tips therefrom, the remaining material of the sacrificial layer may be utilized to facilitate the removal of any redeposition materials formed during the facet etch.
    Type: Application
    Filed: May 8, 2002
    Publication date: September 12, 2002
    Inventors: Guy T. Blalock, Zhaohui Huang, Sanh D. Tang
  • Patent number: 6387717
    Abstract: The present invention relates to field emitters and methods of fabricating the same wherein the field emission tips of the field emitters are formed by utilization of a facet etch. An etch mask is patterned on a conductive substrate in the locations desired for subsequently formed field emission tips. The conductive substrate is then anisotropically etched to translate the shape of the mask into the conductive substrate which forms a vertical column from the conductive substrate. The etch mask is then removed and the vertical column is facet etched to form the field emission tip. Low work function materials may also be incorporated into the field emission tips to improve field emission tip performance by depositing a layer of low work function material on the conductive substrate prior to patterning the etch mask.
    Type: Grant
    Filed: April 26, 2000
    Date of Patent: May 14, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Guy T. Blalock, Sanh D. Tang, Zhaohui Huang
  • Publication number: 20020000548
    Abstract: A method for fabricating field emitters from a conductive or semiconductive substrate. A layer of low work function material may be formed on the substrate. Emission tips that include such a low work function material may have improved performance. An etch mask appropriate for forming emission tips is patterned at desired locations over the substrate and any low work function material thereover. An anisotropic etch of at least the substrate is conducted to form vertical columns therefrom. A sacrificial layer may then be formed over the vertical columns. A facet etch of each vertical column forms an emission tip of the desired shape. If a sacrificial layer was formed over the vertical columns prior to formation of emission tips therefrom, the remaining material of the sacrificial layer may be utilized to facilitate the removal of any redeposition materials formed during the facet etch.
    Type: Application
    Filed: August 27, 2001
    Publication date: January 3, 2002
    Inventors: Guy T. Blalock, Sanh D. Tang, Zhaohui Huang