Abstract: A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH4, H2O, H2, NF3, SF6, F2, HCl, HF, Cl2, and HBr. Representative condensing abating reagents include, for example, H2, H2O, O2, N2, O3, CO, CO2, NH3, N2O, CH4, and combinations thereof.

Abstract: Embodiments of the present invention provide a substrate support assembly including an electrostatic chuck with enhanced heat resistance. In one embodiment, an electrostatic chuck includes a support base, an electrode assembly having interleaved electrode fingers formed therein, and an encapsulating member disposed on the electrode assembly, wherein the encapsulating member is fabricated from one of a ceramic material or glass.

Abstract: Provided is a method for fast booting/shutting down a computing system. The method includes the steps of: when the computing system enters the hibernation mode, sorting the memory of the computing system into swappable pages and non-swappable pages and writing the non-swappable pages into a hibernation file of a storage device; determining whether the swappable pages are frequently-used pages or infrequently-used pages, and if the swappable pages are determined to be frequently-used pages, incorporating the frequently-used pages in the hibernation file; sorting the infrequently-used pages into clean pages and dirty pages; capturing one of the dirty pages and adding pages that are related to the captured page into at least one data set and placing the data set into a swap space of the storage device by continuous accessing process.

Abstract: A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH4, H2O, H2, NF3, SF6, F2, HCl, HF, Cl2, and HBr. Representative condensing abating reagents include, for example, H2, H2O, O2, N2, O3, CO, CO2, NH3, N2O, CH4, and combinations thereof.

Abstract: Embodiments of the present disclosure generally relate to a cluster tool for processing semiconductor substrates. In one embodiment, a cluster tool includes a plurality of process chambers connected to a transfer chamber and each process chamber may simultaneously process four or more substrates. In order to reduce cost, each process chamber includes a substrate support for supporting four or more substrates, single showerhead disposed over the substrate support, and a single radio frequency power source electrically coupled to the showerhead. The showerhead may include a first surface facing the substrate support and a second surface opposite the first surface. A plurality of gas passages may be formed in the showerhead extending from the first surface to the second surface. Process uniformity is improved by increasing the density of the gas passages from the center of the showerhead to the edge of the showerhead.

Abstract: There is provided a device and method for classifying data. The device comprises a controller configured to receive data, classify the data into a first class or a second class using a first machine learning classifier, and if the data is classified into the second class, classify the data into one of a third class and a fourth class using a second machine learning classifier. The first and second machine learning classifiers have their own predefined sets of rules for classifying data.

Abstract: A method is provided in one particular example that includes identifying an attempt by a first communications device to play video data within a virtual meeting session using a first media player. The first communications device can be sharing at least a portion of a desktop presented on the first communications device with one or more other remote communications devices participating in the virtual meeting session. The method can also include identifying a copy of the video data, and launching one or more media players to present at least a portion of the copy of the video data on the one or more other remote communications devices. The one or more media players are launched to correspond to a location of the first media player on the shared portion of the desktop.

Abstract: Embodiments disclosed herein include a plasma source, an abatement system and a vacuum processing system for abating compounds produced in semiconductor processes. In one embodiment, a plasma source includes a dielectric tube and a coil antenna surrounding the tube. The coil antenna includes a plurality of turns, and at least one turn is shorted. Selectively shorting one or more turns of the coil antenna helps reduce the inductance of the coil antenna, allowing higher power to be supplied to the coil antenna that covers more processing volume. Higher power supplied to the coil antenna and larger processing volume lead to an improved DRE.

Abstract: Embodiments disclosed herein generally relate to plasma abatement processes and apparatuses. A plasma abatement process takes effluent from a foreline of a processing chamber, such as an implant chamber, and reacts the effluent with a reagent. The effluent contains a pyrophoric byproduct. A plasma generator placed within the foreline path may ionize the effluent and the reagent to facilitate a reaction between the effluent and the reagent. The ionized species react to form compounds which remain in a gaseous phase at conditions within the exhaust stream path. In another embodiment, the ionized species may react to form compounds which condense out of the gaseous phase. The condensed particulate matter is then removed from the effluent by a trap. The apparatuses may include an implant chamber, a plasma generator, one or more pumps, and a scrubber.

Abstract: In an embodiment, a method of creating a skimming preview of a video includes electronically receiving a plurality of video shots, analyzing each frame in a video shot from the plurality of video shots, where analyzing includes determining a saliency of each frame of the video shot. The method also includes determining a key frame of the video shot based on the saliency of each frame the video shot, extracting visual features from the key frame, performing shot clustering of the plurality of video shots to determine concept patterns based on the visual features, and generating a reconstruction reference tree based on the shot clustering. The reconstruction reference tree includes video shots categorized according to each concept pattern.

Abstract: In an embodiment, a method of creating a skimming preview of a video includes electronically receiving a plurality of video shots, analyzing each frame in a video shot from the plurality of video shots, where analyzing includes determining a saliency of each frame of the video shot. The method also includes determining a key frame of the video shot based on the saliency of each frame the video shot, extracting visual features from the key frame, performing shot clustering of the plurality of video shots to determine concept patterns based on the visual features, and generating a reconstruction reference tree based on the shot clustering. The reconstruction reference tree includes video shots categorized according to each concept pattern.

Abstract: A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH4, H2O, H2, NF3, SF6, F2, HCl, HF, Cl2, and HBr. Representative condensing abating reagents include, for example, H2, H2O, O2, N2, O3, CO, CO2, NH3, N2O, CH4, and combinations thereof.

Abstract: In one embodiment, source data for a communication session may be split into an audio portion for transmission on a phone channel and a non-audio portion for transmission on a data channel. A server and a phone may accordingly establish an audio portion of a communication session on the phone channel. In response to a trigger, the server may provide a push notification on the data channel to the phone, where the push notification is associated with an application executing on the phone that is configured to participate in the non-audio portion of the communication session on the data channel with the server. Upon obtaining the push notification on the data channel during the audio portion on the phone channel, the application may correspondingly activate on the phone to participate in the non-audio portion of the communication session during the phone's participation in the audio portion (e.g., merging the portions).

Abstract: Embodiments of the present invention provide a substrate support assembly including an electrostatic chuck with enhanced heat resistance. In one embodiment, an electrostatic chuck includes a support base, an electrode assembly having interleaved electrode fingers formed therein, and an encapsulating member disposed on the electrode assembly, wherein the encapsulating member is fabricated from one of a ceramic material or glass.

Abstract: A system and method for retargeting video sequences are provided. A method for retargeting a video includes a plurality of frames includes determining saliency information for the plurality of frames, determining a cost metric for the video, and retargeting the video based on the cost metric to produce a retargeted video. The cost metric considers loss due to cropping, scaling, temporal factors, and spatial factors. The retargeting makes use of a crop window for each frame in the plurality of frames.

Abstract: A method is provided in one particular example that includes identifying an attempt by a first communications device to play video data within a virtual meeting session using a first media player. The first communications device can be sharing at least a portion of a desktop presented on the first communications device with one or more other remote communications devices participating in the virtual meeting session. The method can also include identifying a copy of the video data, and launching one or more media players to present at least a portion of the copy of the video data on the one or more other remote communications devices. The one or more media players are launched to correspond to a location of the first media player on the shared portion of the desktop.

Abstract: A method for fabricating a semiconductor layer within a plasma enhanced chemical vapor deposition (PECVD) apparatus. The PECVD apparatus includes a plurality of walls defining a processing region, a substrate support, a shadow frame, a gas distribution showerhead, a gas source in fluid communication with the gas distribution showerhead and the processing region, a radio frequency power source coupled to the gas distribution showerhead, and one or more VHF grounding straps electrically coupled to at least one of the plurality of walls. The VHF grounding straps provide a low-impedance current path between at least one of the plurality of walls and at least one of a shadow frame or the substrate support. The method further includes delivering a semiconductor precursor gas and a dopant precursor gas and delivering a very high frequency (VHF) power to generate a plasma to form a first layer on the one or more substrates.

Abstract: Provided are atomic layer deposition apparatus and methods including a plurality of elongate gas ports and pump ports in communication with multiple conduits to transport the gases from the processing chamber to be condensed, stored and/or recirculated.

Abstract: A method is provided in one particular example that includes identifying an attempt by a first communications device to play video data within a virtual meeting session using a first media player. The first communications device can be sharing at least a portion of a desktop presented on the first communications device with one or more other remote communications devices participating in the virtual meeting session. The method can also include identifying a copy of the video data, and launching one or more media players to present at least a portion of the copy of the video data on the one or more other remote communications devices. The one or more media players are launched to correspond to a location of the first media player on the shared portion of the desktop.

Abstract: In one embodiment, a client device may send one or more sub-session requests to one or more corresponding session controllers through a computer network to obtain one or more corresponding sub-session tokens that indicate in which sub-sessions of an online collaborative computing session the client device is permitted to participate. The client device may then receive particular sub-session tokens (e.g., based on certain permissions), which may then be sent to a collaboration server to establish one or more permitted sub-sessions of the online collaborative computing session with the client device as indicated by the received sub-session tokens.