Abstract: A integrated device including a non-volatile memory (NVM) and a nanosheet field effect transistor (FET) and a method of fabricating the device include patterning fins for a channel region of the NVM and the FET. The method also includes depositing an organic planarization layer (OPL) and a block mask to protect the fins for the channel region of the FET, conformally depositing a set of layers that make up an NVM structure in conjunction with the channel region of the NVM while protecting the fins for the channel region of the FET with the OPL and the block mask, and removing the OPL and the block mask protecting the fins for the channel region of the FET. Source and drain regions of the NVM and the FET are formed, and a gate of the FET is formed while protecting the NVM by depositing another OPL and another block mask.

Abstract: Embodiments of the present invention are directed to techniques for forming a vertical field effect transistor (VFET) top spacer using an area selective cyclic deposition. In a non-limiting embodiment of the invention, a first semiconductor fin is formed over a substrate. A second semiconductor fin is formed over the substrate and adjacent to the first semiconductor fin. A dielectric isolation region is formed between the first semiconductor fin and the second semiconductor fin. A top spacer is formed between the first semiconductor fin and the second semiconductor fin by cyclically depositing dielectric layers over the dielectric isolation region. The dielectric layers are inhibited from depositing on a surface of the first semiconductor fin and on a surface of the second semiconductor fin during the cyclic deposition process.

Abstract: A method of forming a transistor device is provided. The method includes forming a plurality of gate structures including a gate spacer and a gate electrode on a substrate, wherein the plurality of gate structures are separated from each other by a source/drain contact. The method further includes reducing the height of the gate electrodes to form gate troughs, and forming a gate liner on the gate electrodes and gate spacers. The method further includes forming a gate cap on the gate liner, and reducing the height of the source/drain contacts between the gate structures to form a source/drain trough. The method further includes forming a source/drain liner on the source/drain contacts and gate spacers, wherein the source/drain liner is selectively etchable relative to the gate liner, and forming a source/drain cap on the source/drain liner.

Abstract: Embodiments of the present invention are directed to techniques for generating vertically stacked nanosheet CMOS (Complementary Metal Oxide Semiconductor) transistor architectures. In a non-limiting embodiment of the invention, a first rare earth oxide layer is formed over a substrate. An n-FET nanosheet stack is formed on the rare earth oxide layer. The n-FET nanosheet stack includes a first nanosheet. A second rare earth oxide layer is formed on the n-FET nanosheet stack. A p-FET nanosheet stack is formed on the second rare earth oxide layer. The p-FET nanosheet stack includes a second nanosheet.

Abstract: Highly selective dry etching techniques for VFET STI recess are provided. In one aspect, a method for dry etching includes: contacting a wafer including an oxide with at least one etch gas under conditions sufficient to etch the oxide at a rate of less than about 30 ?/min; removing a byproduct of the etch from the wafer using a thermal treatment; and repeating the contacting step followed by the removing step multiple times until a desired recess of the oxide has been achieved. A method of forming a VFET device is also provided.

Abstract: A self-assembled heteroepitaxial oxide nanocomposite film including alternating layers of a first metal oxide having a first melting point and a second metal oxide having a second melting point that differs from the first melting point is formed in an opening formed in a semiconductor substrate. After forming a metal or metal alloy via structure in the semiconductor substrate, first and second thermal treatments are performed to remove each layer of first or second metal oxide providing a nanoporous membrane.

Abstract: A method of forming a long-channel fin field effect device is provided. The method includes forming a trench in a substrate, forming a pedestal in the trench, wherein the pedestal extends above the surface of the substrate, forming a sacrificial pillar on the pedestal, forming a rounded top surface on the sacrificial pillar to form a sacrificial support structure, forming a fin material layer on the exposed surface of the sacrificial support structure, and removing the sacrificial support structure to leave a free-standing inverted U-shaped fin.

Abstract: A method for fabricating a stacked nanopore includes forming a stack of layers having alternating conductive lines and dielectric layers on a substrate, and patterning the stack to form a staircase structure with the conductive lines having a length gradually changing at each level in the stack. The method also includes depositing and planarizing a dielectric material over the staircase structure, forming contacts through the dielectric material to the conductive lines for each level of conductive lines, etching a nanopore through the stack of layers to form pairs of opposing electrodes across the nanopore using the conductive lines; and opening up the substrate to expose the nanopore.

Abstract: A semiconductor structure is provided that includes active semiconductor fins that have a uniform fin channel height. The uniform fin channel height is achieved by forming semiconductor fins (active and sacrificial) on an entirety of semiconductor substrate thus there is no loading effect during a subsequently performed dielectric etch step which can lead to fin channel height variation and ultimately variation in device characteristics. A trench isolation structure is located adjacent to the active semiconductor fins. The trench isolation structure includes at least one dielectric plug having a second width and a dielectric pillar having a first width located on each side of the at least one dielectric plug. The second width of the at least one dielectric plug is less than the first width of each dielectric pillar, yet equal to a width of each semiconductor fin.

Abstract: Strained nanosheet field effect transistors (FETs) using a phase change material are described herein. In some embodiments, a semiconductor device can comprise alternating layers of a channel material and a phase change material to produce strained nanosheet field effect transistors, wherein the layers of the phase change material cause a strain in the layers of the channel material. The phase change material comprises germanium antimony telluride. The germanium antimony telluride crystallizes into a crystalline germanium antimony telluride based on annealing above 300 degrees Celsius and a volume of the crystalline germanium antimony telluride is reduced up to six percent relative to an initial volume the germanium antimony telluride to cause the strain in the layers of the channel material. The semiconductor device can also comprise source and drain epitaxial growths on both ends of the layers of the channel material that lock the strain in the layers of the channel material.

Abstract: A method of forming a transistor device is provided. The method includes forming a plurality of gate structures including a gate spacer and a gate electrode on a substrate, wherein the plurality of gate structures are separated from each other by a source/drain contact. The method further includes reducing the height of the gate electrodes to form gate troughs, and forming a gate liner on the gate electrodes and gate spacers. The method further includes forming a gate cap on the gate liner, and reducing the height of the source/drain contacts between the gate structures to form a source/drain trough. The method further includes forming a source/drain liner on the source/drain contacts and gate spacers, wherein the source/drain liner is selectively etchable relative to the gate liner, and forming a source/drain cap on the source/drain liner.

Abstract: A vertical transport fin field effect transistor (VT FinFET), including one or more vertical fins on a surface of a substrate, an L-shaped or U-shaped spacer trough on the substrate adjacent to at least one of the one or more vertical fins, and a gate dielectric layer on the sidewalls of the at least one of the one or more vertical fins and the L-shaped or U-shaped spacer trough.

Abstract: An integrated semiconductor device includes a substrate, a first vertical transistor, and a second vertical transistor. The substrate has a first substrate region and a second substrate region. The first vertical transistor is disposed on the substrate in the first substrate region. The first vertical transistor is n-type field-effect vertical transistor (n-VFET) with a first channel crystalline orientation. The second vertical transistor is disposed on the substrate in the second substrate region. The second vertical transistor is p-type field-effect vertical transistor (p-VFET) with a second channel crystalline orientation. The first channel crystalline orientation is different from the second channel orientation. A common bottom source and drain region as well as common bottom and top spacers regions are provided for the first vertical transistor and the second vertical transistor.

Abstract: A sensing device includes a stack of dielectric layers having conductive materials disposed between the dielectric layers. A nanopore is disposed through the stacks of dielectric layers and separates the conductive materials to provide electrodes on opposite sides of the nanopore. Contacts connect to each of the electrodes.

Abstract: A method of forming an integrated circuit device having a nanosheet resistor includes forming a nanosheet structure having alternating sheets of silicon and silicon germanium. An ion implantation is performed on the nanosheet structure. A thermal anneal is performed on the nanosheet structure. A dielectric oxide is placed around the nanosheet structure. A first contact and a second contact are coupled to the nanosheet structure to form a resistor between the first contact and the second contact. Other embodiments are also described herein.

Abstract: An integrated semiconductor device includes a substrate, a first vertical transistor, and a second vertical transistor. The substrate has a first substrate region and a second substrate region. The first vertical transistor is disposed on the substrate in the first substrate region. The first vertical transistor is n-type field-effect vertical transistor (n-VFET) with a first channel crystalline orientation. The second vertical transistor is disposed on the substrate in the second substrate region. The second vertical transistor is p-type field-effect vertical transistor (p-VFET) with a second channel crystalline orientation. The first channel crystalline orientation is different from the second channel orientation. A common bottom source and drain region as well as common bottom and top spacers regions are provided for the first vertical transistor and the second vertical transistor.

Abstract: Embodiments of the invention provide a computer-implemented method of generating individualized strategies for a group of team members pursing a team objective based on an optimized team strategy. A team objective and a plurality of inputs associated with a plurality of team members is received at a strategy engine. A training model is applied to the plurality of inputs from the first plurality of team members to generate a plurality of individualized strategies for the first plurality of team members to achieve the team objective. An optimized team strategy based on the plurality of individualized strategies is generated and the individualized strategies are communicated to each team member wherein each team member pursuing their individualized strategy leads to achieving the team objective.

Abstract: An integrated semiconductor device includes a substrate, a first vertical transistor, and a second vertical transistor. The substrate has a first substrate region and a second substrate region. The first vertical transistor is disposed on the substrate in the first substrate region. The first vertical transistor is n-type field-effect vertical transistor (n-VFET) with a first channel crystalline orientation. The second vertical transistor is disposed on the substrate in the second substrate region. The second vertical transistor is p-type field-effect vertical transistor (p-VFET) with a second channel crystalline orientation. The first channel crystalline orientation is different from the second channel orientation. A common bottom source and drain region as well as common bottom and top spacers regions are provided for the first vertical transistor and the second vertical transistor.

Abstract: Embodiments of the invention are directed to a nano sheet field effect transistor (FET) device that includes a gate spacer and an inner spacer. The gate spacer includes an upper segment and a lower segment. The inner spacer has a first selectivity to etch compositions used in predetermined fabrication operations for forming the inner spacer. The lower segment has the first selectivity to etch compositions used in predetermined fabrication operations for forming the inner spacer. The upper segment has a second selectivity to etch compositions used in predetermined fabrication operations for forming the inner spacer. The first etch selectivity is greater than the second etch selectivity.

Abstract: Embodiments of the invention are directed to method of fabricating a semiconductor device. A non-limiting embodiment of the method includes performing fabrication operations to form a nanosheet field effect transistor (FET) device on a substrate, wherein the fabrication operations include forming gate spacers along a gate region of the nanosheet FET device, wherein each of the gate spacers comprises an upper segment and a lower segment.