Patents by Inventor Zhi C. Wang

Zhi C. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of depositing a pre-etch protective layer
    Patent number: 11915940
    Abstract: A method of cyclic etching, comprising: (A) depositing, prior to cyclically etching a substrate through a mask opening, a pre-etch protection layer conformally over the mask, sidewalls of the mask defining the mask opening; and an exposed portion of the substrate exposed through the mask opening, the pre-etch protection layer deposited to a first thickness; and (B) cyclically etching the substrate by: (i) depositing a protection layer in the opening of the mask, the protection layer deposited to a second thickness that is less than half of the first thickness; (ii) etching through a portion of the protection layer disposed on the substrate and etching the substrate; and (iii) repeating (i) and (ii) until an end point is reached.
    Type: Grant
    Filed: July 2, 2021
    Date of Patent: February 27, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Zhi Gang Wang, Jiao Yang, Alfredo Granados, Jon C. Farr, Heng Wang, Rui Zhe Ren
  • Xylanase from acidothermus cellulolyticus
    Patent number: 5902581
    Abstract: A purified xylanase produced by Acidothermus cellulolyticus is disclosed having a pH optimum of between about 3.6-4.2 and a molecular weight of between about 50-55 kD as determined by gel filtration. The disclosed xylanase is useful in the bleaching of pulp for the production of paper and in treating feed compositions.
    Type: Grant
    Filed: December 4, 1995
    Date of Patent: May 11, 1999
    Assignee: Genencor International, Inc.
    Inventors: Kathleen A. Clarkson, Andrew J. Morgan, Zhi C. Wang