Patents by Inventor Zhiqiang CHANG

Zhiqiang CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240104884
    Abstract: A method of acquiring feature information of a detected object is provided, including: controlling the detected object to pass through a detection apparatus; controlling an imaging system to perform radiation scanning on the detected object acquiring a radiation scanning image of the detected object acquiring feature information of the detected object through the radiation scanning image. The detected object includes a first part, a detection part and a second part sequentially in a first direction. The acquiring feature information of the detected object through the radiation scanning image includes: acquiring a first boundary line between the detection part and the first part and a second boundary line between the detection part and the second part through the radiation scanning image; and calculating a dimension between the first boundary line and the second boundary line in the first direction to acquire a dimension of the detection part in the first direction.
    Type: Application
    Filed: October 8, 2022
    Publication date: March 28, 2024
    Inventors: Li ZHANG, Zhiqiang CHEN, Ming CHANG, Xin JIN, Qingping HUANG, Xiaofei XU, Mingzhi HONG, Liguo ZHANG
  • Patent number: 11569275
    Abstract: The present disclosure provides an array substrate, a method for preparing the same, and a display device. The method includes: forming a metal layer on a base substrate; coating a photoresist on the metal layer; exposing the photoresist by a mask plate in such a manner that an amount of light acting on a first photoresist portion is less than that of light acting on a second photoresist portion to form a first photoresist reserved portion located and a second photoresist reserved portion located; after etching off the metal portion, stripping the first photoresist reserved portion and the second photoresist reserved portion, to obtain the first metal pattern located in the fan-out area and the second metal pattern located in the display area, in which a period size of the first metal pattern being smaller than a period size of the second metal pattern.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: January 31, 2023
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Guoqing Zhou, Chao Wang, Shengwei Zhao, Jingping Lv, Lin Xie, Zhiqiang Chang
  • Patent number: 11470792
    Abstract: Provided is a method of culturing Stichopus japonicus Stichopus japonicus, Marsupenaeus japonicus, Portunus trituberculatus and Ulva lactuca, which belongs to the technical field of mariculture, including the following steps: preparing a pond and laying a substratum for Stichopus japonicus from March 1 to 5; putting the Stichopus japonicus seedlings, and then culturing Ulva lactuca seedlings on April 1; putting Marsupenaeus japonicus seedlings on April 15; putting Portunus trituberculatus juveniles on May 5; harvesting Marsupenaeus japonicus on July 15, and putting Marsupenaeus japonicus seedlings again; harvesting Stichopus japonicus, Marsupenaeus japonicus, Portunus trituberculatus and Ulva lactuca from November 5 to 10. By adopting the method of biological control of predators of Stichopus japonicus, the use of the pesticides and fishery drugs in the culture and pond-cleaning process is reduced, and green and healthy culture, energy saving and environmental protection are realized.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: October 18, 2022
    Assignee: Yellow Sea Fisheries Research Institute, Chinese Academy of Fishery Sciences
    Inventors: Xianyun Ren, Baoquan Gao, Zhiqiang Chang, Hongxing Ge, Qingbing Liu, Ping Liu, Jian Li, Ruiyong Fan
  • Patent number: 11411072
    Abstract: Disclosed are a display substrate, a display device, a manufacturing method and a repairing method. A capacitor structure in the display substrate includes a first electrode and a second electrode. The first electrode includes a first main body portion extending in a first direction, first branch portions extending in a second direction, and a first connection portion connecting the first branch portions to the first main body portion. The second electrode includes a second main body portion extending in the first direction, second branch portions extending in the second direction, and a second connection portion connecting the second branch portions to the second main body portion. One side of the first electrode having the first branch portions faces one side of the second electrode having the second branch portions, and each first branch portion and a corresponding second branch portion form a capacitor.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: August 9, 2022
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Huafeng Liu, Shengwei Zhao, Chaochao Sun, Chao Wang, Jingping Lv, Lin Xie, Guoqing Zhou, Panpan Zhang, Tengfei Wang, Hsinghua Pan, Lele Li, Zhiqiang Chang, Shaocong Dang, Shijie Mu, Zhen Wang
  • Publication number: 20220240466
    Abstract: Provided is a method of culturing Stichopus japonicus Stichopus japonicus, Marsupenaeus japonicus, Portunus trituberculatus and Ulva lactuca, which belongs to the technical field of mariculture, including the following steps: preparing a pond and laying a substratum for Stichopus japonicus from March 1 to 5; putting the Stichopus japonicus seedlings, and then culturing Ulva lactuca seedlings on April 1; putting Marsupenaeus japonicus seedlings on April 15; putting Portunus trituberculatus juveniles on May 5; harvesting Marsupenaeus japonicus on July 15, and putting Marsupenaeus japonicus seedlings again; harvesting Stichopus japonicus, Marsupenaeus japonicus, Portunus trituberculatus and Ulva lactuca from November 5 to 10. By adopting the method of biological control of predators of Stichopus japonicus, the use of the pesticides and fishery drugs in the culture and pond-cleaning process is reduced, and green and healthy culture, energy saving and environmental protection are realized.
    Type: Application
    Filed: March 25, 2022
    Publication date: August 4, 2022
    Inventors: Xianyun Ren, Baoquan Gao, Zhiqiang Chang, Hongxing Ge, Qingbing Liu, Ping Liu, Jian Li, Ruiyong Fan
  • Publication number: 20210376057
    Abstract: Disclosed are a display substrate, a display device, a manufacturing method and a repairing method. A capacitor structure in the display substrate includes a first electrode and a second electrode. The first electrode includes a first main body portion extending in a first direction, first branch portions extending in a second direction, and a first connection portion connecting the first branch portions to the first main body portion. The second electrode includes a second main body portion extending in the first direction, second branch portions extending in the second direction, and a second connection portion connecting the second branch portions to the second main body portion. One side of the first electrode having the first branch portions faces one side of the second electrode having the second branch portions, and each first branch portion and a corresponding second branch portion form a capacitor.
    Type: Application
    Filed: April 25, 2019
    Publication date: December 2, 2021
    Inventors: Huafeng LIU, Shengwei ZHAO, Chaochao SUN, Chao WANG, Jingping LV, Lin XIE, Guoqing ZHOU, Panpan ZHANG, Tengfei WANG, Hsinghua PAN, Lele LI, Zhiqiang CHANG, Shaocong DANG, Shijie MU, Zhen WANG
  • Publication number: 20210375956
    Abstract: The present disclosure provides an array substrate, a method for preparing the same, and a display device. The method includes: forming a metal layer on a base substrate; coating a photoresist on the metal layer; exposing the photoresist by a mask plate in such a manner that an amount of light acting on a first photoresist portion is less than that of light acting on a second photoresist portion to form a first photoresist reserved portion located and a second photoresist reserved portion located; after etching off the metal portion, stripping the first photoresist reserved portion and the second photoresist reserved portion, to obtain the first metal pattern located in the fan-out area and the second metal pattern located in the display area, in which a period size of the first metal pattern being smaller than a period size of the second metal pattern.
    Type: Application
    Filed: February 13, 2020
    Publication date: December 2, 2021
    Applicants: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Guoqing ZHOU, Chao WANG, Shengwei ZHAO, Jingping LV, Lin XIE, Zhiqiang CHANG