Patents by Inventor Zhisong Huang
Zhisong Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11703291Abstract: An automatic recoilless firearm comprising a gun barrel and a compensating mass launch tube in which a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling. Said firearm further comprises a bolt or bolts and barrels configured to reduce or eliminate transmission of momentum and mechanical energy to the gun barrels and/or gun body during an operation of the firearm.Type: GrantFiled: April 29, 2022Date of Patent: July 18, 2023Inventor: Zhisong Huang
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Publication number: 20220260329Abstract: An automatic recoilless firearm comprising a gun barrel and a compensating mass launch tube in which a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling. Said firearm further comprises a bolt or bolts and barrels configured to reduce or eliminate transmission of momentum and mechanical energy to the gun barrels and/or gun body during an operation of the firearm.Type: ApplicationFiled: April 29, 2022Publication date: August 18, 2022Inventor: Zhisong Huang
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Patent number: 11346621Abstract: The invention relates to a recoilless apparatus for firing conventional cartridge-based ammunitions comprising a gun barrel and a compensating mass launch tube wherein a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling.Type: GrantFiled: November 21, 2020Date of Patent: May 31, 2022Inventor: Zhisong Huang
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Publication number: 20220120523Abstract: The invention relates to a recoilless apparatus for firing conventional cartridge-based ammunitions comprising a gun barrel and a compensating mass launch tube wherein a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling.Type: ApplicationFiled: November 21, 2020Publication date: April 21, 2022Inventor: Zhisong Huang
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Publication number: 20220097299Abstract: Sealing components having complex shapes and smooth surfaces are may be fabricated using coreactive three-dimensional printing. More specifically the invention relates to chemically resistant sealing components and methods of making said sealing components using three-dimensional printing, and that may be used in vehicle applications.Type: ApplicationFiled: February 10, 2020Publication date: March 31, 2022Applicant: PPG Industries Ohio, Inc.Inventors: Cynthia Kutchko, Eric S. Epstein, Bryan W. Wilkinson, Zhisong Huang, Sean J. Manion, Kerianne M. Dobosz
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Patent number: 10072182Abstract: The present invention discloses a resin infusion type water-permeable pavement material, comprising: a basic bituminous mixture, waterborne epoxy resin, a waterborne curing agent, a toughening agent and a diluting agent; and the basic bituminous mixture comprises coarse aggregate, fine aggregate, fillers and high-viscosity modified bitumen. A water-permeable pavement prepared by the material provided by the present invention has excellent interface bonding capability, favorable road utilization performance and functional performance.Type: GrantFiled: September 22, 2015Date of Patent: September 11, 2018Inventors: Guiping He, Zheng Sun, Xixi Hou, Zhisong Huang, Quncong Qiu, Xiaohua Jiang, Hua Chen
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Patent number: 9909009Abstract: An environmental protection cold mixing type modulus-adjustable pavement material and preparation method thereof. Equal components of waterborne epoxy resin and waterborne curing agent are added in a container to obtain a waterborne epoxy resin mixture. Emulsified bitumen, the waterborne epoxy resin mixture, an emulsifying agent, a defoaming agent and a stabilizing agent are prepared according to a certain mass ratio; the emulsified bitumen is first added in the container, and the pH is regulated with hydrochloric acid to be 5.0 to 6.5; the above-mentioned other materials are added and stirred to make mixed liquid; a stator of a high-speed shearing machine is put into the mixed liquid, and the rotational speed is set as 350 to 500 rpm for about 20 to 40 min to obtain waterborne epoxy emulsified bituminous emulsion. B.Type: GrantFiled: September 22, 2015Date of Patent: March 6, 2018Inventors: Guiping He, Zheng Sun, Xixi Hou, Quncong Qiu, Zhisong Huang, Xiaohua Jiang, Hua Chen
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Publication number: 20160208140Abstract: The present invention discloses a resin infusion type water-permeable pavement material, comprising: a basic bituminous mixture, waterborne epoxy resin, a waterborne curing agent, a toughening agent and a diluting agent; and the basic bituminous mixture comprises coarse aggregate, fine aggregate, fillers and high-viscosity modified bitumen. A water-permeable pavement prepared by the material provided by the present invention has excellent interface bonding capability, favorable road utilization performance and functional performance.Type: ApplicationFiled: September 22, 2015Publication date: July 21, 2016Inventors: Guiping He, Zheng Sun, Xixi Hou, Zhisong Huang, Quncong Qiu, Xiaohua Jiang, Hua Chen
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Publication number: 20160145435Abstract: An environmental protection cold mixing type modulus-adjustable pavement material and preparation method thereof. Equal components of waterborne epoxy resin and waterborne curing agent are added in a container to obtain a waterborne epoxy resin mixture. Emulsified bitumen, the waterborne epoxy resin mixture, an emulsifying agent, a defoaming agent and a stabilizing agent are prepared according to a certain mass ratio; the emulsified bitumen is first added in the container, and the pH is regulated with hydrochloric acid to be 5.0 to 6.5, the above-mentioned other materials are added and stirred to make mixed liquid; a stator of a high-speed shearing machine is put into the mixed liquid, and the rotational speed is set as 350 to 500 rpm for about 20 to 40 min to obtain waterborne epoxy emulsified bituminous emulsion. B.Type: ApplicationFiled: September 22, 2015Publication date: May 26, 2016Inventors: Guiping He, Zheng Sun, Xixi Hou, Quncong Qiu, Zhisong Huang, Xiaohua Jiang, Hua Chen
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Patent number: 8673785Abstract: A gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus is provided. The gas distribution system can include a gas supply section, a flow control section and a switching section. The gas supply section provides first and second gases, typically gas mixtures, to the flow control section, which controls the flows of the first and second gases to the chamber. The chamber can include multiple zones, and the flow control section can supply the first and second gases to the multiple zones at desired flow ratios of the gases. The gas distribution system can continuously supply the first and second gases to the switching section and the switching section is operable to switch the flows of the first and second gases, such that one of the first and second process gases is supplied to the chamber while the other of the first and second gases is supplied to a by-pass line, and then to switch the gas flows.Type: GrantFiled: March 3, 2010Date of Patent: March 18, 2014Assignee: Lam Research CorporationInventors: Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa, Reza Sadjadi
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Patent number: 8614149Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.Type: GrantFiled: August 15, 2012Date of Patent: December 24, 2013Assignee: Lam Research CorporationInventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S. M. Reza Sadjadi
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Patent number: 8455578Abstract: An ink-receptive coating composition. In a preferred embodiment, the composition includes (a) a polyamide, the polyamide comprising an aliphatic polyamide in particulate form, the aliphatic polyamide having a softening point in the temperature range of about 50-250° C. and an average particle size of about 1 to 80 microns; (b) a plasticizer, the plasticizer being a solid plasticizer selected from the group consisting of alkyl sulfonamides and aromatic sulfonamides, the solid plasticizer having a melting point in the range of about 50-200° C.; (c) a binder, the binder being a thermoplastic polymer delivered as a water-based emulsion or solution, the binder having a Tg in the range of about ?20-120° C.; (d) a dye-retention agent, the dye-retention agent comprising at least one cationic polymer; (e) an ink viscosity-modifying agent; and (f) a dispersant, the dispersant being selected from the group of cationic and non-ionic dispersants.Type: GrantFiled: December 3, 2007Date of Patent: June 4, 2013Assignee: Avery Dennison CorporationInventors: Liviu Dinescu, Dong-Tsai Hseih, Ming Kun Shi, Ekaterina Vaskova, Zhisong Huang
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Patent number: 8350880Abstract: A heat-transfer imaging system and a method of using the same. The heat-transfer imaging system includes a heat-transfer sheet and an activating ink. The heat-transfer sheet and the activating ink are specially formulated so that only the areas of the heat-transfer sheet onto which the ink has been printed become adhesive under heat-transfer conditions. This effect may be achieved by designing the sheet to include an ink-receptive coating whose melting temperature is higher than that typically encountered during normal heat-transfer conditions and by formulating the activating ink to include a plasticizer that, when printed onto the ink-receptive coating, lowers the melting temperature of the ink-receptive coating sufficiently so that the modified melting temperature falls within the temperature range encountered during heat-transfer.Type: GrantFiled: July 23, 2008Date of Patent: January 8, 2013Assignee: Avery Dennison CorporationInventors: Liviu Dinescu, Kai Li, Dong-Tsai Hseih, Ekaterina Vaskova, Haochuan Wang, Christine Dang, Zhisong Huang, James Johnson
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Patent number: 8343876Abstract: A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power.Type: GrantFiled: July 22, 2011Date of Patent: January 1, 2013Assignee: Lam Research CorporationInventors: S. M. Reza Sadjadi, Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa
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Publication number: 20120309201Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.Type: ApplicationFiled: August 15, 2012Publication date: December 6, 2012Applicant: LAM RESEARCH CORPORATIONInventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S.M. Reza Sadjadi
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Patent number: 8268118Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.Type: GrantFiled: February 24, 2010Date of Patent: September 18, 2012Assignee: Lam Research CorporationInventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S. M. Reza Sadjadi
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Publication number: 20110281435Abstract: A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power.Type: ApplicationFiled: July 22, 2011Publication date: November 17, 2011Applicant: LAM RESEARCH CORPORATIONInventors: S. M. Reza Sadjadi, Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa
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Patent number: 7977390Abstract: A method for etching features in a dielectric layer is provided. A mask is formed over the dielectric layer. A protective silicon-containing coating is formed on exposed surfaces of the mask. The features are etched through the mask and protective silicon-containing coating. The features may be partially etched before the protective silicon-containing coating is formed.Type: GrantFiled: August 22, 2006Date of Patent: July 12, 2011Assignee: Lam Research CorporationInventors: Bing Ji, Erik A. Edelberg, Takumi Yanagawa, Zhisong Huang, Lumin Li
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Publication number: 20100327413Abstract: A method for opening a carbon-based hardmask layer formed on an etch layer over a substrate is provided. The hardmask layer is disposed below a patterned mask. The substrate is placed in a plasma processing chamber. The hardmask layer is opened by flowing a hardmask opening gas including a COS component into the plasma chamber, forming a plasma from the hardmask opening gas, and stopping the flow of the hardmask opening gas. The hardmask layer may be made of amorphous carbon, or made of spun-on carbon, and the hardmask opening gas may further include O2.Type: ApplicationFiled: May 2, 2008Publication date: December 30, 2010Applicant: LAM RESEARCH CORPORATIONInventors: Jong Pil Lee, Seiji Kawaguchi, Camelia Rusu, Zhisong Huang, Mukund Srinivasan, Eric Hudson, Aaron Eppler
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Publication number: 20100238252Abstract: A heat-transfer imaging system and a method of using the same. The heat-transfer imaging system includes a heat-transfer sheet and an activating ink. The heat-transfer sheet and the activating ink are specially formulated so that only the areas of the heat-transfer sheet onto which the ink has been printed become adhesive under heat-transfer conditions. This effect may be achieved by designing the sheet to include an ink-receptive coating whose melting temperature is higher than that typically encountered during normal heat-transfer conditions and by formulating the activating ink to include a plasticizer that, when printed onto the ink-receptive coating, lowers the melting temperature of the ink-receptive coating sufficiently so that the modified melting temperature falls within the temperature range encountered during heat-transfer.Type: ApplicationFiled: July 23, 2008Publication date: September 23, 2010Inventors: Liviu Dinescu, Kai Li, Dong-Tsai Hseih, Ekaterina Vaskova, Haochuan Wang, Christine Dang, Zhisong Huang, James Johnson