Patents by Inventor Zhisong Huang

Zhisong Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11703291
    Abstract: An automatic recoilless firearm comprising a gun barrel and a compensating mass launch tube in which a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling. Said firearm further comprises a bolt or bolts and barrels configured to reduce or eliminate transmission of momentum and mechanical energy to the gun barrels and/or gun body during an operation of the firearm.
    Type: Grant
    Filed: April 29, 2022
    Date of Patent: July 18, 2023
    Inventor: Zhisong Huang
  • Publication number: 20220260329
    Abstract: An automatic recoilless firearm comprising a gun barrel and a compensating mass launch tube in which a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling. Said firearm further comprises a bolt or bolts and barrels configured to reduce or eliminate transmission of momentum and mechanical energy to the gun barrels and/or gun body during an operation of the firearm.
    Type: Application
    Filed: April 29, 2022
    Publication date: August 18, 2022
    Inventor: Zhisong Huang
  • Patent number: 11346621
    Abstract: The invention relates to a recoilless apparatus for firing conventional cartridge-based ammunitions comprising a gun barrel and a compensating mass launch tube wherein a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling.
    Type: Grant
    Filed: November 21, 2020
    Date of Patent: May 31, 2022
    Inventor: Zhisong Huang
  • Publication number: 20220120523
    Abstract: The invention relates to a recoilless apparatus for firing conventional cartridge-based ammunitions comprising a gun barrel and a compensating mass launch tube wherein a projectile is accelerated in one direction inside said gun barrel counterbalanced by a compensating mass accelerated in the opposite direction inside said launch tube thereby minimizing recoil and further providing means of automatic ammunition handling.
    Type: Application
    Filed: November 21, 2020
    Publication date: April 21, 2022
    Inventor: Zhisong Huang
  • Publication number: 20220097299
    Abstract: Sealing components having complex shapes and smooth surfaces are may be fabricated using coreactive three-dimensional printing. More specifically the invention relates to chemically resistant sealing components and methods of making said sealing components using three-dimensional printing, and that may be used in vehicle applications.
    Type: Application
    Filed: February 10, 2020
    Publication date: March 31, 2022
    Applicant: PPG Industries Ohio, Inc.
    Inventors: Cynthia Kutchko, Eric S. Epstein, Bryan W. Wilkinson, Zhisong Huang, Sean J. Manion, Kerianne M. Dobosz
  • Patent number: 10072182
    Abstract: The present invention discloses a resin infusion type water-permeable pavement material, comprising: a basic bituminous mixture, waterborne epoxy resin, a waterborne curing agent, a toughening agent and a diluting agent; and the basic bituminous mixture comprises coarse aggregate, fine aggregate, fillers and high-viscosity modified bitumen. A water-permeable pavement prepared by the material provided by the present invention has excellent interface bonding capability, favorable road utilization performance and functional performance.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: September 11, 2018
    Inventors: Guiping He, Zheng Sun, Xixi Hou, Zhisong Huang, Quncong Qiu, Xiaohua Jiang, Hua Chen
  • Patent number: 9909009
    Abstract: An environmental protection cold mixing type modulus-adjustable pavement material and preparation method thereof. Equal components of waterborne epoxy resin and waterborne curing agent are added in a container to obtain a waterborne epoxy resin mixture. Emulsified bitumen, the waterborne epoxy resin mixture, an emulsifying agent, a defoaming agent and a stabilizing agent are prepared according to a certain mass ratio; the emulsified bitumen is first added in the container, and the pH is regulated with hydrochloric acid to be 5.0 to 6.5; the above-mentioned other materials are added and stirred to make mixed liquid; a stator of a high-speed shearing machine is put into the mixed liquid, and the rotational speed is set as 350 to 500 rpm for about 20 to 40 min to obtain waterborne epoxy emulsified bituminous emulsion. B.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: March 6, 2018
    Inventors: Guiping He, Zheng Sun, Xixi Hou, Quncong Qiu, Zhisong Huang, Xiaohua Jiang, Hua Chen
  • Publication number: 20160208140
    Abstract: The present invention discloses a resin infusion type water-permeable pavement material, comprising: a basic bituminous mixture, waterborne epoxy resin, a waterborne curing agent, a toughening agent and a diluting agent; and the basic bituminous mixture comprises coarse aggregate, fine aggregate, fillers and high-viscosity modified bitumen. A water-permeable pavement prepared by the material provided by the present invention has excellent interface bonding capability, favorable road utilization performance and functional performance.
    Type: Application
    Filed: September 22, 2015
    Publication date: July 21, 2016
    Inventors: Guiping He, Zheng Sun, Xixi Hou, Zhisong Huang, Quncong Qiu, Xiaohua Jiang, Hua Chen
  • Publication number: 20160145435
    Abstract: An environmental protection cold mixing type modulus-adjustable pavement material and preparation method thereof. Equal components of waterborne epoxy resin and waterborne curing agent are added in a container to obtain a waterborne epoxy resin mixture. Emulsified bitumen, the waterborne epoxy resin mixture, an emulsifying agent, a defoaming agent and a stabilizing agent are prepared according to a certain mass ratio; the emulsified bitumen is first added in the container, and the pH is regulated with hydrochloric acid to be 5.0 to 6.5, the above-mentioned other materials are added and stirred to make mixed liquid; a stator of a high-speed shearing machine is put into the mixed liquid, and the rotational speed is set as 350 to 500 rpm for about 20 to 40 min to obtain waterborne epoxy emulsified bituminous emulsion. B.
    Type: Application
    Filed: September 22, 2015
    Publication date: May 26, 2016
    Inventors: Guiping He, Zheng Sun, Xixi Hou, Quncong Qiu, Zhisong Huang, Xiaohua Jiang, Hua Chen
  • Patent number: 8673785
    Abstract: A gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus is provided. The gas distribution system can include a gas supply section, a flow control section and a switching section. The gas supply section provides first and second gases, typically gas mixtures, to the flow control section, which controls the flows of the first and second gases to the chamber. The chamber can include multiple zones, and the flow control section can supply the first and second gases to the multiple zones at desired flow ratios of the gases. The gas distribution system can continuously supply the first and second gases to the switching section and the switching section is operable to switch the flows of the first and second gases, such that one of the first and second process gases is supplied to the chamber while the other of the first and second gases is supplied to a by-pass line, and then to switch the gas flows.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: March 18, 2014
    Assignee: Lam Research Corporation
    Inventors: Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa, Reza Sadjadi
  • Patent number: 8614149
    Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: December 24, 2013
    Assignee: Lam Research Corporation
    Inventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S. M. Reza Sadjadi
  • Patent number: 8455578
    Abstract: An ink-receptive coating composition. In a preferred embodiment, the composition includes (a) a polyamide, the polyamide comprising an aliphatic polyamide in particulate form, the aliphatic polyamide having a softening point in the temperature range of about 50-250° C. and an average particle size of about 1 to 80 microns; (b) a plasticizer, the plasticizer being a solid plasticizer selected from the group consisting of alkyl sulfonamides and aromatic sulfonamides, the solid plasticizer having a melting point in the range of about 50-200° C.; (c) a binder, the binder being a thermoplastic polymer delivered as a water-based emulsion or solution, the binder having a Tg in the range of about ?20-120° C.; (d) a dye-retention agent, the dye-retention agent comprising at least one cationic polymer; (e) an ink viscosity-modifying agent; and (f) a dispersant, the dispersant being selected from the group of cationic and non-ionic dispersants.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: June 4, 2013
    Assignee: Avery Dennison Corporation
    Inventors: Liviu Dinescu, Dong-Tsai Hseih, Ming Kun Shi, Ekaterina Vaskova, Zhisong Huang
  • Patent number: 8350880
    Abstract: A heat-transfer imaging system and a method of using the same. The heat-transfer imaging system includes a heat-transfer sheet and an activating ink. The heat-transfer sheet and the activating ink are specially formulated so that only the areas of the heat-transfer sheet onto which the ink has been printed become adhesive under heat-transfer conditions. This effect may be achieved by designing the sheet to include an ink-receptive coating whose melting temperature is higher than that typically encountered during normal heat-transfer conditions and by formulating the activating ink to include a plasticizer that, when printed onto the ink-receptive coating, lowers the melting temperature of the ink-receptive coating sufficiently so that the modified melting temperature falls within the temperature range encountered during heat-transfer.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: January 8, 2013
    Assignee: Avery Dennison Corporation
    Inventors: Liviu Dinescu, Kai Li, Dong-Tsai Hseih, Ekaterina Vaskova, Haochuan Wang, Christine Dang, Zhisong Huang, James Johnson
  • Patent number: 8343876
    Abstract: A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: January 1, 2013
    Assignee: Lam Research Corporation
    Inventors: S. M. Reza Sadjadi, Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa
  • Publication number: 20120309201
    Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.
    Type: Application
    Filed: August 15, 2012
    Publication date: December 6, 2012
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S.M. Reza Sadjadi
  • Patent number: 8268118
    Abstract: A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: September 18, 2012
    Assignee: Lam Research Corporation
    Inventors: Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang, Robert Charatan, S. M. Reza Sadjadi
  • Publication number: 20110281435
    Abstract: A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power.
    Type: Application
    Filed: July 22, 2011
    Publication date: November 17, 2011
    Applicant: LAM RESEARCH CORPORATION
    Inventors: S. M. Reza Sadjadi, Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa
  • Patent number: 7977390
    Abstract: A method for etching features in a dielectric layer is provided. A mask is formed over the dielectric layer. A protective silicon-containing coating is formed on exposed surfaces of the mask. The features are etched through the mask and protective silicon-containing coating. The features may be partially etched before the protective silicon-containing coating is formed.
    Type: Grant
    Filed: August 22, 2006
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Bing Ji, Erik A. Edelberg, Takumi Yanagawa, Zhisong Huang, Lumin Li
  • Publication number: 20100327413
    Abstract: A method for opening a carbon-based hardmask layer formed on an etch layer over a substrate is provided. The hardmask layer is disposed below a patterned mask. The substrate is placed in a plasma processing chamber. The hardmask layer is opened by flowing a hardmask opening gas including a COS component into the plasma chamber, forming a plasma from the hardmask opening gas, and stopping the flow of the hardmask opening gas. The hardmask layer may be made of amorphous carbon, or made of spun-on carbon, and the hardmask opening gas may further include O2.
    Type: Application
    Filed: May 2, 2008
    Publication date: December 30, 2010
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Jong Pil Lee, Seiji Kawaguchi, Camelia Rusu, Zhisong Huang, Mukund Srinivasan, Eric Hudson, Aaron Eppler
  • Publication number: 20100238252
    Abstract: A heat-transfer imaging system and a method of using the same. The heat-transfer imaging system includes a heat-transfer sheet and an activating ink. The heat-transfer sheet and the activating ink are specially formulated so that only the areas of the heat-transfer sheet onto which the ink has been printed become adhesive under heat-transfer conditions. This effect may be achieved by designing the sheet to include an ink-receptive coating whose melting temperature is higher than that typically encountered during normal heat-transfer conditions and by formulating the activating ink to include a plasticizer that, when printed onto the ink-receptive coating, lowers the melting temperature of the ink-receptive coating sufficiently so that the modified melting temperature falls within the temperature range encountered during heat-transfer.
    Type: Application
    Filed: July 23, 2008
    Publication date: September 23, 2010
    Inventors: Liviu Dinescu, Kai Li, Dong-Tsai Hseih, Ekaterina Vaskova, Haochuan Wang, Christine Dang, Zhisong Huang, James Johnson