Patents by Inventor Zhonglin Miao

Zhonglin Miao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11987039
    Abstract: The present disclosure belongs to the technical field of PVC foam co-extruded sheets, and particularly relates to a wide low-temperature impact-resistant and bending-resistant PVC foam co-extruded sheet and a preparation method thereof. The PVC foam co-extruded sheet of the present disclosure includes a core layer and a skin layer. Raw materials of the core layer include PVC resin powder, a silicone-methyl methacrylate-ethyl acrylate composite low-temperature toughening and reinforcing agent, a filler, a foaming regulator I, a white foaming agent, a calcium-zinc stabilizer, a cold-resistant plasticizer, stearic acid, polyethylene wax, and oxidized polyethylene wax.
    Type: Grant
    Filed: November 6, 2023
    Date of Patent: May 21, 2024
    Assignee: BODO PLASTICS CO., LTD.
    Inventors: Feng Sun, Jian Ma, Wei Miao, Zhonglin Zhang, Guoqing Yang, Changming Wang
  • Publication number: 20240075705
    Abstract: The present disclosure belongs to the technical field of PVC foam co-extruded sheets, and particularly relates to a wide low-temperature impact-resistant and bending-resistant PVC foam co-extruded sheet and a preparation method thereof. The PVC foam co-extruded sheet of the present disclosure includes a core layer and a skin layer. Raw materials of the core layer include PVC resin powder, a silicon-acrylic composite low-temperature toughening and reinforcing agent, a filler, a foaming regulator I, a white foaming agent, a calcium-zinc stabilizer, a cold-resistant plasticizer, stearic acid, polyethylene wax, and oxidized polyethylene wax.
    Type: Application
    Filed: November 6, 2023
    Publication date: March 7, 2024
    Applicant: BODO PLASTICS CO., LTD.
    Inventors: Feng SUN, Jian MA, Wei MIAO, Zhonglin ZHANG, Guoqing YANG, Changming WANG
  • Patent number: 8951609
    Abstract: A nanotube-photoresist composite is fabricated by preparing a nanotube suspension using a nanotube structure-containing raw material, dispersing the nanotube suspension in a photoresist using ultra-sonication to produce a nanotube suspension-photoresist mix, spin-coating the nanotube suspension-photoresist mix on a substrate to form a nanotube suspension-photoresist composite layer, and removing one or more solvents in the nanotube suspension-photoresist composite layer by baking.
    Type: Grant
    Filed: April 25, 2011
    Date of Patent: February 10, 2015
    Assignee: STMicroelectronics Asia Pacific Pte Ltd
    Inventors: Shanzhong Wang, Mui Hoon Nai, Zhonglin Miao
  • Publication number: 20140010237
    Abstract: The disclosure discloses a reordering device and method for Ethernet transmission configured to solve a technical problem of large resource consumption and an the operating frequency failing to meet the requirement of a high-speed system in an existing reordering method. The reordering device provided by the disclosure includes a line sequence detecting module and a line sequence locking module, wherein the line sequence detecting module is configured to detect a line sequence corresponding to each channel, acquire a serial number of the channel and encode the serial number, and send the coded serial number to the line sequence locking module; and the line sequence locking module reorders input data according to the coded serial number received to obtain a reordered data stream, then sends out the reordered data stream, and at the same time, locks a sequence of the reordered data stream.
    Type: Application
    Filed: February 3, 2012
    Publication date: January 9, 2014
    Applicant: ZTE Corporation
    Inventors: Chun Yuan, Zhonglin Miao, Xiaoming Wang, Hengqi Liu
  • Patent number: 8377556
    Abstract: Systems and methods for creating carbon nanotubes are disclosed that comprise a growing a nanotube on a tri-layer material. This tri-layer material may comprise a catalyst and at least one layer of Ti. This tri-layer material may be exposed to a technique that is used to grow a nanotube on a material such as a deposition technique.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: February 19, 2013
    Assignee: STMicroelectronics Asia Pacific Pte., Ltd.
    Inventors: Adeline Chan, Ivan Teo, Zhonglin Miao, Shanzhong Wang, Vincenzo Vinciguerra
  • Publication number: 20110198559
    Abstract: A method is provided for growth of carbon nanotube (CNT) synthesis at a low temperature. The method includes preparing a catalyst by placing the catalyst between two metal layers of high chemical potential on a substrate, depositing such placed catalyst on a surface of a wafer, and reactivating the catalyst in a high vacuum at a room temperature in a catalyst preparation chamber to prevent a deactivation of the catalyst. The method also includes growing carbon nanotubes on the substrate in the high vacuum in a CNT growth chamber after preparing the catalyst.
    Type: Application
    Filed: April 25, 2011
    Publication date: August 18, 2011
    Applicant: STMICROELECTRONICS ASIA PACIFIC PTE LTD
    Inventors: Shanzhong Wang, Mui Hoon Nai, Zhonglin Miao
  • Patent number: 7956345
    Abstract: A method is provided for growth of carbon nanotube (CNT) synthesis at a low temperature. The method includes preparing a catalyst by placing the catalyst between two metal layers of high chemical potential on a substrate, depositing such placed catalyst on a surface of a wafer, and reactivating the catalyst in a high vacuum at a room temperature in a catalyst preparation chamber to prevent a deactivation of the catalyst. The method also includes growing carbon nanotubes on the substrate in the high vacuum in a CNT growth chamber after preparing the catalyst.
    Type: Grant
    Filed: January 14, 2008
    Date of Patent: June 7, 2011
    Assignee: STMicroelectronics Asia Pacific Pte. Ltd.
    Inventors: Shanzhong Wang, Mui Hoon Nai, Zhonglin Miao
  • Patent number: 7910937
    Abstract: A method and structure for fabricating III-V nitride layers on silicon substrates includes a substrate, a transition structure having AlGaN, AlN and GaN layers, and a superlattice structure having AlGaN and GaN layers. In the invention, the large lattice mismatch (17%) between GaN and silicon is solved by using AlN as the first buffer layer with a 5:4 coincidence between AlN(0001) and Si(111) lattice to reduce the lattice mismatch to 1.3%.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: March 22, 2011
    Assignee: Agency for Science, Technology and Research
    Inventors: Peng Chen, Soo Jin Chua, Zhonglin Miao, Sudhiranjan Tripathy
  • Publication number: 20100129549
    Abstract: Systems and methods for creating carbon nanotubes are disclosed that comprise a growing a nanotube on a tri-layer material. This tri-layer material may comprise a catalyst and at least one layer of Ti. This tri-layer material may be exposed to a technique that is used to grow a nanotube on a material such as a deposition technique.
    Type: Application
    Filed: November 26, 2008
    Publication date: May 27, 2010
    Applicant: STMicroelectronics Asia Pacific Pte. Ltd.
    Inventors: Adeline Chan, Ivan Teo, Zhonglin Miao, Shanzhong Wang, Vincenzo Vinciguerra
  • Publication number: 20080203380
    Abstract: A method is provided for growth of carbon nanotube (CNT) synthesis at a low temperature. The method includes preparing a catalyst by placing the catalyst between two metal layers of high chemical potential on a substrate, depositing such placed catalyst on a surface of a wafer, and reactivating the catalyst in a high vacuum at a room temperature in a catalyst preparation chamber to prevent a deactivation of the catalyst. The method also includes growing carbon nanotubes on the substrate in the high vacuum in a CNT growth chamber after preparing the catalyst.
    Type: Application
    Filed: January 14, 2008
    Publication date: August 28, 2008
    Applicant: STMICROELECTRONICS ASIA PACIFIC PTE LTD
    Inventors: Shanzhong Wang, Mui Hoon Nai, Zhonglin Miao
  • Publication number: 20060191474
    Abstract: A method and structure for fabricating III-V nitride layers on silicon substrates includes a substrate, a transition structure having AlGaN, AlN and GaN layers, and a superlattice structure having AlGaN and GaN layers. In the invention, the large lattice mismatch (17%) between GaN and silicon is solved by using AlN as the first buffer layer with a 5:4 coincidence between AlN(0001) and Si(111) lattice to reduce the lattice mismatch to 1.3%.
    Type: Application
    Filed: February 1, 2006
    Publication date: August 31, 2006
    Applicant: Agency for Science, Technology and Research
    Inventors: Peng Chen, Soo Chua, Zhonglin Miao, Sudhiranjan Tripathy