Patents by Inventor Zhongrong Shen

Zhongrong Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming patterned conductive film
    Patent number: 9435032
    Abstract: The present invention is directed to a method for forming a patterned conductive film, which comprises the step of bringing a substrate having a layer made of platinum microcrystal particles formed thereon in a pattern and a complex of an amine compound and an aluminum hydride into contact with each other at a temperature of 50 to 120° C. According to the present invention, there is provided a method for forming a patterned conductive layer, which can ensure electrical bonding with a substrate and also can be suitably applied to various electronic devices, simply without requiring a massive and heavy apparatus.
    Type: Grant
    Filed: April 15, 2014
    Date of Patent: September 6, 2016
    Assignee: Japan Science and Technology Agency
    Inventors: Tatsuya Shimoda, Yasuo Matsuki, Zhongrong Shen
  • Method for forming patterned conductive film
    Patent number: 8828555
    Abstract: The present invention is directed to a method for forming a patterned conductive film, which comprises the step of bringing a substrate having a layer made of platinum microcrystal particles formed thereon in a pattern and a complex of an amine compound and an aluminum hydride into contact with each other at a temperature of 50 to 120° C. According to the present invention, there is provided a method for forming a patterned conductive layer, which can ensure electrical bonding with a substrate and also can be suitably applied to various electronic devices, simply without requiring a massive and heavy apparatus.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: September 9, 2014
    Assignees: Japan Science and Technology Agency, JSR Corporation
    Inventors: Tatsuya Shimoda, Yasuo Matsuki, Zhongrong Shen
  • METHOD FOR FORMING PATTERNED CONDUCTIVE FILM
    Publication number: 20140227436
    Abstract: The present invention is directed to a method for forming a patterned conductive film, which comprises the step of bringing a substrate having a layer made of platinum microcrystal particles formed thereon in a pattern and a complex of an amine compound and an aluminum hydride into contact with each other at a temperature of 50 to 120° C. According to the present invention, there is provided a method for forming a patterned conductive layer, which can ensure electrical bonding with a substrate and also can be suitably applied to various electronic devices, simply without requiring a massive and heavy apparatus.
    Type: Application
    Filed: April 15, 2014
    Publication date: August 14, 2014
    Applicants: JAPAN SCIENCE AND TECHNOLOGY AGENCY, JSR CORPORATION
    Inventors: Tatsuya SHIMODA, Yasuo MATSUKI, Zhongrong SHEN
  • METHOD FOR FORMING PATTERNED CONDUCTIVE FILM
    Publication number: 20120298402
    Abstract: The present invention is directed to a method for forming a patterned conductive film, which comprises the step of bringing a substrate having a layer made of platinum microcrystal particles formed thereon in a pattern and a complex of an amine compound and an aluminum hydride into contact with each other at a temperature of 50 to 120° C. According to the present invention, there is provided a method for forming a patterned conductive layer, which can ensure electrical bonding with a substrate and also can be suitably applied to various electronic devices, simply without requiring a massive and heavy apparatus.
    Type: Application
    Filed: January 26, 2011
    Publication date: November 29, 2012
    Applicants: JSR CORPORATION, JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Tatsuya Shimoda, Yasuo Matsuki, Zhongrong Shen