Patents by Inventor Zhongwei Chen

Zhongwei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230170178
    Abstract: A rapid and automatic virus imaging and analysis system includes (i) electron optical sub-systems (EOSs), each of which has a large field of view (FOV) and is capable of instant magnification switching for rapidly scanning a virus sample; (ii) sample management sub-systems (SMSs), each of which automatically loads virus samples into one of the EOSs for virus sample scanning and then unloads the virus samples from the EOS after the virus sample scanning is completed; (iii) virus detection and classification sub-systems (VDCSs), each of which automatically detects and classifies a virus based on images from the EOS virus sample scanning; and (iv) a cloud-based collaboration sub-system for analyzing the virus sample scanning images, storing images from the EOS virus sample scanning, and storing and analyzing machine data associated with the EOSs, the SMSs, and the VDCSs.
    Type: Application
    Filed: January 24, 2023
    Publication date: June 1, 2023
    Applicant: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Patent number: 11664186
    Abstract: The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.
    Type: Grant
    Filed: August 7, 2022
    Date of Patent: May 30, 2023
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Patent number: 11664189
    Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising a plasma generator for selectively cleaning BSE detector. In various embodiments, the plasma generator is located between a sample stage and a sample table having one or more openings or holes. The plasma generator generates plasma and distributes or dissipates the plasma through the openings of the sample table toward and onto surface of the BSE detector. Cleaning contaminants on the surface of the BSE detector frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
    Type: Grant
    Filed: May 9, 2022
    Date of Patent: May 30, 2023
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Publication number: 20230098496
    Abstract: A safe all-solid-state lithium secondary battery using a functionalized Metal-organic framework (MOFs)-based sol-id-state electrolyte composite and methods for manufacturing that electrolyte are provided. Specifically, that solid-state electrolyte composite includes MOFs material and traditional polymer, which are mixed and electrospining into a solid thin film. The solid-state electrolyte could significantly reduce the safety risk as well as enhance the Li+ conductivity rate through reducing the degree of crys-tallinity for polymer and coupling the polymer within the oriented and uniform pore structures in MOFs, thus improving the ionic conductivity and enhancing the Li batteries performance. The procedure involves only one step, and it is expected to be easy for scale-up.
    Type: Application
    Filed: March 22, 2020
    Publication date: March 30, 2023
    Inventor: Zhongwei CHEN
  • Patent number: 11593938
    Abstract: A rapid and automatic virus imaging and analysis system includes (i) electron optical sub-systems (EOSs), each of which has a large field of view (FOV) and is capable of instant magnification switching for rapidly scanning a virus sample; (ii) sample management sub-systems (SMSs), each of which automatically loads virus samples into one of the EOSs for virus sample scanning and then unloads the virus samples from the EOS after the virus sample scanning is completed; (iii) virus detection and classification sub-systems (VDCSs), each of which automatically detects and classifies a virus based on images from the EOS virus sample scanning; and (iv) a cloud-based collaboration sub-system for analyzing the virus sample scanning images, storing images from the EOS virus sample scanning, and storing and analyzing machine data associated with the EOSs, the SMSs, and the VDCSs.
    Type: Grant
    Filed: October 31, 2021
    Date of Patent: February 28, 2023
    Assignee: BORRIRS PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Patent number: 11587758
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: February 21, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: 11569059
    Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. The plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: January 31, 2023
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Publication number: 20220375716
    Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.
    Type: Application
    Filed: April 4, 2022
    Publication date: November 24, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Yongxin WANG, Weiming REN, Zhonghua DONG, Zhongwei CHEN
  • Patent number: 11443915
    Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: September 13, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Joe Wang, Chia Wen Lin, Zhongwei Chen, Chang-Chun Yeh
  • Publication number: 20220262594
    Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.
    Type: Application
    Filed: May 9, 2022
    Publication date: August 18, 2022
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Xinan LUO, Zhongwei CHEN
  • Publication number: 20220262596
    Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising a plasma generator for selectively cleaning BSE detector. In various embodiments, the plasma generator is located between a sample stage and a sample table having one or more openings or holes. The plasma generator generates plasma and distributes or dissipates the plasma through the openings of the sample table toward and onto surface of the BSE detector. Cleaning contaminants on the surface of the BSE detector frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
    Type: Application
    Filed: May 9, 2022
    Publication date: August 18, 2022
    Applicant: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Publication number: 20220246391
    Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another, preferably by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.
    Type: Application
    Filed: January 10, 2022
    Publication date: August 4, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Joe WANG, Yongxin WANG, Zhongwei CHEN, Xuerang HU
  • Patent number: 11398368
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Grant
    Filed: October 19, 2020
    Date of Patent: July 26, 2022
    Assignee: ASML Netherlands B.V
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: 11355312
    Abstract: The present invention provides a driving system comprising two actuators for moving a stage through two elastic connectors; and a general apparatus/device comprising such a driving system, such as a machine tool, an analytical instrument, an optical microscope, and an apparatus of charged-particle beam such as electron microscope and an electron beam lithographical apparatus. When used in an electron microscope, the stage can be used as a specimen stage or a plate having apertures for electron beam to pass through. The novel stage driving system exhibits numerous technical merits such as simpler structure, better manufacturability, improved cost-effectiveness, and higher reliability, among others.
    Type: Grant
    Filed: August 1, 2021
    Date of Patent: June 7, 2022
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Publication number: 20220158221
    Abstract: A three-dimensionally ordered macroporous (3DOM) metal-organic framework material (MOF)-based quasi-solid-state electrolyte thin film for a safe quasi-solid-state lithium secondary battery are involved in present invention. In detail, the above quasi-solid-state electrolyte combines 3DOM-MOFs and the electrolytes like polymer and traditional liquid electrolyte. The special pore structures in 3DOM-MOFs could both fill the polymer electrolyte and liquid electrolyte with macropores and micropores, respectively. This unique structure could significantly enhance the Li+ conductivity rate through the different kinds of electrolytes in the corresponding pore structures as well as improves the battery performance. More importantly, this quasi-solid-state electrolyte is much safer than the traditional organic electrolyte. It should be easily to scale-up since the procedures are simple.
    Type: Application
    Filed: March 22, 2020
    Publication date: May 19, 2022
    Inventor: Zhongwei CHEN
  • Publication number: 20220148851
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: August 30, 2021
    Publication date: May 12, 2022
    Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN
  • Patent number: 11328898
    Abstract: The present invention provides a digital high-resolution detector for detecting X-ray, UV light or charged particles. In various embodiments, the digital detector comprises an array of CMOS or CCD pixels and a layer of conversion material on top of the array designed for converting incident X-ray, UV light or charged particles into photons for CMOS or CCD sensors to capture. The thin and high-resolution detector of the invention is particularly useful for monitoring and aligning beams in, and optimizing system performance of, an apparatus of charged-particle beam e.g. an electron microscope.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: May 10, 2022
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Patent number: 11328894
    Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: May 10, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Xinan Luo, Zhongwei Chen
  • Publication number: 20220115204
    Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. In various embodiments, the plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector. Cleaning decomposed biological samples or contaminants on the surface of the detectors frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
    Type: Application
    Filed: December 17, 2021
    Publication date: April 14, 2022
    Inventors: Zhongwei Chen, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Publication number: 20220112085
    Abstract: A hollow carbon sphere with a multi-stage pore structure. The hollow carbon sphere may have a multi-stage pore structure, and have micropores, mesopores and macropores, wherein the pore diameter of the micropores is not greater than 2 nm, the pore diameter of the mesopores is distributed between 2-50 nm, and the pore diameter of the macropores is greater than 50 nm; the pore volume contributed by the micropores is 0.047-0.30 cm3/g; the pore volume contributed by the mesoporous is 0.15-0.49 cm3/g; the pore volume contributed by the macropores is 0.07-0.80 cm3/g; and the grain size of the hollow carbon sphere is 2.5-6.5 ?m, the wall thickness thereof is 5-8 nm, and the specific surface area thereof is 443.23 m2/g. Further provided is a method for preparing the material. The carbon sphere may have thin walls, a high porousness, a high specific surface area, etc., which can enhance the application performance thereof.
    Type: Application
    Filed: January 21, 2019
    Publication date: April 14, 2022
    Inventor: Zhongwei Chen