Abstract: The invention relates to a wide spectrum multi-band detection structure with selective absorption enhancement and its preparation method. The structure comprises a plurality of sub-pixel units capable of detecting incident light in different bands. Each sub-pixel unit is composed of a square well-shaped microstructure array and a metal lower electrode (2), a photosensitive layer (3) and an upper electrode (4) on the surface thereof. The size and array spacing of square well-shaped microstructures in different sub-pixel units are determined according to the detection bands of the sub-pixel units where they are located. The upper openings of the square well-shaped microstructures are hollow to form a resonant cavity, and the adjacent square well-shaped microstructures in the same sub-pixel unit form a resonant cavity, thus solving the problem that the detector structure in the prior art cannot simultaneously realize visible light-near infrared multi-band absorption enhancement detection.

Abstract: The invention relates to an infrared-transmitting high-sensitivity visible light detector and its preparation method. The detector is composed of passivation layer (14), upper electrode (13), heterojunction (15), lower electrode (3), and intrinsic monocrystalline silicon substrate (2). The upper electrode (13) is the material that is electrically conductive and transparent to visible light and infrared light. The heterojunction (15) is divided into heterojunction upper layer (5) and heterojunction lower layer (4), wherein the upper heterojunction layer (5) is a nano film sensitive to visible light and capable of transmitting infrared ray, and the lower heterojunction layer (4) is intrinsic monocrystalline silicon.

Abstract: The invention relates to an infrared-transmitting high-sensitivity visible light detector and its preparation method. The detector is composed of passivation layer (14), upper electrode (13), heterojunction (15), lower electrode (3), and intrinsic monocrystalline silicon substrate (2). The upper electrode (13) is the material that is electrically conductive and transparent to visible light and infrared light. The heterojunction (15) is divided into heterojunction upper layer (5) and heterojunction lower layer (4), wherein the upper heterojunction layer (5) is a nano film sensitive to visible light and capable of transmitting infrared ray, and the lower heterojunction layer (4) is intrinsic monocrystalline silicon.

Abstract: The invention relates to a wide spectrum multi-band detection structure with selective absorption enhancement and its preparation method. The structure comprises a plurality of sub-pixel units capable of detecting incident light in different bands. Each sub-pixel unit is composed of a square well-shaped microstructure array and a metal lower electrode (2), a photosensitive layer (3) and an upper electrode (4) on the surface thereof. The size and array spacing of square well-shaped microstructures in different sub-pixel units are determined according to the detection bands of the sub-pixel units where they are located. The upper openings of the square well-shaped microstructures are hollow to form a resonant cavity, and the adjacent square well-shaped microstructures in the same sub-pixel unit form a resonant cavity, thus solving the problem that the detector structure in the prior art cannot simultaneously realize visible light-near infrared multi-band absorption enhancement detection.