Patents by Inventor Zi-Yuang Wang

Zi-Yuang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming process film
    Patent number: 11666950
    Abstract: A method of forming a process film includes the following operations. A substrate is transferred into a process chamber having an interior surface. A process film is formed over the substrate, and the process film is also formed on the interior surface of the process chamber. The substrate is transferred out of the process chamber. A non-process film is formed on the interior surface of the process chamber. In some embodiments, porosity of the process film is greater than a porosity of the non-process film.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: June 6, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang
  • METHOD OF FORMING PROCESS FILM
    Publication number: 20200290095
    Abstract: A method of forming a process film includes the following operations. A substrate is transferred into a process chamber having an interior surface. A process film is formed over the substrate, and the process film is also formed on the interior surface of the process chamber. The substrate is transferred out of the process chamber. A non-process film is formed on the interior surface of the process chamber. In some embodiments, porosity of the process film is greater than a porosity of the non-process film.
    Type: Application
    Filed: May 28, 2020
    Publication date: September 17, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang
  • Method of cleaning process chamber
    Patent number: 10668511
    Abstract: A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: June 2, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang
  • METHOD OF CLEANING PROCESS CHAMBER
    Publication number: 20190291145
    Abstract: A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
    Type: Application
    Filed: March 20, 2018
    Publication date: September 26, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang