Patents by Inventor Zoilo C. H. Tan

Zoilo C. H. Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching using a bilayer mask
    Patent number: 5091047
    Abstract: A bilayer mask is utilized for etching a primary layer, which may be either an aluminum metallization layer or a dielectric layer. The bilayer mask includes both a thin resist layer and a metal imaging layer. The thin resist layer provides for high resolution patterning of the metal imaging layer. The metal imaging layer, in turn, provides for durability to withstand subsequent plasma etching of the underlying primary layer.
    Type: Grant
    Filed: July 22, 1991
    Date of Patent: February 25, 1992
    Assignee: National Semiconductor Corp.
    Inventors: James M. Cleeves, James G. Heard, Zoilo C. H. Tan
  • Plasma etching using a bilayer mask
    Patent number: 5045150
    Abstract: A bilayer mask is utilized for etching a primary layer, which may be either an aluminum metallization layer or a dielectric layer. The bilayer mask includes both a thin resist layer and a metal imaging layer. The thin resist layer provides for high resolution patterning of the metal imaging layer. The metal imaging layer, in turn, provides for durability to withstand subsequent plasma etching of the underlying primary layer.
    Type: Grant
    Filed: June 17, 1988
    Date of Patent: September 3, 1991
    Assignee: National Semiconductor Corp.
    Inventors: James M. Cleeves, James G. Heard, Zoilo C. H. Tan
  • Negative-working polymers useful as electron beam resists
    Patent number: 4289842
    Abstract: Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.
    Type: Grant
    Filed: June 27, 1980
    Date of Patent: September 15, 1981
    Assignee: Eastman Kodak Company
    Inventors: Zoilo C. H. Tan, Constantine C. Petropoulos, Frederick J. Rauner