Abstract: A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit.

Abstract: A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit.

Abstract: A drive mechanism to move an optical component sensitive to particles is described. The drive mechanism has high precision in rotation, great reliability and durability life, no backlash, and far less particle contamination. The drive mechanism can be advantageously used in high precision rotation driving processes for opto-mechanical inspection systems that require high movement precision and no-contamination. In one embodiment, two pulleys are used with their axes to be parallel from each other, two bands are used to rotate the pulleys in opposite directions. An eccentric disk mechanism is used to fine-tune the distance between the two pulleys so that tensions on the two bands can be optimized.

Abstract: Techniques of swapping two samples with a mechanical arm that has no backlash, no friction, no particle contamination are described. With the unique structure and the material used for the cables, the mechanical arm provides considerable operating life. When used in a semiconductor inspection system, the mechanical arm, also referred to herein a cable drive robot mechanism, can be advantageously used to swap two wafers as part or within the inspection system. The two wafers, one examined and the other one yet to be examined, can be swapped between two chambers. During the exchanging process, the cable drive robot mechanism seamlessly picks up an examined wafer to exit one chamber while loading up an unexamined wafer to enter another chamber at the same time.

Abstract: A drive mechanism is described. One of the objectives, advantages and benefits of the drive mechanism is that is has high precision in rotation, great reliability and durability life, no backlash, and no particle contamination. It is very useful in high precision rotation driving processes for opto-mechanical inspection systems that require high movement precision and no-contamination. In one embodiment, two pulleys are used with their axes to be parallel from each other, two bands are used to rotate the pulleys in opposite directions. An eccentric disk mechanism is used to fine-tune the distance between the two pulleys so that tensions on the two bands can be optimized.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.

Abstract: A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.