Face mask

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Description

FIG. 1 is a front view of the face mask according to the new design;

FIG. 2 is a right sideview of the face mask;

FIG. 3 is a back view of the face mask;

FIG. 4 is a left side view of the face mask;

FIG. 5 is a top view of the face mask;

FIG. 6 is a bottom view of the face mask; and

FIG. 7 is an elevated front and right perspective view of the face mask.

The broken lines in the Figures show portions of the FACE MASK that form no part of the claimed design.

Claims

The ornamental design for a FACE MASK as shown and described.

Referenced Cited
U.S. Patent Documents
D382341 August 12, 1997 Freund
D429385 August 8, 2000 Lee et al.
D773121 November 29, 2016 Yuan
D777988 January 31, 2017 Miros et al.
D788373 May 30, 2017 Bunge et al.
D937406 November 30, 2021 Chatin
D946747 March 22, 2022 Mathews
D946832 March 22, 2022 Jiang
D955652 June 21, 2022 Harder et al.
D956953 July 5, 2022 Tu
D958967 July 26, 2022 Zhu
D961761 August 23, 2022 Vaidya
20190358473 November 28, 2019 Szasz et al.
Patent History
Patent number: D1004768
Type: Grant
Filed: Jul 1, 2020
Date of Patent: Nov 14, 2023
Assignee: DIGIPAS TECHNOLOGIES, INC. (Irvine, CA)
Inventors: Jim Hui Hong Li (Singapore), Bi Yong Kuu (Singapore), Shie Jie Ong (Singapore)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/740,142
Classifications