Apertured continuous filament fabric

- Polymer Group, Inc.
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Description

The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being identical.

Claims

The ornamental design for an apertured continuous filament fabric, substantially as shown and described.

Referenced Cited
U.S. Patent Documents
D34599 May 1901 Townsend
D38047 May 1906 Conde
D58860 August 1921 Worms
D61590 October 1922 Messina
D88352 November 1932 Huber
D92165 May 1934 de Liso
D100743 August 1936 Siner
D102276 December 1936 Huber
D102340 December 1936 Siner
D102846 January 1937 Siner
D183257 July 1958 Holder
D342163 December 14, 1993 Lesner
D478217 August 12, 2003 Bruner et al.
D481872 November 11, 2003 Hennel et al.
Patent History
Patent number: D497260
Type: Grant
Filed: Nov 24, 2003
Date of Patent: Oct 19, 2004
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventors: Gary Hennel (Troutman, NC), Nick Carter (Mooresville, NC)
Primary Examiner: Joel Sincavage
Assistant Examiner: T. Chase Nelson
Attorney, Agent or Law Firm: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/194,425
Classifications
Current U.S. Class: D5/47
International Classification: 0505;