Photomask blank

- Hoya Corporation
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Description

FIG. 1 is a front elevational view of a photomask blank showing our new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is an enlarged partial front view along line 77 in FIG. 1;

FIG. 8 is a reduced scale front, left side, top perspective view of the portion shown in FIG. 7; and,

FIG. 9 is a sectional view along line 99 in FIG. 7.

The broken line showing is for illustrative purposes only and forms no part of the claimed design.

Claims

The ornamental design for a photomask blank, as shown and described.

Referenced Cited
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Other references
  • U.S. Appl. No. 29/213,840, filed Sep. 23, 2004, Inventor: Masaru Mitsui; Entitled: Photomask Blank.
Patent History
Patent number: D568839
Type: Grant
Filed: Jan 23, 2007
Date of Patent: May 13, 2008
Assignee: Hoya Corporation (Tokyo)
Inventors: Masaru Mitsui (Mukawa-mura), Shigekazu Matsui (Nirasaki), Masao Ushida (Kofu), Osamu Nagarekawa (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Frishauf, Holtz, Goodman & Chick, P.C.
Application Number: 29/276,360