Mask

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Description

FIG. 1 is a perspective view of a mask showing my design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D407858 April 6, 1999 Cyr et al.
D518605 April 4, 2006 Chen
D522697 June 6, 2006 Chen
D526094 August 1, 2006 Chen
D529234 September 26, 2006 Broersma
D555837 November 20, 2007 Chen
D570551 June 3, 2008 Broersma
20060090234 May 4, 2006 Cyr
20070050896 March 8, 2007 Stevens
20080086795 April 17, 2008 Cyr et al.
Patent History
Patent number: D586050
Type: Grant
Filed: Nov 20, 2007
Date of Patent: Feb 3, 2009
Inventor: Chun-Nan Chen (Tainan)
Primary Examiner: Ruth McInroy
Attorney: Kamrath & Associates PA
Application Number: 29/297,854