Embossing pattern for an absorbent article
Latest Kimberly-Clark Worldwide, Inc. Patents:
- Absorbent article with selectively positioned waist containment member having an improved waist seal
- Adhesive pattern residing on a moving base web
- Cleansing substrate with synchronized printed and expanded texture
- Method for determining residual carbamate compounds on an elastomeric article
- Absorbent article with pocket dividing front and rear regions
Description
Claims
The ornamental design for an embossing pattern for an absorbent article, as shown and described.
Referenced Cited
U.S. Patent Documents
5453143 | September 26, 1995 | Menard |
5472437 | December 5, 1995 | Akiyama et al. |
D403765 | January 5, 1999 | Brown et al. |
6358234 | March 19, 2002 | Terada et al. |
D541932 | May 1, 2007 | Lemaire et al. |
D547445 | July 24, 2007 | Lemaire et al. |
D561895 | February 12, 2008 | Sergeant et al. |
7341579 | March 11, 2008 | Kinoshita et al. |
D571004 | June 10, 2008 | Cardin et al. |
D585984 | February 3, 2009 | Cardin et al. |
20040068244 | April 8, 2004 | Salone et al. |
Patent History
Patent number: D598540
Type: Grant
Filed: Nov 26, 2008
Date of Patent: Aug 18, 2009
Assignee: Kimberly-Clark Worldwide, Inc. (Neenah, WI)
Inventors: HyungWoo Park (Suwon-si), SeongDae Roh (Uiwang-Si), EunJung Kang (Seoul), HyongBom Kim (Uiwang-si)
Primary Examiner: T. Chase Nelson
Assistant Examiner: Michelle E Wilson
Attorney: Armstrong Teasdale, LLP
Application Number: 29/328,636
Type: Grant
Filed: Nov 26, 2008
Date of Patent: Aug 18, 2009
Assignee: Kimberly-Clark Worldwide, Inc. (Neenah, WI)
Inventors: HyungWoo Park (Suwon-si), SeongDae Roh (Uiwang-Si), EunJung Kang (Seoul), HyongBom Kim (Uiwang-si)
Primary Examiner: T. Chase Nelson
Assistant Examiner: Michelle E Wilson
Attorney: Armstrong Teasdale, LLP
Application Number: 29/328,636
Classifications
Current U.S. Class:
Absorbent (17) (D24/124)