Lid assembly for a substrate processing chamber

- Applied Materials, Inc.
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Description

FIG. 1 is a top plan view of a lid assembly for a substrate processing chamber showing our new design.

FIG. 2 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 2 of FIG. 1.

FIG. 3 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 3 of FIG. 1.

FIG. 4 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 4 of FIG. 1.

FIG. 5 is a side elevation view of the lid assembly of FIG. 1, rotated 180°, as viewed from line FIG. 5 of FIG. 1.

FIG. 6 is an isometric top view of the lid assembly of FIG. 1.

FIG. 7 is another isometric top view of the lid assembly of FIG. 1.

FIG. 8 is an isometric bottom view of the lid assembly of FIG. 1; and,

FIG. 9 is a bottom plan view of the lid assembly of FIG. 1.

The broken line showing of structural features is included for the purpose of illustrating non-claimed subject matter and forms no part of the claimed design.

Claims

The ornamental design for a lid assembly for a substrate processing chamber, as shown and described.

Referenced Cited
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Other references
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Patent History
Patent number: D642605
Type: Grant
Filed: Apr 2, 2010
Date of Patent: Aug 2, 2011
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventors: Tetsuya Ishikawa (Saratoga, CA), Alexander Tam (Union City, CA), David H. Quach (San Jose, CA)
Primary Examiner: Antoine D Davis
Attorney: Patterson & Sheridan, L.L.P.
Application Number: 29/358,979