Mask

- FIH (Hong Kong) Limited
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Description

FIG. 1 is a perspective view of a mask showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines immediately adjacent the claimed areas represent the bounds of the claimed design while all other broken lines are directed to environment that form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
2498668 February 1950 Fitzsimmons
D210181 February 1968 Solomon
D229127 November 1973 Franklin
D243128 January 25, 1977 Morgan
D267128 December 7, 1982 Pearce
D278380 April 16, 1985 Verdick
D347090 May 17, 1994 Brunson
D370310 May 28, 1996 Reuber et al.
D375583 November 12, 1996 Landis et al.
D377850 February 4, 1997 Smith et al.
D420769 February 15, 2000 White
D423727 April 25, 2000 Deal, III
D434879 December 5, 2000 Cole
D557461 December 11, 2007 Probst
D604910 November 24, 2009 Smaller
D636128 April 12, 2011 Hancock et al.
D636537 April 19, 2011 Ladua
Patent History
Patent number: D657498
Type: Grant
Filed: Aug 19, 2010
Date of Patent: Apr 10, 2012
Assignee: FIH (Hong Kong) Limited (Kowloon)
Inventors: Zheng Shi (Shenzhen), Jiang-Feng Liu (Shenzhen), Yu-Xi Gao (Shenzhen), Qiang Wang (Shenzhen)
Primary Examiner: Elizabeth J Oswecki
Attorney: Altis Law Group, Inc.
Application Number: 29/368,167
Classifications
Current U.S. Class: Face, Mouth, Or Ear (D29/108)