Mask
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Description
The broken lines immediately adjacent the claimed areas represent the bounds of the claimed design while all other broken lines are directed to environment that form no part of the claimed design.
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
U.S. Patent Documents
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Patent History
Patent number: D657498
Type: Grant
Filed: Aug 19, 2010
Date of Patent: Apr 10, 2012
Assignee: FIH (Hong Kong) Limited (Kowloon)
Inventors: Zheng Shi (Shenzhen), Jiang-Feng Liu (Shenzhen), Yu-Xi Gao (Shenzhen), Qiang Wang (Shenzhen)
Primary Examiner: Elizabeth J Oswecki
Attorney: Altis Law Group, Inc.
Application Number: 29/368,167
Type: Grant
Filed: Aug 19, 2010
Date of Patent: Apr 10, 2012
Assignee: FIH (Hong Kong) Limited (Kowloon)
Inventors: Zheng Shi (Shenzhen), Jiang-Feng Liu (Shenzhen), Yu-Xi Gao (Shenzhen), Qiang Wang (Shenzhen)
Primary Examiner: Elizabeth J Oswecki
Attorney: Altis Law Group, Inc.
Application Number: 29/368,167
Classifications
Current U.S. Class:
Face, Mouth, Or Ear (D29/108)