Profilometer

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Description

FIG. 1 is a perspective view of a profilometer;

FIG. 2 is a front view thereof;

FIG. 3 is a left-side view thereof;

FIG. 4 is a right-side view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a back view thereof;

FIG. 7 is an enlarged view of portion 7-7 of FIG. 2;

FIG. 8 is an enlarged view of portion 8-8 of FIG. 3;

FIG. 9 is an enlarged view of portion 9-9 of FIG. 4;

FIG. 10 is an enlarged view of portion 10-10 of FIG. 5;

FIG. 11 is an enlarged view of portion 11-11 of FIG. 6;

FIG. 12 is an enlarged view of portion 12-12 of FIG. 1;

FIG. 13 is a perspective view of the profilometer; and,

FIG. 14 is an illustrative view of the profilometer thereof removed to disclose details not otherwise visible.

The subject article is a profilometer used for measuring a surface profile (such as the extent of flatness) of a thin disk object (such as a silicon wafer).

The broken lines in the drawings depict unclaimed environmental subject matter.

Claims

We claim the ornamental design for a profilometer, as shown and described.

Referenced Cited
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Foreign Patent Documents
2000292159 October 2000 JP
Patent History
Patent number: D658685
Type: Grant
Filed: Jul 28, 2010
Date of Patent: May 1, 2012
Assignee: Kuroda Precision Industries Ltd. (Saiwai-Ku, Kawasaki-Shi)
Inventors: Koichi Sekiguchi (Futtsu), Masahiro Iwasaki (Futtsu), Tatsuhito Inouchi (Futtsu)
Primary Examiner: Patricia Palasik
Attorney: Marshall & Melhorn, LLC
Application Number: 29/366,648