Polishing pad for substrate polishing apparatus

Description

FIG. 1 is a top plan view of a first embodiment of a polishing pad for substrate polishing apparatus, showing our new design;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front view thereof, the rear view being identical;

FIG. 4 is a right side view thereof, the left side view being identical;

FIG. 5 is an enlarged, top plan view thereof, taken along lines 5-5 of FIG. 1;

FIG. 6 is an enlarged, cross-sectional view thereof, taken along lines 6-6 of FIG. 5;

FIG. 7 is a top plan view of a second embodiment of a polishing pad for substrate polishing apparatus, showing our new design;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a front view thereof, the rear view being identical;

FIG. 10 is a right side view thereof, the left view being identical;

FIG. 11 is an enlarged, partial top plan view thereof, taken along lines 11-11 of FIG. 7; and,

FIG. 12 is an enlarged, cross-sectional view thereof, taken along lines 12-12 of FIG. 11.

The dashed-dot-dashed lines represent the boundary lines of the claimed design. The even dashed broken lines depict environment subject matter only and form no part of the claimed design.

Claims

The ornamental design for a polishing pad for substrate polishing apparatus, as shown and described.