Gas nozzle substrate processing apparatus

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a perspective view of a gas nozzle substrate processing apparatus showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof;

FIG. 8 is an enlarged right side elevational view thereof; and

FIG. 9 is an enlarged portion view taken along line 9-9 in FIG. 2;

FIG. 10 is a cross sectional view take along line 10-10 in FIG. 9; and,

FIG. 11 is a cross sectional view take along line 11-11 in FIG. 9.

Claims

We claim the ornamental design for a gas nozzle substrate processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D58914 September 1921 Barber
D258309 February 17, 1981 Leighton
D322470 December 17, 1991 Garlich
6553986 April 29, 2003 Liu
6851420 February 8, 2005 Jennings
D613116 April 6, 2010 Roberts
D632131 February 8, 2011 Manson
D695883 December 17, 2013 Vest
D771772 November 15, 2016 Morita
20020094385 July 18, 2002 Raychaudhuri
20080171296 July 17, 2008 Yen
20090205631 August 20, 2009 Tsung
20100154775 June 24, 2010 Robinson
Patent History
Patent number: D783351
Type: Grant
Filed: Nov 9, 2015
Date of Patent: Apr 11, 2017
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Toshiki Fujino (Toyama), Kosuke Takagi (Toyama), Ryota Sasajima (Toyama)
Primary Examiner: Robin V Webster
Assistant Examiner: Rachel Voorhies
Application Number: 29/544,977
Classifications
Current U.S. Class: D7/407